Semiconductor device with dummy contacts
A semiconductor device includes a semiconductor substrate including a cell region and a core region adjacent to the cell region, active regions in the cell region and the core region, an interlayer insulating layer covering the active regions, upper cell contacts penetrating the interlayer insulating layer in the cell region, the upper cell contacts being adjacent to each other along a first direction and being electrically connected to the active regions, and core contacts penetrating the interlayer insulating layer in the active regions of the core region, the core contacts being adjacent to each other along the first direction and including upper connection core contacts electrically connected to the active regions, and dummy contacts adjacent to the upper connection core contacts, the dummy contacts being insulated from the active regions.
1. A semiconductor device, comprising:
a semiconductor substrate including a cell region and a core region adjacent to the cell region;
active regions in the cell region and the core region;
an interlayer insulating layer covering the active regions;
upper cell contacts penetrating the interlayer insulating layer in the cell region, the upper cell contacts being adjacent to each other along a first direction and being electrically connected to the active regions; and
core contacts penetrating the interlayer insulating layer in the active regions of the core region, the core contacts being adjacent to each other along the first direction and including:
upper connection core contacts electrically connected to the active regions, and
dummy contacts adjacent to the upper connection core contacts, the dummy contacts being insulated from the active regions.
2. The semiconductor device as claimed in claim 1 , further comprising at least one interconnection extending in a second direction substantially perpendicular to the first direction, the interconnection connecting the upper cell contacts to the core contacts.
3. The semiconductor device as claimed in claim 1 , wherein:
the interlayer insulating layer includes a first interlayer insulating layer and a second interlayer insulating layer, the first and second interlayer insulating layers being sequentially stacked on the semiconductor substrate, and
the upper cell contacts and the core contacts penetrate the second interlayer insulating layer.
4. The semiconductor device as claimed in claim 3 , further comprising lower cell contacts and lower connection core contacts penetrating the first interlayer insulating layer,
wherein the upper cell contacts are electrically connected to the active regions of the cell region through the lower cell contacts, and the upper connection core contacts are electrically connected to the active regions of the core region through the lower connection core contacts, and
wherein the dummy contacts are insulated from the active regions by the first interlayer insulating layer.
5. The semiconductor device as claimed in claim 4 , wherein each upper surface of the upper cell contacts and the core contacts is coplanar with an upper surface of the second interlayer insulating layer, and each upper surface of the lower cell contacts is coplanar with an upper surface of the first interlayer insulating layer.
6. The semiconductor device as claimed in claim 4 , further comprising contact pads between the first interlayer insulating layer and each of the upper cell contacts and the upper connection core contacts, each contact pad having a larger width than a width of a corresponding upper surface of a lower cell contact or a lower connection core contact.
7. The semiconductor device as claimed in claim 1 , wherein each upper connection core contact is between two dummy contacts along the first direction.
8. The semiconductor device as claimed in claim 1 , wherein the upper cell contacts are arranged at a first pitch in the first direction and the core contacts are arranged at a second pitch in the first direction, the second pitch being equal to or larger than the first pitch.
9. The semiconductor device as claimed in claim 1 , wherein:
the active regions extend in a second direction substantially perpendicular to the first direction, the active regions being adjacent to each other along the first direction, and
a plurality of upper connection core contacts are positioned to contact the adjacent active regions, the upper connection core contacts being adjacent to each other along a third direction nonparallel to the first or second directions.
10. The semiconductor device as claimed in claim 1 , wherein a cross-section of the upper cell contacts and the core contacts has a circular or an oval shape, the cross-section being along a plane parallel to a surface supporting the semiconductor substrate.
11. The semiconductor device as claimed in claim 1 , wherein the upper cell contacts have a substantially same width in the first direction as the core contacts.
12. The semiconductor device as claimed in claim 1 , wherein each upper surface of the upper cell contacts and the core contacts is coplanar with an uppermost surface of the interlayer insulating layer.
13. The semiconductor device as claimed in claim 1 , further comprising:
contact pads in the interlayer insulating layer, each of the upper cell contacts and the upper connection core contacts being between a respective contact pad and an uppermost surface of the interlayer insulating layer; and
lower cell contacts and lower connection core contacts penetrating the interlayer insulating layer and connected to respective upper cell contacts and upper connection core contacts via the contact pads, each contact pad having a larger width than a width of a corresponding upper surface of a lower cell contact or a lower connection core contact.
14. The semiconductor device as claimed in claim 1 , wherein each dummy contact is on a corresponding active region, a portion of the interlayer insulating layer separating each dummy contact from the corresponding active region.
15. The semiconductor device as claimed in claim 8 , wherein the second pitch is equal to the first pitch.