Substrate treatment apparatus and substrate treatment method
View Patent ↗A substrate treatment apparatus is provided, which includes: a seal chamber including a chamber body having an opening, a lid member provided rotatably with respect to the chamber body and configured to close the opening, and a first liquid seal structure which liquid-seals between the lid member and the chamber body, the seal chamber having an internal space sealed from outside; a lid member rotating unit which rotates the lid member; a substrate holding/rotating unit which holds and rotates a substrate in the internal space of the seal chamber; and a treatment liquid supplying unit which supplies a treatment liquid to the substrate rotated by the substrate holding/rotating unit.
1. A substrate treatment method comprising:
a step of preparing a seal chamber defining a sealed internal space, the seal chamber preparing step including a step of closing an opening of a chamber body with a lid member rotatable with respect to the chamber body, and a step of liquid sealing between the lid member and the chamber body with a first liquid seal structure, so as to define the sealed internal space sealed from outside;
a step of placing a substrate in the sealed internal space of the seal chamber and rotating the substrate in the sealed internal space;
a step of supplying a treatment liquid to the substrate in the sealed internal space of the seal chamber, the treatment liquid supplying step being performed while the substrate is rotated in the substrate rotating step;
a first locating step of locating the substrate and the lid member in a drying positional relationship in which the substrate is located closer to the lid member than in the treatment liquid supplying step within the sealed internal space of the seal chamber sealed with the lid member and the first liquid seal structure; and
a drying step of rotating the lid member and the substrate at a predetermined drying rotation speed with the substrate and the lid member being located in the drying positional relationship within the sealed internal space of the seal chamber sealed with the lid member and the first liquid seal structure.
2. The substrate treatment method according to claim 1 , further comprising:
a second locating step of locating the substrate and the lid member in a lid cleaning positional relationship in which the substrate is located closer to the lid member than in the treatment liquid supplying step within the sealed internal space of the seal chamber sealed with the lid member and the first liquid seal structure; and
a lid member cleaning step of rotating the lid member at a predetermined lid cleaning rotation speed and spouting a cleaning liquid toward the lid member from a cleaning liquid spouting unit with the substrate and the lid member being located in the lid cleaning positional relationship within the sealed internal space of the seal chamber sealed with the lid member and the first liquid seal structure.
3. The substrate treatment method according to claim 2 , wherein the drying positional relationship is defined such that the substrate is located closer to the lid member than in the lid member cleaning step.