IP Library › Patent Application 13107247
Patent Application
App. No. 13/107,247

TWO-STAGE LASER SYSTEM FOR ALIGNERS

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Quick Facts
Patent No.
US None
App. No.
13/107,247
Abstract

The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser ( 50 ) and an amplification-stage laser ( 60 ). Oscillation laser light having divergence is used as the oscillation-stage laser ( 50 ), and the amplification-stage laser ( 60 ) comprises a Fabry-Perot etalon resonator made up of an input side mirror ( 1 ) and an output side mirror ( 2 ). The resonator is configured as a stable resonator.

Claims (7)

1 . A two-stage laser system for aligners, comprising an oscillation-stage laser and an amplification-stage laser, wherein:

laser light output from said oscillation-stage laser is injected into said amplification-stage laser and is amplified therein,

said amplified laser light is output from said amplification stage-laser,

said oscillation-stage laser and said amplification stage laser each comprises a chamber filled with a laser gas,

said oscillation-stage laser oscillates laser light having divergence, and

said amplification-stage laser comprises a Fabry-Perot etalon type resonator, wherein said resonator is configured as a stable resonator.

2 - 45 . (canceled)