Thin film bismuth iron oxides useful for piezoelectric devices
The present invention provides for a composition comprising a thin film of BiFeO 3 having a thickness ranging from 20 nm to 300 nm, a first electrode in contact with the BiFeO 3 thin film, and a second electrode in contact with the BiFeO 3 thin film; wherein the first and second electrodes are in electrical communication. The composition is free or essentially free of lead (Pb). The BFO thin film is has the piezoelectric property of changing its volume and/or shape when an electric field is applied to the BFO thin film.
1. A device comprising a composition comprising a thin film of BiFeO 3 (BFO) having a thickness ranging from 20 nm to 300 nm, a first electrode in contact with the BiFeO 3 thin film in a tetragonal-like phase, and a second electrode in contact with the BiFeO 3 thin film; wherein the first and second electrodes are in electrical communication; wherein the device is configured such that the thin film is capable of a shape change or deformation of up to about 10% of its original dimension.
2. The device of claim 1 , wherein the composition is free or essentially free of lead (Pb).
3. The device of claim 1 , wherein the thin film is capable of a shape change or deformation of up to about 1.0% of its original dimension.
4. The device of claim 1 , wherein the thin film is capable of a shape change or deformation of up to 10 nm.
5. The device of claim 1 , wherein the thin film has a thickness ranging from 20 nm to 200 nm.
6. The device of claim 5 , wherein the thin film has a thickness ranging from 50 nm to 150 nm.
7. A composition comprising a thin film of BiFeO 3 (BFO) having a thickness ranging from 20 nm to 300 nm, a first electrode in contact with the BiFeO 3 thin film in a tetragonal-like phase, and a second electrode in contact with the BiFeO 3 thin film; wherein the first and second electrodes are in electrical communication; wherein the composition comprises a plurality of pairs of electrodes; wherein the pairs of electrodes are in a series or an array, and each pair of electrode is in electrical communication.
8. The device of claim 1 , wherein the device is a piezoelectric transformer, sonar, acoustic sensor, microbalance, strain gauge, vibration sensor, inchworm motor, auto focus motor in a reflex camera, stepping motor, atomic force microscope, scanning tunneling microscope, inkjet printer, or piezoelectric fuel injector in a diesel engine.
9. The device of claim 1 , wherein the device is an AFM probe-based data storage system.
10. The device of claim 1 , wherein the device is a surface acoustic wave (SAW) device.
11. A method of deforming a BiFeO 3 (BFO) thin film comprising: (a) providing a device comprising a composition comprising a thin film of BFO having a thickness ranging from 20 nm to 300 nm, a first electrode in contact with the BFO thin film, and a second electrode in contact with the BFO thin film; wherein the first and second electrodes are in electrical communication, wherein the device is configured such that the thin film is capable of a shape change or deformation of up to about 10% of its original dimension; and (b) creating an electric field through the thin film, such that the thin film is deformed wherein the BFO thin film changes from a tetragonal-like phase into a rhombohedral-like phase.
12. The method of claim 11 , wherein the deformation of the thin film is at least 1 nm.
13. The method of claim 12 , wherein the deformation is at least 5 nm.
14. The method of claim 13 , wherein the deformation is at least 10 nm.
15. The method of claim 11 , wherein the electric field is caused by passing a direct electric current through the first and second electrodes via through the thin film.
16. A method of manufacturing a device comprising a piezoelectric composition, comprising: (a) providing a first electrode layer on a substrate, (b) depositing a ferroelectric layer on the first electrode layer, and (c) depositing a second electrode layer on the ferroelectric layer; wherein the ferroelectric layer is a BiFeO 3 (BFO) thin film in a tetragonal-like phase; wherein the device is configured such that the thin film is capable of a shape change or deformation of up to about 10% of its original dimension.
17. The method of claim 16 , wherein the substrate is Si or an ITO coated glass.
18. The composition of claim 7 , wherein the composition is free or essentially free of lead (Pb).
19. The composition of claim 7 , wherein the thin film is capable of a shape change or deformation of up to about 1.0% of its original dimension.
20. The composition of claim 7 , wherein the thin film is capable of a shape change or deformation of up to 10 nm.
21. The composition of claim 7 , wherein the thin film has a thickness ranging from 20 nm to 200 nm.
22. The composition of claim 21 , wherein the thin film has a thickness ranging from 50 nm to 150 nm.
23. A device comprising the composition of claim 7 .
24. The device of claim 23 , wherein the device is a piezoelectric transformer, sonar, acoustic sensor, microbalance, strain gauge, vibration sensor, inchworm motor, auto focus motor in a reflex camera, stepping motor, atomic force microscope, scanning tunneling microscope, inkjet printer, or piezoelectric fuel injector in a diesel engine.
25. The device of claim 24 , wherein the device is an AFM probe-based data storage system.
26. The device of claim 25 , wherein the device is a surface acoustic wave (SAW) device.