Processes and compositions for forming photovoltaic devices with base metal buss bars
View Patent ↗A photovoltaic cell such as a solar cell is disclosed. The cell comprises (a) a semiconductor substrate having a front surface, (b) one or more anti-reflection coating layers on the front surface of the semiconductor substrate, (c) a plurality of silver-containing fingers in contact with the one or more anti-reflection coating layers and in electrical contact with the semiconductor substrate; and (d) one or more base metal containing buss bars each in contact with the one or more anti-reflection coating layers and the silver-containing fingers. The base metal may be selected from one or more of copper, nickel, lead, tin, iron, indium, zinc, bismuth and cobalt. Methods for making protovoltaic cells with base metal containing buss bars are also disclosed.
1. A method for making a photovoltaic device, comprising:
(a) providing a silicon substrate;
(b) forming an anti-reflection coating on said silicon substrate;
(c) applying a silver-containing thick-film paste on said anti-reflection coating so as to form fingers of said silver-containing thick-film paste on at least a portion of said anti-reflection coating;
(d) firing said fingers of said silver-containing thick-film paste to form silver-containing fingers that fire through said anti-reflection coating and contact said silicon substrate;
(e) forming one or more base metal buss bars on at least a portion of said anti-reflection coating and said silver-containing fingers, wherein the step of forming base metal buss bars on at least a portion of said anti-reflection coating and silver-containing fingers comprises the steps of (i) applying a thick-film paste containing base metal particles onto a portion of said anti-reflection coating and silver-containing fingers, and (ii) firing said thick-film paste containing base metal particles at a temperature that is less than or equal to the temperature at which said silver-containing thick-film paste is fired.
2. The method of claim 1 wherein the firing of said silver-containing thick film paste is conducted at a first firing temperature and the firing of said thick-film paste containing base metal particles is conducted at a second firing temperature, and wherein said firing of said thick-film paste containing base metal particles is conducted separate from and after the firing of said silver-containing thick-film paste, and wherein said second firing temperature is lower than said first firing temperature.
3. The method of claim 2 wherein the silver-containing thick-film paste is fired in air at a temperature in the range of 600° C. to 975° C.
4. The method of claim 2 wherein the thick-film paste containing base metal particles is fired at a temperature in the range of 300° C. to 600° C.
5. The method of claim 4 wherein the thick-film paste containing base metal particles is fired in an atmosphere having a partial pressure of oxygen of less than 10 −4 atmospheres.
6. The method of claim 5 wherein the thick-film paste containing base metal particles is fired in a nitrogen atmosphere.
7. The method of claim 4 wherein the thick-film paste containing base metal particles is fired in air, and during said firing the base metal particles of said thick-film paste are protected with a flux.
8. The method of claim 1 wherein said silver-containing thick-film paste and said thick-film paste containing base metal particles are fired at the same time in an oxygen-containing atmosphere, and during said firing the base metal particles of said thick-film paste containing base metal particles are protected with a flux.
9. A method for making a photovoltaic device, comprising:
(a) providing a silicon substrate;
(b) forming an anti-reflection coating on said silicon substrate;
(c) applying a silver-containing thick-film paste on said anti-reflection coating so as to form fingers of said silver-containing thick-film paste on at least a portion of said anti-reflection coating;
(d) firing said fingers of said silver-containing thick-film paste to form silver-containing fingers that fire through said anti-reflection coating and contact said silicon substrate;
(e) forming one or more base metal buss bars on at least a portion of said anti-reflection coating and said silver-containing fingers, wherein the step of forming base metal buss bars onto at least a portion of said anti-reflection coating and silver-containing fingers comprises the steps of (i) applying a thick-film paste containing base metal particles onto a portion of said anti-reflection coating and silver-containing fingers, and (ii) curing said thick-film paste containing base metal particles at a temperature in the range of 125° C. to 250° C.
10. The method of claim 9 wherein the thick-film paste containing base metal particles is comprised of 60 to 95 wt % base metal particles, 0 to 10 wt % glass fit, and 4 to 40 wt % organic medium.
11. The method of claim 10 wherein said base metal particles are comprised of copper, nickel, lead, tin, iron, indium, zinc, cobalt, bismuth or combinations thereof.
12. A method for making a photovoltaic device, comprising:
(a) providing a silicon substrate;
(b) forming an anti-reflection coating on said silicon substrate;
(c) applying a silver-containing thick-film paste on said anti-reflection coating so as to form fingers of said silver-containing thick-film paste on at least a portion of said anti-reflection coating;
(d) firing said fingers of said silver-containing thick-film paste to form silver-containing fingers that fire through said anti-reflection coating and contact said silicon substrate;
(e) forming one or more base metal buss bars on at least a portion of said anti-reflection coating and said silver-containing fingers, wherein the one or more base metal buss bars are formed on at least a portion of said anti-reflection coating and said silver-containing fingers by screen printing, plating, extrusion, sputtering, evaporation or inkjet processes.