IP Library Granted Patent US 8,525,389
Granted Patent B2
US 8,525,389 · App. 12/943,269 · Granted Sep 3, 2013

MEMS device with protection rings

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Quick Facts
Patent No.
US 8,525,389
App. No.
12/943,269
Granted
Sep 3, 2013
Kind
B2
Abstract

A microelectromechanical system (MEMS) device and a method for fabricating the same are described. The MEMS device includes a first electrode and a second electrode. The first electrode is disposed on a substrate, and includes at least two metal layers, a first protection ring and a dielectric layer. The first protection ring connects two adjacent metal layers, so as to define an enclosed space between two adjacent metal layers. The dielectric layer is disposed in the enclosed space and connects two adjacent metal layers. The second electrode is disposed on the first electrode, wherein a cavity is formed between the first electrode and the second electrode.

Claims (13)

1. A microelectromechanical system (MEMS) device, comprising:

a first electrode, disposed on a substrate and comprising:

at least two metal layers;

a first protection ring, connecting two adjacent metal layers, so as to define an enclosed space between two adjacent metal layers; and

a dielectric layer, disposed in the enclosed space and connecting two adjacent metal layers; and

a second electrode, disposed on the first electrode, wherein a cavity is formed between the first electrode and the second electrode.

2. The MEMS device according to claim 1 , wherein the first protection ring substantially corresponds to a profile of each metal layer.

3. The MEMS device according to claim 1 , wherein the first protection ring comprises metal.

4. The MEMS device according to claim 1 , wherein the first electrode further comprising at least one second protection ring disposed in the enclosed space and connecting two adjacent metal layers.

5. The MEMS device according to claim 4 , wherein the second protection ring comprises metal.

6. The MEMS device according to claim 1 , wherein the first electrode further comprises a plurality of vent holes.

7. The MEMS device according to claim 1 , wherein the second electrode comprises a first insulating layer, a second insulating layer, and a conductive layer located between the first insulating layer and the second insulating layer.

8. The MEMS device according to claim 1 , wherein the first electrode and the second electrode are suspended on the substrate.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 26, 2021
From: UNITED MICROELECTRONICS CORPORATION
To: MARLIN SEMICONDUCTOR LIMITED
Reel/Frame 056991/0292 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 10, 2010
From: TAN, TZUNG-HAN; LAN, BANG-CHIANG; WANG, MING-I; HUANG, CHIEN-HSIN; LIN, MENG-JIA
To: UNITED MICROELECTRONICS CORP.
Reel/Frame 025303/0926 →