Method of manufacturing semiconductor device
A method of manufacturing a semiconductor device is provided. The method includes placing a semiconductor chip by flip-chip mounting on a substrate by using an insulating resin adhesive film (NCF) and preventing overflow of the NCF and the intervention of an insulating resin or an inorganic filler between a bump and an electrode during hot pressing. The method also includes temporarily affixing an NCF of a size that is substantially 60 to 100% the area of a region enclosed with a plurality of bumps of the semiconductor chip arranged in a peripheral alignment, and having a minimum melt viscosity of 2×10 2 to 1×10 5 Pa·s, to the region enclosed with a plurality of electrodes of the substrate corresponding to the bumps, and aligning the semiconductor chip and the substrate with each other such that the bumps and the electrodes corresponding thereto are opposed to each other.
1. A method of manufacturing a semiconductor device, including placing a semiconductor chip provided with a plurality of bumps arranged in a peripheral alignment by flip-chip mounting on a substrate provided with a plurality of electrodes corresponding to the bumps via an insulating resin adhesive film,
the method being characterized by temporarily affixing an insulating resin adhesive film having a minimum melt viscosity of 8×10 3 to 1×10 5 Pa·s, to the substrate so as to cover 70 to 90% the area of the region enclosed with the plurality of bumps of the semiconductor chip arranged in the peripheral alignment; aligning the semiconductor chip and the substrate with each other such that the bumps and the electrodes corresponding thereto are opposed to each other; and performing hot pressing against the semiconductor chip to establish metallic contact between the bumps and the electrodes, to melt the insulating resin adhesive film so that the melted insulating resin does not flow over to the outside of the semiconductor chip, and to heat cure the film;
wherein:
during performing hot pressing, the melted insulating resin adhesive film spreads toward an outer edge of the semiconductor chip, and is cured, to obtain a semiconductor where a periphery of the cured insulating resin adhesive film is defined between the plurality of bumps arranged in the peripheral alignment and the outer edge of the semiconductor chip, exclusive.
2. The manufacturing method according to claim 1 , wherein the insulating resin adhesive film contains a curable epoxy resin composition or a curable acrylic resin composition.
3. The manufacturing method according to claim 1 , wherein the hot pressing is performed at a temperature of 170 to 200° C. and at a pressure of 2.0 to 2.5 MPa.
4. The manufacturing method according to claim 1 , wherein the hot pressing is performed at a pressure of 2.0 to 3.33 kg/IC.
5. The manufacturing method according to claim 2 , wherein the insulating resin adhesive film contains a curable acrylic resin composition.
6. The manufacturing method according to claim 1 , wherein the hot pressing is performed at a temperature of 170 to 200° C.
7. The manufacturing method according to claim 1 , wherein the hot pressing is performed at a pressure of 2.0 to 2.5 MPa.
8. The manufacturing method according to claim 1 , wherein the plurality of bumps of the semiconductor chip are gold stud bumps of a height of 35 to 100 μm.
9. The manufacturing method according to claim 8 , wherein the insulating resin adhesive film has a thickness of 30 to 70 μm.