Patent Assignment
Reel/Frame 049771/0112
Assignment of Assignor's Interest
Recorded: 2019-07-17
Pages: 6
Assignor
KONINKLIJKE PHILIPS N.V.
Executed: 2019-02-14
Assignee
USHIO DENKI KABUSHIKI KAISHA
1-6-5 MARUNOUCHI, CHIYODA-KU,, TOKYO, 100-8150, JAPAN
Covered Properties
(29)
Method of Generating Extreme Ultraviolet Radiation
Gas Discharge Lamp for Extreme Uv Radiation
Method and Device for the Generation of a Plasma Through Electric Discharge in a Discharge Space
Device for and Method of Generating Extreme Ultraviolet and/or Soft-X-Ray Radiation by Means of a Plasma
Method and Device for Cleaning at Least One Optical Component
Method of Cleaning at Least One Surface of an Optical Device Disposed in a Vacuum Chamber
Method and Device for Generating Euv Radiation and/or Soft X-Ray Radiation
Optical System Having a Clearning Arrangement
Method and Apparatus for Generating Radiation in the Wavelength Range from About 1 Nm to About 30 Nm, and Use in a Lithography Device or in Metrology
Gas Discharge Source, in Particular for Euv Radiation
Debris Mitigation System with Improved Gas Distribution
Method of Cleaning and After Treatment of Optical Surfaces in an Irradiation Unit
Method of Cleaning Optical Surfaces of an Irradiation Unit in a Two-Step Process
Method of Increasing the Conversion Efficiency of an Euv and/or Soft X-Ray Lamp and a Corresponding Apparatus
Method of Cleaning a Surface Region Covered with Contaminant or Undesirable Material
Euv Plasma Discharge Lamp with Conveyor Belt Electrodes
Optical Device and Method of in Situ Treating an Euv Optical Component to Enhance a Reduced Reflectivity
Rotating Wheel Electrode Device for Gas Discharge Sources Comprising Wheel Cover for High Power Operation
Electrode Device for Gas Discharge Sources and Method of Operating a Gas Discharge Source Having This Electrode Device
Gas Discharge Source for Generating Euv-Radiation
Debris Mitigation Device with Rotating Foil Trap and Drive Assembly
Extreme Uv Radiation Reflecting Element Comprising a Sputter-Resistant Material
Extreme Uv Radiation Generating Device Comprising a Corrosion-Resistant Material
Extreme Uv Radiation Generating Device Comprising a Contamination Captor
Method and Device for Generating Euv Radiation or Soft X-Rays
Method and Device for Generating Euv Radiation or Soft X-Rays with Enhanced Efficiency
Foil Trap Device with Improved Heat Resistance
Electrode System, in Particular for Gas Discharge Light Sources
Optical Device and Method of in Situ Treating an Euv Optical Component to Enhance a Reduced Reflectivity
Related Assignments
(4)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Dec 2, 2009
From: MALIBU RESEARCH ASSOCIATES, INC.
To: COMMUNICATIONS & POWER INDUSTRIES, INC.
Reel/Frame 023596/0221 →
Assignment of Assignor's Interest
Dec 29, 2014
From: ZINK, PETER; PANKERT, JOSEPH ROBERT RENE; DERRA, CUENTHER HANS; WEBER, ACHIM
To: KONINKLIJKE PHILIPS ELECTRONICS N.V.
Reel/Frame 034593/0016 →
Change of Name and Address
Jul 17, 2019
From: KONINKLIJKE PHILIPS ELECTRONICS, N.V.
To: KONINKLIJKE PHILIPS N.V.
Reel/Frame 049772/0209 →
Corrective Assignment to Correct the Effective Date Previously Recorded at Reel: 049771 Frame: 0112. Assignor(S) Hereby Confirms the Assignment.
Jul 30, 2019
From: KONINKLIJKE PHILIPS N.V.
To: USHIO DENKI KABUSHIKI KAISHA
Reel/Frame 049897/0339 →