IP Library Granted Patent US 8,519,367
Granted Patent B2
US 8,519,367 · App. 13/000,733 · Granted Aug 27, 2013

Extreme UV radiation generating device comprising a corrosion-resistant material

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Quick Facts
Patent No.
US 8,519,367
App. No.
13/000,733
Granted
Aug 27, 2013
Kind
B2
Abstract

The invention relates to an improved EUV generating device having coated supply pipes for the liquid tin, in order to provide an extreme UV radiation generating device which is capable of providing a less contaminated flow of tin to and from a plasma generating part.

Claims (14)

1. A device for generating extreme ultra violet (EUV) radiation, the device comprising:

a plasma generator;

at least one tin supply system having a supply reservoir in fluid communication with said plasma generator; and

at least one supply pipe configured to supply said plasma generator with liquid tin from said tin supply system, said supply pipe is at least partly coated with at least one covalent inorganic solid material.

2. The device of claim 1 , wherein the at least one covalent inorganic solid material comprises a solid material selected from oxides, nitrides, borides, phosphides, carbides, sulfides, silicide, and mixtures thereof.

3. The device of claim 1 , wherein the covalent inorganic solid material comprises at least one material with a melting point of ≧1000° C.

4. The device of claim 1 , wherein the covalent inorganic solid material comprises at least one material with a density of ≧2 g/cm 3 and ≦8 g/cm 3 .

5. The device according to claim 1 , wherein the covalent inorganic solid material comprises at least one material selected from oxides, nitrides, borides, phosphides, carbides, sulfides, and silicides of Mg, Al, Si, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Y, Zr, Nb, Mo, Tc, Ru, Rh, Pd, Ag, Cd, In, Sn, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Hf, Ta, W, Re, Os, Ir, Pt, Au, and mixtures thereof.

6. A device for generating extreme ultra violet (EUV) radiation, the device comprising:

a plasma generator;

at least one tin supply system having a supply reservoir in fluid communication with said plasma generator; and

at least one supply pipe configured to supply said plasma generator with liquid tin from said tin supply system, said supply pipe is at least partly coated with at least one metal selected from the group consisting of IVb, Vb, VIb, and/or VIIIb metals or mixtures thereof.

7. The device according to claim 6 , wherein the thickness of the metallic coating is ≧100 nm and ≦100 μm.

8. The device according to claim 6 , wherein the roughness of the metallic coating is ≧1 nm and ≦1 μm.

Assignments (5)
CORRECTIVE ASSIGNMENT TO CORRECT THE EFFECTIVE DATE PREVIOUSLY RECORDED AT REEL: 049771 FRAME: 0112. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Jul 30, 2019
From: KONINKLIJKE PHILIPS N.V.
To: USHIO DENKI KABUSHIKI KAISHA
Reel/Frame 049897/0339 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 17, 2019
From: KONINKLIJKE PHILIPS N.V.
To: USHIO DENKI KABUSHIKI KAISHA
Reel/Frame 049771/0112 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 20, 2014
From: XTREME TECHNLOGIES GMBH
To: USHIO DENKI KABUSHIKI KAISHA
Reel/Frame 033978/0281 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 14, 2011
From: KONINKLIJKE PHILIPS ELECTRONICS, N.V.
To: XTREME TECHNOLOGIES GMBH
Reel/Frame 025801/0092 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 22, 2010
From: METZMACHER, CHRISTOF; WEBER, ACHIM
To: KONINKLIJKE PHILIPS ELECTRONICS N V
Reel/Frame 025560/0489 →