Method of manufacturing multi-level metal thin film and apparatus for manufacturing the same
Provided are methods and apparatuses for manufacturing a multilayer metal thin film without additional heat treatment processes. The method of manufacturing a multilayer metal thin film including steps of: (a) forming a first metal layer on a substrate by flowing a first metal precursor into a first reaction container; and (b) forming a second metal layer on the first metal layer by flowing a second metal precursor into a second reaction container, wherein the step (b) is performed in a range of a heat treatment temperature of the first metal layer so that the second metal layer is formed as the first metal layer is heat-treated.
1. A method of manufacturing a multilayer metal thin film, comprising steps of:
(a) forming a cobalt (Co) layer on a substrate by flowing a cobalt (Co) precursor into a first reaction container; and,
(b) forming a titanium (Ti) layer on the cobalt (Co) layer by flowing a titanium (Ti) precursor into a second reaction container without prior heat treatment of the cobalt (Co) layer,
wherein forming the titanium (Ti) layer and a heat treatment of the cobalt (Co) layer to remove carbon included in the cobalt (Co) layer are simultaneously performed at a temperature between 450° C. and 550° C.
2. The method of claim 1 , further comprising a step (c) of nitrating a surface of the titanium (Ti) layer in the second reaction container.
3. The method of claim 2 , wherein in the step (b), plasma processing is further performed on the cobalt (Co) layer by applying plasma to the second reaction container.
4. The method of claim 3 , wherein the plasma is based on a gas including hydrogen.
5. The method of claim 4 , wherein the gas including hydrogen is hydrogen (H 2 ) or ammonia (NH 3 ).