IP Library Granted Patent US 9,136,818
Granted Patent B2
US 9,136,818 · App. 13/074,262 · Granted Sep 15, 2015

Stacked acoustic resonator comprising a bridge

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Quick Facts
Patent No.
US 9,136,818
App. No.
13/074,262
Granted
Sep 15, 2015
Kind
B2
Abstract

In accordance with a representative embodiment, a bulk acoustic wave (BAW) resonator structure, comprises: a first electrode disposed over a substrate; a first piezoelectric layer disposed over the first electrode; a second electrode disposed over the first piezoelectric layer; a second piezoelectric layer disposed over the second electrode; a third electrode disposed over the second piezoelectric layer; and a bridge disposed between the first electrode and the third electrode.

Claims (96)

1. A bulk acoustic wave (BAW) resonator structure, comprising:

a substrate comprising a cavity;

a first electrode disposed over the substrate;

a planarization layer disposed over the substrate and adjacent to the first electrode, the planarization layer not overlapping the cavity;

a first piezoelectric layer disposed over the first electrode;

a second electrode disposed over the first piezoelectric layer;

a second piezoelectric layer disposed over the second electrode;

a third electrode disposed over the second piezoelectric layer; and

a bridge disposed between the first electrode and the third electrode, the bridge extending past an edge of the cavity or acoustic reflector.

2. A BAW resonator structure as claimed in claim 1 , wherein the bridge is a first bridge, and the BAW resonator structure further comprises a second bridge disposed between the first electrode and the third electrode.

3. A BAW resonator structure as claimed in claim 2 , wherein the BAW resonator structure has a first perimeter bounding an active region of the BAW resonator structure, and the first bridge is disposed along the first perimeter.

4. A BAW resonator structure as claimed in claim 3 , the BAW resonator structure having a second perimeter bounding the active region of the BAW resonator structure, and a second bridge is disposed along the second perimeter.

5. A BAW resonator structure as claimed in claim 2 , wherein the first bridge comprises a fill material having an acoustic impedance.

6. A BAW resonator structure as claimed in claim 5 , wherein the fill material comprises non-etchable borosilicate glass (NEBSG).

7. A BAW resonator structure as claimed in claim 2 , wherein the second bridge comprises a fill material having an acoustic impedance.

8. A BAW resonator structure as claimed in claim 7 , wherein the fill material comprises non-etchable borosilicate glass (NEBSG).

9. A BAW resonator structure as claimed in claim 2 , wherein neither the first bridge nor the second bridge is disposed in the first electrode.

10. A BAW resonator structure as claimed in claim 1 , wherein the bridge comprises a fill material having an acoustic impedance.

11. A BAW resonator structure as claimed in claim 1 , wherein the bridge has a trapezoidal cross-sectional shape.

12. A BAW resonator structure as claimed in claim 1 , wherein the bridge comprises a first bridge disposed in the second electrode, and the BAW resonator structure further comprises a second bridge disposed in the third electrode.

13. A BAW resonator structure as claimed in claim 12 , wherein the first bridge is disposed along a first perimeter of the BAW resonator structure.

14. A BAW resonator structure as claimed in claim 13 , wherein the second bridge is disposed along a second perimeter of the BAW resonator structure.

15. A BAW resonator structure as claimed in claim 1 , wherein the bridge comprises a first bridge disposed in the first piezoelectric layer, and the BAW resonator structure further comprises a second bridge disposed in the second piezoelectric layer.

16. A BAW resonator structure as claimed in claim 15 , wherein the first bridge is disposed along a first perimeter of the BAW resonator structure.

17. A BAW resonator structure as claimed in claim 16 , wherein the second bridge is disposed along a second perimeter of the BAW resonator structure.

18. A BAW resonator structure as claimed in claim 1 , the planarization layer being a first planarization layer, and the BAW resonator structure further comprises a second planarization layer disposed over the first piezoelectric layer and adjacent to the second electrode, wherein the second planarization layer does not overlap the acoustic reflector.

19. A bulk acoustic wave (BAW) resonator structure, comprising:

a substrate comprising a cavity;

a first electrode disposed over the substrate;

a planarization layer disposed over the substrate and adjacent to the first electrode, the planarization layer not overlapping the cavity;

a first piezoelectric layer disposed over the first electrode;

a second electrode disposed over the first piezoelectric layer;

a second piezoelectric layer disposed over the second electrode;

a third electrode disposed over the second piezoelectric layer;

a bridge disposed between the first electrode and the third electrode, the bridge extending past an edge of the cavity or acoustic reflector; and

an inner raised region disposed over the third electrode.

