Semiconductor device
View Patent ↗An object is to provide a semiconductor device having good electrical characteristics. A gate insulating layer having a hydrogen concentration less than 6×10 20 atoms/cm 3 and a fluorine concentration greater than or equal to 1×10 20 atoms/cm 3 is used as a gate insulating layer in contact with an oxide semiconductor layer forming a channel region, so that the amount of hydrogen released from the gate insulating layer can be reduced and diffusion of hydrogen into the oxide semiconductor layer can be prevented. Further, hydrogen present in the oxide semiconductor layer can be eliminated with the use of fluorine; thus, the hydrogen content in the oxide semiconductor layer can be reduced. Consequently, the semiconductor device having good electrical characteristics can be provided.
1. A semiconductor device comprising:
a gate electrode layer;
a gate insulating layer over the gate electrode layer;
an oxide semiconductor layer over the gate insulating layer;
a source electrode layer and a drain electrode layer over and in contact with the oxide semiconductor layer; and
an insulating layer over and in contact with the oxide semiconductor layer, the source electrode layer, and the drain electrode layer,
wherein a hydrogen concentration in the gate insulating layer is less than 6×10 20 atoms/cm 3 and a fluorine concentration in the gate insulating layer is greater than or equal to 1×10 20 atoms/cm 3 .
2. The semiconductor device according to claim 1 , wherein the gate insulating layer comprises silicon oxide, silicon oxynitride, silicon nitride oxide, hafnium oxide, aluminum oxide, or tantalum oxide.
3. The semiconductor device according to claim 1 , wherein the oxide semiconductor layer includes a crystallized region.
4. The semiconductor device according to claim 1 , wherein the oxide semiconductor layer includes a region containing silicon.
5. The semiconductor device according to claim 1 , wherein the oxide semiconductor layer includes a crystallized region, and a region containing silicon.
6. A semiconductor device comprising:
a gate electrode layer;
a gate insulating layer over the gate insulating layer;
an oxide semiconductor layer over the gate insulating layer;
a source electrode layer and a drain electrode layer over and in contact with the oxide semiconductor layer; and
an insulating layer over and in contact with the oxide semiconductor layer, the source electrode layer, and the drain electrode layer,
wherein a hydrogen concentration in the gate insulating layer is less than 6×10 20 atoms/cm 3 and a fluorine concentration in the gate insulating layer is greater than or equal to 1×10 20 atoms/cm 3 , and
wherein a hydrogen concentration in the insulating layer is less than 6×10 20 atoms/cm 3 and a fluorine concentration in the insulating layer is greater than or equal to 1×10 20 atoms/cm 3 .
7. The semiconductor device according to claim 6 , wherein the gate insulating layer comprises silicon oxide, silicon oxynitride, silicon nitride oxide, hafnium oxide, aluminum oxide, or tantalum oxide.
8. The semiconductor device according to claim 6 , wherein the oxide semiconductor layer includes a crystallized region.
9. The semiconductor device according to claim 6 , wherein the oxide semiconductor layer includes a region containing silicon.
10. The semiconductor device according to claim 6 , wherein the oxide semiconductor layer includes a crystallized region, and a region containing silicon.
11. A semiconductor device comprising:
a gate electrode layer;
a first gate insulating layer over the gate electrode layer;
a second gate insulating layer over the first gate insulating layer;
an oxide semiconductor layer over and in contact with the second gate insulating layer;
a source electrode layer and a drain electrode layer over and in contact with the oxide semiconductor layer; and
an insulating layer over and in contact with the oxide semiconductor layer, the source electrode layer, and the drain electrode layer,
wherein a hydrogen concentration in the second gate insulating layer is less than 6×10 20 atoms/cm 3 and a fluorine concentration in the second gate insulating layer is greater than or equal to 1×10 20 atoms/cm 3 .
12. The semiconductor device according to claim 11 , wherein the second gate insulating layer comprises silicon oxide, silicon oxynitride, silicon nitride oxide, hafnium oxide, aluminum oxide, or tantalum oxide.
13. The semiconductor device according to claim 11 , wherein a fluorine concentration in the first gate insulating layer is less than 1×10 20 atoms/cm 3 .
14. The semiconductor device according to claim 11 , wherein the oxide semiconductor layer includes a crystallized region.
15. The semiconductor device according to claim 11 , wherein the oxide semiconductor layer includes a region containing silicon.
16. The semiconductor device according to claim 11 , wherein the oxide semiconductor layer includes a crystallized region, and a region containing silicon.