Method for fabricating a liquid crystal display device and an LCD device thereby
A method for fabricating a LCD having enhanced aperture ratio and brightness includes: forming a gate line, a gate electrode, a common electrode and a common line in a first mask process; depositing a gate insulating layer covering the gate line, the gate electrode and the common electrode; forming an active layer on the gate insulating layer, and an ohmic contact layer on the active layer in a second mask process; forming a data line, a source electrode, and a drain electrode facing the source electrode in a third mask process; depositing a protective layer over the data line, the source electrode and the drain electrode; forming a pixel contact hole in a fourth mask process; and forming a pixel electrode, wherein the pixel electrode is connected to the drain electrode through the pixel contact hole in a fifth mask process using a reverse tapered photo-resist pattern.
1. A method for fabricating a liquid crystal display device, comprising:
forming a gate line and a gate electrode connected to the gate line on a lower substrate by patterning a first metal layer using a first reverse tapered photo-resist pattern as a mask in a first etching process;
forming a data line crossing the gate line to define a pixel region, a source electrode connected to the data line, and a drain electrode facing the source electrode on the lower substrate by patterning a second metal layer using a second reverse tapered photo-resist pattern as a mask in a second etching process;
forming a pixel electrode in the pixel region connecting to the drain electrode on the lower substrate; and
forming a common electrode on a upper substrate facing the lower substrate to form a vertical electric field with the pixel electrode,
wherein the first and second reverse tapered photo-resist patterns, each has a bottom width of about 4.5 μm,
wherein the gate line is disposed under the first reverse tapered photo-resist pattern, and
wherein a first width of a top surface of the gate line is narrower than a second width of a bottom surface of the gate line, and the second width of the bottom surface of the gate line is narrower than a third width of a bottom surface of the first reverse tapered photo-resist pattern
wherein the data line is disposed under the second reverse tapered photo-resist pattern, and
wherein a first width of a top surface of the data line is narrower than a second width of a bottom surface of the data line, and the second width of the bottom surface of the data line is narrower than a third width of a bottom surface of the second reverse tapered photo-resist pattern.
2. The method for fabricating a liquid crystal display device according to the claim 1 , wherein at least one of the gate line and the data line has a line width of about 1.5˜4.0 μm.
3. The method for fabricating a liquid crystal display device according to the claim 1 , wherein the first and second reverse tapered photo-resist patterns, each is formed by steps of:
depositing photo-resist on the substrate;
baking the photo-resist with controlling temperature for the photo-resist to have reverse tapered shape; and
exposing the photo-resist with adjusting defocus amount and exposure amount for patterning the photo-resist to have reverse tapered shape.