20. A BAW resonator structure as claimed in claim 19 , further comprising an outer raised region disposed over the third electrode.

21. A BAW resonator structure as claimed in claim 19 , wherein the BAW resonator structure has a first perimeter bounding an active region of the BAW resonator structure, the bridge is disposed along the first perimeter, and the inner raised region is in the active region.

22. A BAW resonator structure as claimed in claim 19 , the planarization layer being a first planarization layer, and the BAW resonator structure further comprises a second planarization layer disposed over the first piezoelectric layer and adjacent to the second electrode, wherein the second planarization layer does not overlap the acoustic reflector.

23. A BAW resonator structure as claimed in claim 19 , wherein the bridge is a first bridge, and the BAW resonator structure further comprises a second bridge disposed between the first electrode and the third electrode.

24. A BAW resonator structure as claimed in claim 23 , wherein the first bridge comprises a fill material having an acoustic impedance.

25. A BAW resonator structure as claimed in claim 23 , wherein the second bridge comprises a fill material having an acoustic impedance.

26. A BAW resonator structure as claimed in claim 19 , wherein the BAW resonator structure has a first perimeter bounding an active region of the BAW resonator structure, and the bridge is disposed along the first perimeter.

27. A BAW resonator structure as claimed in claim 26 , wherein the BAW resonator structure has a second perimeter bounding the active region of the BAW resonator structure, and a second bridge is disposed along the second perimeter.

28. A BAW resonator structure as claimed in claim 19 , wherein the bridge comprises a fill material having an acoustic impedance.

29. A BAW resonator structure as claimed in claim 19 , wherein the bridge comprises a first bridge disposed in the second electrode, and the BAW resonator structure further comprises a second bridge disposed in the third electrode.

30. A BAW resonator structure as claimed in claim 29 , wherein the first bridge is disposed along a first perimeter of the BAW resonator structure.

31. A BAW resonator structure as claimed in claim 30 , wherein the second bridge is disposed along a second perimeter of the BAW resonator structure.

32. A BAW resonator as claimed in claim 19 , wherein the bridge comprises a first bridge disposed in the first piezoelectric layer, and the BAW resonator structure further comprises a second bridge disposed in the second piezoelectric layer.

33. A bulk acoustic wave (BAW) resonator structure, comprising:

a substrate comprising an acoustic reflector;

a first electrode disposed over the substrate;

a planarization layer disposed over the substrate and adjacent to the first electrode, the planarization layer not overlapping the acoustic reflector;

a first piezoelectric layer disposed over the first electrode;

a second electrode disposed over the first piezoelectric layer;

a second piezoelectric layer disposed over the second electrode;

a third electrode disposed over the second piezoelectric layer; and

a bridge disposed between the first electrode and the third electrode, the bridge extending past an edge of the acoustic reflector.

34. A BAW resonator structure as claimed in claim 33 , wherein the bridge is a first bridge, and the BAW resonator structure further comprises a second bridge disposed between the first electrode and the third electrode.

35. A BAW resonator structure as claimed in claim 34 , wherein the BAW resonator structure has a first perimeter bounding an active region of the BAW resonator structure, and the first bridge is disposed along the first perimeter.

36. A BAW resonator structure as claimed in claim 35 , the BAW resonator structure having a second perimeter bounding the active region of the BAW resonator structure, and the second bridge is disposed along the second perimeter.

37. A BAW resonator structure as claimed in claim 34 , wherein the first bridge comprises a fill material having an acoustic impedance.

38. A BAW resonator structure as claimed in claim 37 , wherein the first bridge is disposed along a first perimeter of the BAW resonator structure.

39. A BAW resonator structure as claimed in claim 37 , wherein the fill material comprises non-etchable borosilicate glass (NEBSG).

40. A BAW resonator structure as claimed in claim 34 , wherein the second bridge comprises a fill material having an acoustic impedance.

41. A BAW resonator structure as claimed in claim 34 , wherein neither the first bridge nor the second bridge is disposed in the first electrode.

42. A BAW resonator structure as claimed in claim 33 , wherein the bridge comprises a fill material having an acoustic impedance.

43. A BAW resonator structure as claimed in claim 42 , wherein a second bridge is disposed along a second perimeter of the BAW resonator structure.

44. A BAW resonator structure as claimed in claim 42 , wherein the fill material comprises non-etchable borosilicate glass (NEBSG).

