Pattern measurement apparatus and pattern measurement method

1. A pattern measurement apparatus comprising:

an irradiation unit for irradiating a sample with an electron beam;

an electron detection unit for detecting an amount of electrons generated, by the electron beam radiation, from the sample on which a pattern is formed;

an image processor for generating an SEM image of the pattern on the basis of the amount of electrons; and

a controller for acquiring a rectangular measurement specification region specifying a measurement target portion of the SEM image, and then calculating a loss ratio of a corner portion of the pattern from an area of the measurement specification region and an area of the corner portion of the pattern,

wherein the controller sets a position of the rectangular measurement specification region so that a pair of corners arranged on an oblique of the rectangular measurement specific region contains a corner portion of the pattern, and then sets the corner of the rectangular measurement specific region coincides with a side of the pattern of the SEM image;

wherein the controller detects an average value of edge positions in a predetermined range of the pattern of the SEM image, where the predetermined range includes a position that the corner of the rectangular measurement specification region and the side of the pattern of the SEM image intersect with each other; and

wherein the controller moves the rectangular measurement specification region so that the corners of the rectangular measurement specification region coincide with the edge positions corresponding to an average value of side positions of the pattern of the SEM image.

2. The pattern measurement apparatus according to claim 1 , wherein the controller calculates an average position of the edge position in the predetermined range, and moves the measurement specification region in such a way that the corner of the measurement specification region coincides with the average position.

3. The pattern measurement apparatus according to claim 1 , wherein, when the edge position in the predetermined range continuously exists at coordinate positions outside a predetermined threshold range, the controller moves the measurement specification region in such a way that the corner coincides with a coordinate position outermost in a direction perpendicular to a side along an edge of the pattern of the measurement specification region among coordinate positions in the predetermined range.

4. The pattern measurement apparatus according to claim 1 , wherein, when the edge position in the predetermined range continuously exists at coordinate positions outside a predetermined threshold range, the controller moves the measurement specification region in such a way that the corner coincides with an average position of a length within the predetermined threshold range.

5. The pattern measurement apparatus according to claim 2 , wherein, when determining that the pattern has a shape in which a recessed corner and a protruding corner are formed continuously, the controller limits the range for acquiring the average value to a range within the measurement specification region.

6. The pattern measurement apparatus according to claim 1 , wherein the predetermined range includes the intersecting position as the center, and has a length that is a half of the length of a side of the measurement specification region.

7. A pattern measurement method in a pattern measurement apparatus including an irradiation unit for irradiating a sample with an electron beam; an electron detection unit for detecting an amount of electrons generated, by the electron beam radiation, from the sample on which a pattern is formed; and an image processor for generating an SEM image of the pattern on the basis of the amount of the electrons, the method comprising the steps of:

acquiring a rectangular measurement specification region specifying a measurement target portion of the SEM image;

setting a position of the rectangular measurement specification region so that a pair of corners arranged on an oblique of the rectangular measurement specific region contains a corner portion of the pattern, and then setting the corner of the rectangular measurement specific region coincides with a side of the pattern of the SEM image;

detecting an average value of edge positions in a predetermined range of the pattern of the SEM image, where the predetermined range includes a position that the corner of the rectangular measurement specification region and the side of the pattern of the SEM image intersect with each other; and

moving the rectangular measurement specification region so that the corners of the rectangular measurement specification region coincide with the edge positions corresponding to an average value of the side positions of the pattern of the SEM image.

8. The pattern measurement method according to claim 7 , wherein the step of adjusting the measurement specification region includes the steps of:

calculating an average position of edge positions in the predetermined range including the intersecting position; and

moving the measurement specification region in such a way that the corner coincides with the calculated average position.

9. The pattern measurement method according to claim 7 , wherein the step of adjusting the measurement specification region includes the steps of:

determining whether or not the edge position in the predetermined range is continuously detected at coordinate positions outside a predetermined threshold range; and

moving the measurement specification region in such a way that the corner coincides with a coordinate position outermost in a direction perpendicular to a side along an edge of the pattern of the measurement specification region among coordinate positions in the predetermined range when it is determined that the edge position is detected continuously at the coordinate positions.

10. The pattern measurement method according to claim 7 , wherein the step of adjusting the measurement specification region includes the steps of:

determining whether or not the edge position in the predetermined range is continuously detected at coordinate positions outside a predetermined threshold range; and

moving the measurement specification region in such a way that the corner coincides with an average position of a length within the predetermined threshold range when it is determined that the edge position is detected continuously at the coordinate positions.

11. The pattern measurement method according to claim 8 , wherein the step of adjusting the measurement specification region includes the steps of:

determining shapes of corners which are continuous; and

limiting the range for acquiring the average value to a range within the measurement specification region, when the continuous corners is determined to be in a pattern with a shape in which a recessed corner and a protruding corner exits continuously.

12. The pattern measurement method according to claim 7 , wherein the predetermined range includes the intersecting position as the center, and has a length that is a half of the length of a side of the measurement specification region.