Dimethylsulfoxide formulation in mixture with additive for lowering the crystallization point of same, and applications of said mixture
Use of at least one diol and/or of at least one triol as a dimethyl sulfoxide (DMSO) additive for lowering the crystallization point thereof. The DMSO formulation is used in combination with the abovementioned additive as a paint-stripping composition, a surface-cleaning composition, a graffiti-cleaning composition, a surface-cleaning composition in the microelectronics field, such as a photoresist stripper, a DMSO-based agrochemical composition, or as a constituent of an abovementioned composition, as a polymer-dissolving solvent, or as a constituent of a composition that is useful in the field of cosmetology or pharmacy.
1. Composition for stripping paints or for cleaning surfaces or graffiti, characterized in that it comprises, per 100 parts by weight of (A)+(B):
(A) 10 to 50 parts by weight of a formulation comprising an additive and dimethyl sulfoxide (DMSO), wherein the additive comprises 5 to 40 parts by weight per 100 parts by weight of said formulation, and the additive comprises, per 100 parts by weight of said additive:
(a) 75 to 100 parts by weight of diol and/or triol;
(b) 0 to 15 parts by weight of water; and
(c) 0 to 10 parts by weight of sodium chloride, wherein sodium chloride is present only if water is present; and
(B) 90 to 50 parts by weight of at least one cosolvent selected from ketones,
and, optionally additives, selected from the group consisting of activators, thickeners, softeners and surfactants.
2. Composition of claim 1 wherein said composition further comprises at least one aprotic cosolvents of moderate polarity selected from the group consisting of ethers and anisole.
3. Composition of claim 2 , wherein said ether is methyl tert-butyl ether (MTBE).
4. Composition of claim 1 wherein said ketone is methyl ethyl ketone.
5. Composition of claim 1 wherein said composition further comprises at least one ester selected from the group consisting of butyl acetate and dibasic esters.