SCRUBBING SOLUTION CONSISTING OF AQUEOUS AMMONIA SOLUTION AMINES FOR THE SCRUBBING OF GAS AND USE OF SUCH SOLUTION
The invention relates to a process using a solvent combination for the gas scrubbing of industrial gases in order to separate acid gases, particularly including carbon dioxide and hydrogen sulphide. The inventive solvent combination consists of a solution of amines in water, said solution containing ammonia for improving the absorption of CO 2 . The group of primary and secondary amines includes all types of amines with one or two substituents. Particularly suitable as constituent of the inventive solvent combination is piperazine and piperazine derivatives.
1 . Scrubbing solution for the removal of acid gas constituents from industrial gases, the gas flow being brought into contact with a liquid absorption agent in a suitable scrubbing device, comprising:
the liquid absorption agent is an aqueous solution containing ammonia and at least one amine, and
the amine does not contain any hydroxy alkyl substituents in the molecule.
2 . Scrubbing solution according to claim 1 , wherein the amine is a primary or a secondary amine.
3 . Scrubbing solution for the removal of acid gas constituents according to claim 2 , wherein the primary amine compound has the general formula H 2 N—R a , with R a being selected from alkyl groups, aryl groups or aryl alkyl groups.
4 . Scrubbing solution for the removal of acid gas constituents according to claim 2 , wherein the secondary amine compound has the general formula R a —N(H)—R b , with R a and R b being selected independently of each other from alkyl groups, aryl groups or aryl alkyl groups.
5 . Scrubbing solution according to claim 4 , wherein the secondary amine compound is selected from diethyl amine, dipropyl amine or diphenyl amine.
6 . Scrubbing solution for the removal of acid gas constituents according to claim 2 , wherein the amine compound has the general formula R a R b —N—X—N—R a′ , R b′ , with R a , R b , R a′ and R b′ being selected independently of each other from alkyl groups, aryl groups or aryl alkyl groups and X representing an alkylen or aryl alkylen group.
7 . Scrubbing solution according to claim 1 , wherein the amine compound is selected from a five-membered or six-membered saturated heterocycle with at least one NH group in the ring.
8 . Scrubbing solution according to claim 7 , wherein the amine compound is selected from piperazine or a piperazine derivate.
9 . Scrubbing solution according to claim 1 , wherein the ammonia is used in the form of an ammonium salt.
10 . Use of a scrubbing solution according to claim 1 for a process for the absorption of acid gases from industrial gases to be treated, wherein the solution has an amine concentration of 0.001 to 50 mass percent and an ammonia concentration of 1 to 32 mass percent.
11 . Use of a scrubbing solution according to claim 1 for a process for the absorption of acid gases from industrial gases to be treated, wherein the solution has an amine concentration of 0.1 to 20 mass percent and an ammonia concentration of 10 to 25 mass percent.
12 . Use of a scrubbing solution according to claim 10 , wherein the industrial gas to be treated is synthesis gas, natural gas, lower alkanes and alkenes, carbon monoxide or hydrogen or a mixture of these gases.
13 . Use of a scrubbing solution according to claim 10 , wherein the industrial gas to be treated is a flue gas.
14 . Use of a scrubbing solution according to claim 10 , wherein the industrial gas to be treated is a coke oven gas.
15 . Use of a scrubbing solution according to claim 10 , wherein the gases to be separated are hydrogen sulphide, carbon dioxide, hydrocyanic acid, mercaptans, carbonyl sulphide or sulphur oxides or a mixture of these gases.
16 . Use of a scrubbing solution according to claim 10 , wherein the solution used in the absorption has an applied temperature of 20° C. to 100° C. and an applied pressure of 0.5 bar to 100 bar.
17 . Use of a scrubbing solution according to claim 10 , wherein the solution used in the regeneration has an applied temperature of 80° C. to 200° C. and an applied pressure of 0.1 bar to 20 bar.