IP Library Granted Patent US 8,294,118
Granted Patent B2
US 8,294,118 · App. 13/147,768 · Granted Oct 23, 2012

Method for adjusting optical axis of charged particle radiation and charged particle radiation device

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Quick Facts
Patent No.
US 8,294,118
App. No.
13/147,768
Granted
Oct 23, 2012
Kind
B2
Abstract

Provided are a method for adjusting the optical axis of a charged particle beam and a device therefor, wherein an artificial criterion is quantified, and whether or not the adjustment of the axis of a charged particle beam is necessary is judged on the basis of the quantified criterion. In the method for adjusting the optical axis and the device therefor, the conditions for adjusting an optical element for adjusting a charged particle beam are changed; a plurality of images are captured under the changed conditions; images the qualities of which are allowed or images the qualities of which are not allowed are selected from the captured images; a first image quality evaluation value is obtained on the basis of the selected images; the obtained first image quality evaluation value is compared with a second image quality evaluation value obtained from images obtained by scanning an object using the charged particle beam; and the optical axis is adjusted when the second image quality evaluation value is equal to or below the first image quality evaluation value.

Claims (11)

1. A method for adjusting an optical axis in a charged particle beam device by deflecting a charged particle beam emitted from a charged particle source to perform optical axis adjustment, comprising the steps of:

changing adjustment conditions of an optical element adapted to adjust said charged particle beam to thereby capture a plurality of images with said adjustment conditions different;

selecting from said plurality of captured images an image whose image quality is tolerable or an image whose image quality is intolerable;

obtaining a first image quality evaluation value on the basis of said selected image; and

adjusting said optical axis when said obtained first image quality evaluation value is compared with a second image quality evaluation value obtained from an image captured by scanning said charged particle beam and said second image quality evaluation value is equal to or less than said first image quality evaluation value or is less than said first image quality evaluation value.

2. The method for adjusting an optical axis in a charged particle beam device according to claim 1 , wherein said optical element is a condenser lens for converging said charged particle beam, a stigmator for correcting an astigmatism of said charged particle beam, or an electrostatic lens formed by applying a negative voltage to a sample.

3. The method for adjusting an optical axis in a charged particle beam device according to claim 1 , wherein said charged particle beam is scanned such that a pattern to conduct said image quality evaluation and a pattern to conduct dimension measurement are included in a same field of view.

4. A charged particle beam device having a charged particle source, an alignment deflector for adjusting an optical axis by deflecting a charged particle beam emitted from said charged particle source, and a control unit for controlling said alignment deflector, comprising

a selection unit for selecting an arbitrary image from a plurality of images captured when an adjustment condition of an optical element adapted to adjust said charged particle beam is changed, wherein

said control unit calculates a first image evaluation value of an image selected by said selection unit, compares said first image evaluation value with a second image evaluation value determined from an image captured when said charged particle beam is scanned on a sample, and controls said alignment deflector so as to perform said optical axis adjustment when said second image quality evaluation value is equal to or less than said first image quality evaluation value or less than said first image quality evaluation value.

5. The charged particle beam device according to claim 4 , wherein said optical element is a condenser lens for converging said charged particle beam, a stigmator for correcting an astigmatism of said charged particle beam, or an electrostatic lens formed by applying a negative voltage to a sample.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 3, 2011
From: KONO, AKEMI; NASU, OSAMU
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 026695/0796 →