Apparatus and method for inspecting defects
View Patent ↗A defect inspection apparatus and method includes utilizing an irradiation optical system that focuses a beam flux emitted from a laser light source and formed into a slit-shaped beam so as to irradiate the beam onto the surface of the substrate to be inspected, utilizing a detection optical system that detects light from the substrate that has been irradiated with the slit-shaped beam, and utilizing a signal processor that processes a signal output from the detection optical system. The irradiation optical system includes a cylindrical lens for focusing the beam that has been emitted from the laser light source onto the substrate to be inspected, as the slit-shaped beam, wherein the cylindrical lens is disposed so as to obtain a distance between an incidence surface or emitting surface thereof and the slit-shaped beam upon the substrate to be inspected to be equal to a focal distance of the cylindrical lens.
1. A defect inspection apparatus comprising:
an irradiation optical system that focuses a beam flux emitted from a laser light source and formed into a slit-shaped beam by fluxes of light that are substantially parallel in a longitudinal direction, from a direction having a required inclination with respect to a surface of a substrate to be inspected, so as to irradiate the beam flux onto the surface of the substrate to be inspected;
a detection optical system that detects light from the substrate that has been irradiated with the slit-shaped beam; and
a signal processor that processes a signal output from the detection optical system;
wherein the irradiation optical system includes a cylindrical lens for focusing the beam flux that has been emitted from the laser light source onto the substrate to be inspected, as the slit-shaped beam;
wherein the cylindrical lens is disposed so as to obtain a distance between an incidence surface or emitting surface thereof and the slit-shaped beam upon the substrate to be inspected to be equal to a focal distance of the cylindrical lens; and
wherein the cylindrical lens is set at an inclination angle with respect to an optical axis of the beam flux emitted from the laser light source.
2. The defect inspection apparatus according to claim 1 , wherein the irradiation optical system further includes an inclined mirror which is configured so as to allow the slit-shaped beam to be switched for irradiation at a high angle of inclination and for irradiation at a low angle of inclination.
3. The defect inspection apparatus according to claim 1 , wherein the irradiation optical system includes an optical path switching unit which switches an optical path emitted from the laser light source to a first optical path or a second optical path.
4. The defect inspection apparatus according to claim 1 , wherein, in the detection optical system, a spatial filter that light-shields an interference pattern formed from an iterative circuit pattern present on the substrate is disposed at a position conjugate to a pupil of an objective lens.
5. The defect inspection apparatus according to claim 1 , wherein:
in the irradiation optical system, the beam flux emitted from the light source is guided to a first optical path, a second optical path and a third optical path after being guided to a principal optical path; and
a luminous quantity adjusting filter is disposed in the principal optical path for adjusting the amount of light.
6. The defect inspection apparatus according to claim 1 , wherein:
in the irradiation optical system, the beam flux emitted from the laser source is guided to a first optical path, a second optical path and a third optical path after being guided to a principal optical path;
a polarizing plate is disposed in the principal optical path for conducting polarization control; and
the detection optical system further includes an analyzer for controlling and detecting polarization.
7. The defect inspection apparatus according to claim 1 , wherein the light source is configured so as to emit UV or DUV laser light.
8. The defect inspection apparatus according to claim 1 , wherein the detection optical system is configured so as to make a detection imaging magnification variable.
9. A defect inspection method, comprising:
an irradiation step of focusing a beam flux emitted from a light source and formed into a slit-shaped beam by fluxes of light that are substantially parallel in a longitudinal direction, from a direction having a required inclination with respect to a surface of a substrate to be inspected, so as to irradiate the beam flux onto the surface of the substrate to be inspected;
a detection step of detecting light from the substrate that has been irradiated with the slit-shaped beam; and
a signal processing step of processing a signal obtained from the detection of light at the detection step;
wherein, in the irradiation step, the beam flux is focused onto the substrate to be inspected, as the slit beam, by using a cylindrical lens which is set at an inclination angle with respect to an optical axis of the beam flux emitted from the light source and which is disposed so as to obtain a distance between an incidence surface or an emitting surface thereof and the slit-shaped beam upon the substrate to be inspected to be equal to a focal distance of the cylindrical lens.
10. The defect inspection apparatus according to claim 1 , wherein the cylindrical lens has a curved surface and an opposite flat surface, the flat surface of the cylindrical lens being set at the inclination angle which is an oblige angle with respect to the optical axis of the beam flux emitted from the laser light source.
11. The defect inspection method according to claim 9 , wherein the cylindrical has a curved surface and an opposite flat surface, the flat surface of the cylindrical lens being set at the inclination angle which is an oblique angle with respect to the optical axis of the beam flux emitted from the laser light source.