Semiconductor device

1. A semiconductor device, comprising:

an insulating film formed on a substrate;

an interconnect layer including a plurality of interconnects formed in the insulating film; and

a pad formed on the insulating film,

wherein, in a region containing at least a part of a section below the pad, a narrow spacing region is formed, where a spacing between the adjacent interconnects is shorter than that in a section outside the region containing at least a part of the section below the pad.

2. The semiconductor device of claim 1 , wherein

the width of each of the plurality of interconnects inside the narrow spacing region is shorter than that outside the narrow spacing region.

3. The semiconductor device of claim 1 , wherein

the plurality of interconnects include an interconnect which has a single section outside the narrow spacing region, and which is branched into more than two sections inside the narrow spacing region.

4. The semiconductor device of claim 1 , wherein

the plurality of interconnects include a non-electrically-connected dummy interconnect arranged inside the narrow spacing region.

5. The semiconductor device of claim 1 , wherein

at least a single test region is further provided on the pad and above the narrow spacing region.

6. The semiconductor device of claim 1 , wherein

at least a single bump is formed on the pad and above the narrow spacing region.

7. The semiconductor device of claim 1 , wherein

at least a single wire is connected to a section on the pad and above the narrow spacing region.

8. The semiconductor device of claim 1 , wherein

at least a spacing between two interconnects is shortened so as to define a tapered shape from an outside of the narrow spacing region toward an inside of the narrow spacing region.

9. The semiconductor device of claim 1 , wherein

the plurality of interconnects are formed in the same layer.