Underlayer coating composition and processes thereof
View Patent ↗The invention relates to an underlayer coating composition comprising a polymer, where the polymer comprises at least one hydroxyaromatic unit in the backbone of the polymer phenol which has a pendant group comprising a fluoro or iodo moiety, and at least one unit comprising an aminoplast. The invention further relates to a process for forming an image using the composition, especially for EUV.
1. An underlayer coating composition comprising a polymer, where the polymer comprises at least one hydroxyaromatic unit in the backbone of the polymer comprising a fluoro or iodo moiety, and at least one unit comprising an aminoplast, further where the hydroxyaromatic unit with the fluoro moiety has structure (1),
where, R 1 is fluoro moiety, R 2 is fluoro moiety and R 3 is selected from a group consisting of an iodo moiety, a fluoro moiety, hydrogen, hydroxyl, (C 1 -C 4 )alkyl, hydroxy(C 1 -C 4 )alkyl, OC 1 -C 4 alkyl, (C═O)(C 1 -C 4 )alkyl, C 1 -C 4 alkylO(C 1 -C 4 )alkyl, C 1 -C 4 alkyl(C═O)(C 1 -C 4 )alkyl and C(O)O(C 1 -C 4 )alkyl.
2. The composition of claim 1 , where the fluoro moiety is selected from F, C 1 -C 4 fluoroalkyl, C 1 -C 4 hydroxyfluoroalkyl, OC 1 -C 4 fluoroalkyl C(O)(C 1 -C 4 )fluoroalkyl, and C(O)O(C 1 -C 4 )fluoroalkyl.
3. The composition of claim 1 , where the unit comprising an aminoplast is derived from a glycoluril monomer.
4. The composition of claim 1 , where the unit comprising an aminoplast is derived from a urea/formaldehyde oligomer.
5. The composition of claim 1 , where the polymer further comprises a phenolic unit free of a fluoro or iodo moiety.
6. The composition of claim 1 , where the composition further comprises a thermal acid generator.
7. The composition of claim 1 , where the composition further comprises a polyester polymer.
8. The composition of claim 1 , where the composition further comprises a glycoluril polymer different from the polymer of claim 1 .
9. The composition of claim 1 , wherein the hydroxyaromatic unit is naphthol.
10. The composition of claim 1 further comprising a solvent.
11. The composition of claim 1 further comprising a secondary polymer.
12. The composition or polymer of claim 1 having a fluoro or iodo content in the range of 1% to 30% by weight.
13. The composition of claim 1 , where the hydroxyaromatic unit is derived from
14. The composition of claim 1 , where the composition is free of an external crosslinker.
15. A process for manufacturing a microelectronic device, comprising;
a) providing a substrate with a layer of an underlayer coating composition from claim 1 ;
b) coating a photoresist layer above the underlayer coating ;
c) imagewise exposing the photoresist layer;
d) developing the photoresist layer with an aqueous alkaline developing solution.
16. The process of claim 15 , where the underlayer coating layer has k value in the range of about 0.05 to about 1.0.
17. The process of claim 15 , where the underlayer coating layer has k value in the range of about 0.05 to about 0.5.
18. The process of claim 15 , where the photoresist is imageable with radiation from about 260 nm to about 12 nm.
19. The process according to claim 15 , where the developing solution is an aqueous solution comprising a hydroxide base.
20. The composition of claim 1 , where the hydroxyaromatic unit with the iodo moiety has structure (1),
where, R 1 is selected from an iodo moiety, R 2 and R 3 are independently selected from an iodo moiety, a fluoro moiety, hydrogen, hydroxyl, (C 1 -C 4 )alkyl, hydroxy(C 1 -C 4 )alkyl, OC 1 -C 4 alkyl, (C═O)(C 1 -C 4 )alkyl, C 1 -C 4 alkylO(C 1 -C 4 )alkyl, C 1 -C 4 alkyl(C═O)(C 1 -C 4 )alkyl, C(O)O(C 1 -C 4 )alkyl and R 2 and R 3 are connected to form hydroxyaromatic ring fused to the phenol.