IP Library Granted Patent US 8,149,396
Granted Patent B2
US 8,149,396 · App. 13/099,530 · Granted Apr 3, 2012

Defect inspection apparatus and its method

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Quick Facts
Patent No.
US 8,149,396
App. No.
13/099,530
Granted
Apr 3, 2012
Kind
B2
Abstract

A defect inspection apparatus for inspecting defects on an inspecting object includes an illuminator which irradiates a beam of light on the inspecting object, a photo-detector which detects rays of light from the inspecting object due to the irradiation of the light beam by the illuminator, a defect detector which detects a defect by processing a signal obtained through detection by the photo-detector, a characteristic quantity calculator which calculates a characteristic quantity related to a size of the defect, and a defect size calculator which uses a relation between size and characteristic quantity which is calculated by an optical simulation and calculates a size of the detected defect.

Claims (20)

1. A defect inspection apparatus for inspecting defects on an inspecting object, comprising:

an illuminator which irradiates a beam of light on the inspecting object;

a photo-detector which detects rays of light from the inspecting object due to the irradiation of the light beam by the illuminator;

a defect detector which detects a defect by processing a signal obtained through detection by the photo-detector;

a characteristic quantity calculator which calculates a characteristic quantity related to a size of the defect; and

a defect size calculator which uses a relation between size and characteristic quantity which is calculated by a simulation and calculates a size of the detected defect.

2. A defect inspection apparatus according to claim 1 , wherein the calculated characteristic quantity is a sum total of intensities of the signal.

3. A defect inspection apparatus according to claim 1 , wherein the calculated characteristic quantity is a maximum value of intensities of the signal.

4. A defect inspection apparatus according to claim 1 , wherein the photo-detector has a sampling pitch which is no greater than ½ of the optical resolution.

5. A defect inspection apparatus according to claim 1 , wherein in a process for determining the size of a defect, parameters inherent of the inspection apparatus are used.

6. A defect inspection method for detecting defects on an inspecting object, comprising the steps of:

irradiating a beam of light on the inspecting object;

photo-detecting rays of light from the inspecting object due to the irradiation of the light beam;

detecting a defect by processing a signal obtained detection of the rays of light;

calculating by a hardware processor a characteristic quantity related to a size of the defect; and

calculating by a hardware processor a defect size using a relation between size and characteristic quantity which is calculated by a simulation so as to calculate a size of the detected defect.

7. A defect inspection method according to claim 6 , wherein the calculated characteristic quantity is based upon a sum total of intensities of the signal.

8. A defect inspection method according to claim 6 , wherein the calculated characteristic quantity is based upon a maximum value of intensities of the signal.

9. A defect inspection method according to claim 6 , wherein the photo-detecting step is executed at a sampling pitch which is no greater than ½ of the optical resolution.

10. A defect inspection method according to claim 6 , wherein in a process for determining the size of a defect, parameters inherent of an inspection apparatus are used.

Assignments (1)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →