High-voltage transistor having shielding gate
A semiconductor device includes a plurality of high-voltage insulated-gate field-effect transistors arranged in a matrix form on the main surface of a semiconductor substrate and each having a gate electrode, a gate electrode contact formed on the gate electrode, and a wiring layer which is formed on the gate electrode contacts adjacent in a gate-width direction to electrically connect the gate electrodes arranged in the gate-width direction. And the device includes shielding gates provided on portions of an element isolation region which lie between the transistors adjacent in the gate-width direction and gate-length direction and used to apply reference potential or potential of a polarity different from that of potential applied to the gate of the transistor to turn on the current path of the transistor to the element isolation region.
1. A semiconductor device comprising:
first, second, third, and fourth high-voltage insulated-gate field-effect transistors arranged on a main surface of a semiconductor substrate, the first and second high-voltage insulated-gate field transistors being adjacent each other in the gate-width direction, the third and fourth high-voltage insulated-gate field transistors being adjacent each other in the gate-width direction, the first and third high-voltage insulated-gate field transistors being adjacent each other in the gate-length direction, the second and fourth high-voltage insulated-gate field transistors being adjacent each other in the gate-length direction, and each of the transistors having a gate electrode, a gate electrode contact formed on the gate electrode;
a first wiring layer which is formed on the gate electrode contacts of the first and second transistors;
a second wiring layer which is formed on the gate electrode contacts of the third and fourth transistors; and
a shielding gate provided on portions of an element isolation region which lie between the first and second transistors, and lie between the third and fourth transistors, and used to apply one of a reference potential and a potential of a polarity different from that of a potential applied to the gates of the transistors to turn on a current path of the transistors to the element isolation region.
2. The semiconductor device according to claim 1 , wherein the gate electrode contacts are formed on fringe portions formed by extending end portions of the gate electrodes onto the element isolation region in the gate-width direction.
3. The semiconductor device according to claim 1 , wherein the first, second, third, and fourth high-voltage insulated-gate field-effect transistors are provided in a core portion of a row decoder formed near a memory cell array.
4. The semiconductor device according to claim 1 , wherein the memory cell array includes a plurality of memory cell transistors, each of the memory cell transistors has a laminated structure including a floating electrode, a gate-gate insulating film formed on the floating electrode, and a control electrode formed on the gate-gate insulating film, every adjacent two of the transistors commonly have a source/drain and current paths thereof being serially connected, and the plurality of high-voltage insulated-gate field-effect transistors supply program voltages to the control electrodes of the plurality of memory cell transistors.
5. The semiconductor device according to claim 1 , wherein the shielding gate is provided on portions of the element isolation region which lie between the first and third transistors, and lie between the second and fourth transistors.
6. The semiconductor device according to claim 5 , wherein the shielding gate is formed to surround the first to the fourth transistors on the element isolation region.
7. The semiconductor device according to claim 1 , wherein the shielding gate is not provided on portions of the element isolation region which lie between the first and third transistors, and lie between the second and fourth transistors.
8. The semiconductor device according to claim 1 , wherein a width of the gate electrode is larger than a width of the shielding gate.
9. The semiconductor device according to claim 1 , wherein each of the transistors has source/drain regions, and a width of the gate electrode contacts are smaller than a width of source/drain contacts formed on the source/drain regions, respectively.
10. The semiconductor device according to claim 1 , wherein the each of the transistors has source/drain regions, source/drain contacts are formed on the source/drain regions, respectively, and
a third wiring layer which is formed on one of the source/drain contacts of the first transistor, the third wiring layer is positioned higher than the first wiring layer.
11. The semiconductor device according to claim 1 , wherein the each of the transistors has source/drain regions, source/drain contacts are formed on the source/drain regions, respectively, and
a third wiring layer which is formed on one of the source/drain contacts of the first transistor, and is formed on the one of the source/drain contacts of the second transistor.
12. A semiconductor device comprising:
first, second, third, and fourth high-voltage insulated-gate field-effect transistors arranged on a main surface of a semiconductor substrate, first and second high-voltage insulated-gate field transistors being adjacent each other in the gate-width direction, third and fourth high-voltage insulated-gate field transistors being adjacent each other in the gate-width direction, first and third high-voltage insulated-gate field transistors being adjacent each other in the gate-length direction, second and fourth high-voltage insulated-gate field transistors being adjacent each other in the gate-length direction, and each of the transistors having a gate electrode, a gate electrode contact formed on the gate electrode, and being formed in an element region partitioned by an element isolation region, a cell area in the gate-length direction between the element region of the first and third transistors is reduced compared to a cell area in the gate-width direction between the element region of the first and second transistors;
a first wiring layer which is formed on the gate electrode contacts of the first and second transistors;
a second wiring layer which is formed on the gate electrode contacts of the third and fourth transistors; and
a shielding gate provided on portions of the element isolation region which lie between the first and second transistors, and lie between the third and fourth transistors, and used to apply one of a reference potential and a potential of a polarity different from that of a potential applied to the gates of the transistors to turn on a current path of the transistors to the element isolation region.
13. The semiconductor device according to claim 12 , wherein the gate electrode contacts are formed on fringe portions formed by extending end portions of the gate electrodes onto the element isolation region in the gate-width direction.
14. The semiconductor device according to claim 12 , wherein the first, second, third, and fourth high-voltage insulated-gate field-effect transistors are provided in a core portion of a row decoder formed near a memory cell array.
15. The semiconductor device according to claim 12 , wherein the memory cell array includes a plurality of memory cell transistors, each of the memory cell transistors has a laminated structure including a floating electrode, a gate-gate insulating film formed on the floating electrode, and a control electrode formed on the gate-gate insulating film, every adjacent two of the transistors commonly have a source/drain and current paths thereof being serially connected, and the plurality of high-voltage insulated-gate field-effect transistors supply program voltages to the control electrodes of the plurality of memory cell transistors.
16. The semiconductor device according to claim 12 , wherein the shielding gate is not provided on portions of the element isolation region which lie between the first and third transistors, and lie between the second and fourth transistors.
17. The semiconductor device according to claim 12 , wherein a width of the gate electrode is larger than a width of the shielding gate.
18. The semiconductor device according to claim 12 , wherein the each of the transistors has source/drain regions, and a width of the gate electrode contacts are smaller than a width of source/drain contacts formed on the source/drain regions, respectively.
19. The semiconductor device according to claim 12 , wherein the each of the transistors has source/drain regions, source/drain contacts are formed on the source/drain regions, respectively, and
a third wiring layer which is formed on one of the source/drain contacts of the first transistor, the third wiring layer is positioned higher than the first wiring layer.
20. The semiconductor device according to claim 12 , wherein the each of the transistors has source/drain regions, source/drain contacts are formed on the source/drain regions, respectively, and
a third wiring layer which is formed on one of the source/drain contacts of the first transistor, and is formed on the one of the source/drain contacts of the second transistor.