IP Library Granted Patent US 8,598,549
Granted Patent B2
US 8,598,549 · App. 12/927,063 · Granted Dec 3, 2013

EUV optics

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Quick Facts
Patent No.
US 8,598,549
App. No.
12/927,063
Granted
Dec 3, 2013
Kind
B2
Abstract

In a first aspect, a method of fabricating an EUV light source mirror is disclosed which may comprise the acts/steps of providing a plurality of discrete substrates; coating each substrate with a respective multilayer coating; securing the coated substrates in an arrangement wherein each coated substrate is oriented to a common focal point; and thereafter polishing at least one of the multilayer coatings. In another aspect, an optic for use with EUV light is disclosed which may comprise a substrate; a smoothing layer selected from the group of materials consisting of Si, C, Si 3 N 4 , B 4 C, SiC and Cr, the smoothing layer material being deposited using highly energetic deposition conditions and a multilayer dielectric coating. In another aspect, a corrosion resistant, multilayer coating for an EUV mirror may comprise alternating layers of Si and a compound material having nitrogen and a 5 th period transition metal.

Claims (33)

1. An EUV light source mirror assembly comprising:

a support structure;

a plurality of discrete substrates, each substrate coated with a respective EUV reflective multilayer coating;

a plurality of rings with at least one substrate mounted on at least one ring; and

an actuator for moveably mounting at least one ring relative to said support structure

so that at least one of said substrates is moveably mounted on said support structure to allow adjustment of said substrate relative to said support structure.

2. A mirror assembly as recited in claim 1 wherein said actuator comprises an electro-actuatable element.

3. A mirror assembly as recited in claim 1 wherein said substrate is deformable and activation of said actuator deforms said substrate.

4. A mirror assembly as recited in claim 1 wherein said substrate is rigid and activation of said actuator translates said substrate relative to said support structure.

5. A mirror assembly as recited in claim 1 wherein each said substrate is mounted on a common support structure.

6. A mirror assembly as recited in claim 1 wherein said support structure is made of a material selected from the group of low coefficient of thermal expansion materials consisting of si-carbon fiber composite, SiC, invar and stainless steel.

7. A mirror assembly as recited in claim 1 wherein at least one substrate is mounted on a plurality of rings.

8. A mirror assembly as recited in claim 7 wherein said substrate is deformable.

9. A method for fabricating and aligning a light source collector mirror, said method comprising the steps of:

providing a support structure;

coating a plurality of discrete substrates with an EUV reflective multilayer coating;

providing a plurality of rings with at least one substrate mounted on at least one ring;

using an actuator to moveably mount said at least one ring to said support structure, and

activating said actuator to adjust at least one of the substrates relative to the support structure.

10. A method as recited in claim 9 wherein said mirror is an ellipsoidal mirror establishing first and second focal points and said method further comprises the steps of:

directing light from the first focal point toward the mirror for measurement at the second focal point, the light having a frequency in the visible spectrum; and

using the measurement to activate the actuator and align the substrate.

11. A method as recited in claim 9 wherein said activating step is performed after installation of the mirror in a light source and while the mirror is at elevated temperature.

12. An EUV light source mirror assembly comprising:

a support structure;

a plurality of substrates, each substrate being coated with a respective EUV reflective multilayer coating;

a plurality of rings with at least one substrate mounted on at least one ring; and

an actuator for moveably mounting at least one ring relative to said support structure.

13. A mirror assembly as recited in claim 12 wherein said actuator comprises an electro-actuatable element.

14. A mirror assembly as recited in claim 12 wherein said at least one substrate is deformable and said actuator is coupled to said at least one substrate in such a way that activation of said actuator deforms said substrate.

15. A mirror assembly as recited in claim 12 wherein said substrate is rigid and said actuator is coupled to said at least one substrate in such a way that activation of said actuator translates said at least one substrate relative to said support structure.

16. A mirror assembly as recited in claim 12 wherein said support structure is made of a material having a low coefficient of thermal expansion.

17. A mirror assembly as recited in claim 16 wherein said support structure is made of a material selected from the group consisting of si-carbon fiber composite, SiC, invar, and stainless steel.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 9, 2014
From: CYMER, LLC
To: ASML NETHERLANDS B.V.
Reel/Frame 032860/0748 →
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNEE CITY SAN ANTONIO PREVIOUSLY RECORDED ON REEL 031385 FRAME 0240. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNEE CORRECT CITY IS SAN DIEGO. Recorded Oct 15, 2013
From: BOWERING, NORBERT R.; FOMENKOV, IGOR V.
To: CYMER, LLC
Reel/Frame 031410/0701 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 10, 2013
From: BOWERING, NORBERT R.; FOMENKOV, IGOR V.
To: CYMER, LLC
Reel/Frame 031385/0240 →