45. A BAW resonator structure as claimed in claim 33 , wherein the bridge has a trapezoidal cross-sectional shape.

46. A BAW resonator structure as claimed in claim 45 , wherein a second bridge is disposed along a second perimeter of the BAW resonator structure.

47. A BAW resonator structure as claimed in claim 33 , wherein the bridge is a first bridge disposed in the second electrode, and the BAW resonator structure further comprises a second bridge disposed in the third electrode.

48. A BAW resonator structure as claimed in claim 33 , wherein the bridge is a first bridge disposed in the first piezoelectric layer, and the BAW resonator structure further comprises a second bridge disposed in the second piezoelectric layer.

49. A bulk acoustic wave (BAW) resonator structure, comprising:

a substrate comprising an acoustic reflector;

a first electrode disposed over the substrate;

a planarization layer disposed over the substrate and adjacent to the first electrode, the planarization layer not overlapping the acoustic reflector;

a first piezoelectric layer disposed over the first electrode;

a second electrode disposed over the first piezoelectric layer;

a second piezoelectric layer disposed over the second electrode;

a third electrode disposed over the second piezoelectric layer;

a bridge disposed between the first electrode and the third electrode, the bridge extending past an edge of the acoustic reflector; and

an inner raised region disposed over the third electrode.

50. A BAW resonator structure as claimed in claim 49 , further comprising an outer raised region disposed over the third electrode.

51. A BAW resonator structure as claimed in claim 49 , wherein the BAW resonator structure has a first perimeter bounding an active region of the BAW resonator structure, the bridge is disposed along the first perimeter, and the inner raised region is in the active region.

52. A BAW resonator structure as claimed in claim 49 , the planarization layer being a first planarization layer, and the BAW resonator structure further comprises a second planarization layer disposed over the first piezoelectric layer and adjacent to the second electrode, wherein the second planarization layer does not overlap the acoustic reflector.

53. A BAW resonator structure as claimed in claim 49 , wherein the bridge is a first bridge, and the BAW resonator structure further comprises a second bridge disposed between the first electrode and the third electrode.

54. A BAW resonator structure as claimed in claim 53 , wherein the first bridge comprises a fill material having an acoustic impedance.

55. A BAW resonator structure as claimed in claim 53 , wherein the second bridge comprises a fill material having an acoustic impedance.

56. A BAW resonator structure as claimed in claim 49 , wherein the BAW resonator structure has a first perimeter bounding an active region of the BAW resonator structure, and the bridge is disposed along the first perimeter.

57. A BAW resonator structure as claimed in claim 56 , wherein the BAW resonator structure has a second perimeter bounding the active region of the BAW resonator structure, and a second bridge is disposed along the second perimeter.

58. A BAW resonator structure as claimed in claim 49 , wherein the bridge comprises a fill material having an acoustic impedance.

59. A BAW resonator structure as claimed in claim 49 , wherein the bridge comprises a first bridge disposed in the second electrode, and the BAW resonator structure further comprises a second bridge disposed in the third electrode.

60. A BAW resonator structure as claimed in claim 59 , wherein the first bridge is disposed along a first perimeter of the BAW resonator structure.

61. A BAW resonator structure as claimed in claim 60 , wherein the second bridge is disposed along a second perimeter of the BAW resonator structure.

62. A BAW resonator structure as claimed in claim 49 , wherein the bridge comprises a first bridge disposed in the first piezoelectric layer, and the BAW resonator structure further comprises a second bridge disposed in the second piezoelectric layer.

Assignments (8)
CORRECTIVE ASSIGNMENT TO CORRECT THE EXECUTION DATE PREVIOUSLY RECORDED AT REEL: 047422 FRAME: 0464. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER. Recorded Mar 6, 2019
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 048883/0702 →
MERGER Recorded Oct 5, 2018
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 047422/0464 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENTS Recorded Feb 3, 2017
From: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 041710/0001 →
PATENT SECURITY AGREEMENT Recorded Feb 11, 2016
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
Reel/Frame 037808/0001 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENT RIGHTS (RELEASES RF 032851-0001) Recorded Feb 2, 2016
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 037689/0001 →
PATENT SECURITY AGREEMENT Recorded May 8, 2014
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 032851/0001 →
MERGER Recorded May 7, 2013
From: AVAGO TECHNOLOGIES WIRELESS IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 030369/0471 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 29, 2011
From: BURAK, DARIUSZ; SHIRAKAWA, ALEXANDRE; BADER, STEFAN
To: AVAGO TECHNOLOGIES WIRELESS IP (SINGAPORE) PTE. LTD.
Reel/Frame 026038/0121 →