Nanostructured target for isotope production
Disclosed is a target for isotope production, that comprises a porous, nanostructured material with structure elements having in at least one dimension an average size of 700 run or less, preferably 500 nm or less and most preferably 150 nm or less, said nanostructured material comprising one Of Al 2 O 3 , Y 2 O 3 and ZrO 2 .
1. A method of manufacturing a target for isotope production, the method comprising:
growing a nanograined solid material as a porous oxide film on an anode metal plate immersed in an acid electrolyte bath;
adjusting the temperature and the voltage of the acid electrolyte bath such that adjacent pores in the porous oxide film are spaced less than 700 nm; and
retaining the nanograined solid material on a substrate having a melting point adapted to withstand bombardment by ions of energy exceeding 14 MeV.
2. The method of claim 1 , wherein said oxide film is an Al 2 O 3 film.
3. The method of claim 1 , wherein said acid electrolyte comprises one of sulfuric acid, oxalic acid and phosphoric acid.
4. The method of claim 1 , wherein said oxide film growth is followed by a step of annealing.
5. The method of claim 4 , wherein said annealing is performed at a temperature below 1270° C.
6. The method of claim 1 , further comprising a step of joining the nanograined solid material with a metal foil.
7. The method of claim 6 , wherein said nanograined solid material and said metal foil are joined by brazing.
8. The method of claim 7 , wherein, in said brazing, a foil or cladding layer of filler material is interposed between said nanograined solid material and said foil.
9. The method of claim 8 , wherein said metal foil is a Nb-foil.
10. The method of claim 9 , wherein said Nb-foil has a thickness of 0.1 to 1 mm.