Laser produced plasma EUV light source
View Patent ↗An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.
1. An EUV light source comprising:
a system for generating a plurality of targets;
a system generating pre-pulses and main-pulses, the pre-pulses for irradiating targets to produce expanded targets, the system comprising a continuously pumped laser device generating the main pulses, the main pulses for irradiating expanded targets to produce a burst of EUV light pulses, the system having a controller varying at least one pre-pulse parameter during the burst of EUV light pulses; and
metrology instrument operatively coupled with said controller for measuring an intensity of at least a portion of one EUV light pulse within the burst of EUV light pulses generated by main pulses irradiation and for generating a feedback signal responsive to the measuring and for providing the feedback signal to the controller for varying responsive to the feedback signal at least one pre-pulse parameter, wherein the measuring, the providing feedback signal, and the varying occur during the burst of EUV light pulses.
2. A light source as recited in claim 1 wherein the pre-pulse parameter is a delay time between a pre-pulse and a main pulse.
3. A light source as recited in claim 1 wherein the pre-pulse parameter is a pulse energy of the pre-pulse.
4. A light source as recited in claim 1 wherein the controller varies pulse energy of the pre-pulse and a delay time between a pre-pulse and a main pulse.
5. A light source as recited in claim 1 wherein the pre-pulse pass through the continuously pumped laser device.
6. A light source as recited in claim 1 wherein the pre-pulse parameter is a discharge voltage employed to generate at least one pre-pulse.
7. A light source as recited in claim 1 wherein the main pulses are generated using a Master Oscillator/Power Amplifier (MOPA) configured laser arrangement.
8. A light source as recited in claim 1 wherein the main pulses are generated using a Master Oscillator/Power Oscillator (MOPO) configured laser arrangement.
9. A light source as recited in claim 1 wherein the main pulses are generated using a Power Oscillator/Power Amplifier (POPA) configured laser arrangement.
10. A light source as recited in claim 1 wherein the main pulses are generated using a CO 2 laser.
11. A light source as recited in claim 1 wherein the pre-pulses are generated using a CO 2 laser.
12. A light source as recited in claim 1 wherein the pre-pulses are generated sing an excimer laser.
13. A light source as recited in claim 1 wherein the pre-pulses are generated using a solid state laser.
14. An EUV light source comprising:
a system for generating a plurality of targets;
a system generating laser pre-pulses and laser main-pulses, the laser pre-pulses for irradiating the plurality of targets to produce expanded targets, the laser main pulses for irradiating expanded targets to produce a burst of EUV light pulses, the system having a controller varying at least one laser pre-pulse parameter during the burst of EUV light pulses, the burst of EUV light pulses configured for use to expose a wafer during photolithography; and
an instrument measuring an intensity of at least a portion of one EUV light pulse within the burst of EUV light pulses and providing a feedback signal responsive to the measuring to the controller to vary at least one laser pre-pulse parameter during the burst of EUV light pulses such that a subsequent laser pre-pulse during the burst of EUV light pulses is different than a prior laser pre-pulse during the burst of EUV light pulses with respect to the at least one laser pre-pulse parameter
metrology instrument operatively coupled with said controller for measuring an intensity of at least a portion of one EUV light pulse within the burst of EUV light pulses and for generating a feedback signal responsive to the measuring and for providing the feedback signal to the controller for varying responsive to the feedback signal at least one pre-pulse parameter during the burst of EUV light pulses such that a subsequent laser pro-pulse during the burst of EUV light pulses is different than a prior laser pre-pulse during the burst of EUV light pulses with respect to the at least one laser pre-pulse parameter, wherein the measuring, the providing feedback signal, and the varying occur during the burst of EUV light pulses.
15. A light source as recited in claim 14 wherein the laser pre-pulse parameter is a delay time between a laser pre-pulse and a laser main pulse.
16. A light source as recited in claim 14 wherein the laser pro-pulse parameter is a pulse energy of the laser pre-pulse.
17. A light source as recited in claim 14 wherein the controller varies pulse energy of the laser pre-pulse and a delay time between a laser pre-pulse and a laser main pulse.
18. A light source as recited in claim 14 herein the laser pre-pulses pass through the continuously pumped laser device.
19. A light source as recited in claim 14 wherein the laser pre-pulse parameter is a discharge voltage employed to generate at least one laser pre-pulse.
20. A light source as recited in claim 14 wherein the laser main pulses are generated using a Master Oscillator/Power Amplifier (MOPA) configured laser arrangement.