Method for manufacturing semiconductor light-emitting element
Provided is a method for manufacturing a semiconductor light-emitting element having a narrow wavelength distribution and comprising a substrate and a group III compound semiconductor layer formed thereon, the substrate being made of a material different from the compound semiconductor constituting the semiconductor layer. The method for manufacturing a semiconductor light-emitting element having a group III compound semiconductor layer is characterized by comprising a semiconductor layer-forming step wherein a group III compound semiconductor layer having a total thickness of not less than 8 μm is formed on a substrate ( 11 ) having a diameter D, a thickness and an amount of warpage H within the range of ±30 μm. The method is also characterized in that the diameter D and the thickness d of the substrate ( 11 ) satisfy the following formula (1): 0.7×10 2 ≦( D/d )≦1.5×10 2 (1).
1. A method for manufacturing a semiconductor light-emitting element having a group III compound semiconductor layer, the method comprising:
a semiconductor layer forming step to form the group III compound semiconductor layer having a total thickness selected from a range of 8 μm to 15 μm on a substrate having an amount of warpage H selected from a range of −7.1 μm≦H<0, a diameter D selected from a range of 50 mm to 155 mm and a thickness d selected from a range of 0.7 mm to 1.5 mm,
wherein the diameter D and the thickness d of the substrate satisfy a relation of the following formula (1):
0.7×10 2 ≦( D/d )≦1.5×10 2 (1).
2. The method for manufacturing a semiconductor light-emitting element according to claim 1 , wherein the group III compound semiconductor layer contains a group III nitride.
3. The method for manufacturing a semiconductor light-emitting element according to claim 1 , wherein the substrate is made of a material different from a material of a group III compound semiconductor.
4. The method for manufacturing a semiconductor light-emitting element according to claim 1 , wherein the substrate is made of sapphire.
5. The method for manufacturing a semiconductor light-emitting element according to claim 1 , further comprising an intermediate layer forming step to form an intermediate layer between the substrate and the group III compound semiconductor layer by a sputtering method.
6. The method for manufacturing a semiconductor light-emitting element according to claim 1 , wherein the group III compound semiconductor layer is formed by laminating a base layer, an n-type semiconductor layer, a light-emitting layer and a p-type semiconductor layer in this order on the substrate.
7. The method for manufacturing a semiconductor light-emitting element according to claim 1 , wherein the group III compound semiconductor layer is formed on the substrate by a metalorganic chemical vapor deposition method.
8. A method for manufacturing a semiconductor light-emitting element having a group III compound semiconductor layer, the method comprising:
a semiconductor layer forming step to form the group III compound semiconductor layer on a substrate having an amount of warpage H in a range of −30 μm≦H<0, a diameter D selected from a range of 50 mm to 155 mm and a thickness d selected from a range of 0.7 mm to 1.5 mm,
wherein, in a case where the diameter D of the substrate is 50 mm to 51 mm, the amount of warpage H of the substrate is selected from a range of 0<H≦30 μm and −30 μm≦H<0, whereas in a case where the diameter D of the substrate is 100 mm to 102 mm, the amount of warpage H of the substrate is selected from a range of −10 μm<H<0,
wherein the diameter D and the thickness d of the substrate satisfy a relation of the following formula (1):
0.7×10 2 ≦( D/d )≦1.5×10 2 (1).
9. The method for manufacturing a semiconductor light-emitting element according to claim 8 , wherein the group III compound semiconductor layer contains a group III nitride.
10. The method for manufacturing a semiconductor light-emitting element according to claim 8 , wherein the substrate is made of a material different from a material of a group III compound semiconductor.
11. The method for manufacturing a semiconductor light-emitting element according to claim 8 , wherein the substrate is made of sapphire.
12. The method for manufacturing a semiconductor light-emitting element according to claim 8 , further comprising an intermediate layer forming step to form an intermediate layer between the substrate and the group III compound semiconductor layer by a sputtering method.
13. The method for manufacturing a semiconductor light-emitting element according to claim 8 , wherein the group III compound semiconductor layer is formed by laminating a base layer, an n-type semiconductor layer, a light-emitting layer and a p-type semiconductor layer in this order on the substrate.
14. The method for manufacturing a semiconductor light-emitting element according to claim 8 , wherein the group III compound semiconductor layer is formed on the substrate by a metalorganic chemical vapor deposition method.