POLARIZATION-INFLUENCING OPTICAL ARRANGEMENT AND AN OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
A polarization-influencing optical arrangement includes a pair, which includes a first lambda/2 plate and a second lambda/2 plate. The first and second lambda/2 plates partially overlap each other forming an overlap region and at least one non-overlap region.
1 . An arrangement, comprising:
a first lambda/2 plate; and
a second lambda/2 plate;
wherein:
the first and second lambda/2 plates partially overlap each other to provide an overlap region and a non-overlap region.
2 . The arrangement of claim 1 , wherein:
the first and second lambda/2 plates provide first and second non-overlap regions;
the overlap region is between the first and second non-overlap regions;
the first lambda/2 plate is in the first non-overlap region;
the second lambda/2 plate is not in the first non-overlap region;
the second lambda/2 plate is in the second non-overlap region; and
the first lambda/2 plate is not in the first non-overlap region.
3 . The arrangement of claim 1 , wherein the overlap region is in the shape of a segment of a circle, and the non-overlap region is in the shape of a segment of a segment of a circle.
4 . The arrangement of claim 3 , wherein the segment of the overlap region has a different opening angle from an opening angle of the segment of the non-overlap region.
5 . The arrangement of claim 1 , wherein:
the first lambda/2 plate has a first fast axis of the birefringence;
the second lambda/2 plate has a second fast axis of the birefringence; and
the first and second fast axes are arranged at an angle of 45°±5° relative to each other.
6 . The arrangement of claim 1 , wherein the arrangement is configured so that during use:
a plane of vibration of a first linearly polarized light beam incident on the arrangement in the overlap region is rotated through a first angle of rotation;
a plane of vibration of a second linearly polarized light beam incident on the arrangement in the non-overlap region is rotated through a second angle of rotation; and
the first angle of rotation is different from the second angle of rotation.
7 . The arrangement of claim 6 , wherein the arrangement is configured so that during use:
the second linearly polarized light beam passes through the first lambda/2 plate;
the second linearly polarized light beam does not pass through the second lambda/2 plate;
a third linearly polarized light beam passes through the second lambda/2 plate;
the third linearly polarized light beam does not pass through the first lambda/2 plate;
a plane of vibration of the third linearly polarized light beam is rotated through a third angle of rotation; and
the second angle of rotation is different from the third angle of rotation.
8 . The arrangement of claim 7 , wherein the second and third angles of rotation have the same magnitude but opposite sign.
9 . The arrangement of claim 1 , wherein the first and second lambda/2 plates form a 90° rotator in the overlap region.
10 . The arrangement of claim 1 , further comprising third and fourth lambda/2 plates,
wherein:
the first and second lambda/2 plates are arranged on a first side of an axis of symmetry of the arrangement;
the third and fourth lambda/2 plates are arranged on a second side of the axis of symmetry of the arrangement; and
the first side of the axis of symmetry of the arrangement is opposite the second side of the axis of symmetry of the arrangement.
11 . An optical system, comprising:
an arrangement according to claim 1 ,
wherein the optical system is configured to be used in a microlithographic projection exposure apparatus.
12 . The optical system of claim 11 , wherein the arrangement is configured so that the overlap and non-overlap regions are at least partially within an optically effective region of the optical system.
13 . The optical system of claim 11 , wherein, during use of the optical system, the arrangement converts a light beam incident on the arrangement and having a linear polarization distribution with a preferred polarization direction that is constant over a cross-section of the light beam into an approximately tangential polarization distribution.
14 . The optical system of claim 11 , wherein the arrangement is configured so that during use of the optical system:
the first lambda/2 plate has a first fast axis of birefringence which extends at an angle of 22.5°±2° relative to a preferred polarization direction of a light beam incident on the arrangement; and
the second lambda/2 plate has a second fast axis of birefringence which extends at an angle of −22.5°±2° relative to the preferred polarization direction of the light beam incident on the arrangement.
15 . The optical system of claim 11 , wherein the optical system is an illumination system.
16 . The optical system of claim 11 , wherein the optical system is a projection objective.
17 . An apparatus, comprising:
an illumination system; and
a projection objective,
wherein the illumination system and/or the projection objective comprises an arrangement according to claim 1 , and the apparatus is a microlithographic projection exposure apparatus.
18 . The apparatus of claim 17 , wherein the illumination system comprises an arrangement according to claim 1 .
19 . The apparatus of claim 17 , wherein the projection objective comprises an arrangement according to claim 1 .
20 . A process, comprising:
using a microlithographic projection exposure apparatus to produce microstructured components,
wherein the microlithographic projection exposure apparatus comprises an illumination system and a projection objective, and the illumination system and/or the projection objective comprises an arrangement according to claim 1 .