IP Library Granted Patent US 8,643,138
Granted Patent B2
US 8,643,138 · App. 13/174,390 · Granted Feb 4, 2014

High breakdown voltage integrated circuit isolation structure

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Quick Facts
Patent No.
US 8,643,138
App. No.
13/174,390
Granted
Feb 4, 2014
Kind
B2
Abstract

A high breakdown voltage integrated circuit isolator device communicates a digital signal from a signal input on one semiconductor die to a signal output on another semiconductor die while providing high voltage isolation between the signal input and the signal output. Each die may include a respective capacitive isolation barrier structure that couple together via a bonding wire between combined top metal/bonding pads of the capacitive isolation barrier structures.

Claims (31)

1. An integrated circuit isolator device, comprising:

a first die including:

first circuitry, and

a first isolation barrier structure, coupled to the first circuitry, the first isolation barrier structure including a combined top plate/bonding pad and a bottom plate and insulative material therebetween, the bottom plate of the first isolation barrier structure being coupled to the first circuitry;

a first circuitry keep-out region, situated on the first die proximate the first circuitry, wherein a metal layer of the first circuitry does not extend into the first circuitry keep-out region;

a second die including:

second circuitry, and

a second isolation barrier structure, coupled to the second circuitry, the second isolation barrier structure including a combined top plate/bonding pad and a bottom plate and insulative material therebetween, the bottom plate of the second isolation barrier structure being coupled to the second circuitry;

a bond wire coupling the combined top plate/bonding pad of the first isolation barrier structure to the combined top plate/bonding pad of the second isolation barrier structure, such that a signal propagates from the first circuitry, through the first and second isolation barrier structures, and to the second circuitry in voltage-isolated fashion.

2. The integrated circuit isolator device of claim 1 , wherein the first isolation barrier structure is a capacitive isolation structure and the second isolation barrier structure is a capacitive isolation structure.

3. An integrated circuit isolator device, comprising:

a first die including:

transmitter circuitry, and

a first capacitive isolation structure, coupled to the transmitter circuitry, the first capacitive isolation structure including a combined top plate/bonding pad and a bottom plate and insulative material therebetween, the bottom plate of the first capacitive isolation structure being coupled to the transmitter circuitry;

a first circuitry keep-out region, situated on the first die and surrounding the combined top plate/bonding pad of the first capacitive isolation structure, the first circuitry being configured such that a metal layer of the first circuitry does not extend into the first circuitry keep-out region;

a second die including:

receiver circuitry, and

a second capacitive isolation structure, coupled to the receiver circuitry, the second capacitive isolation structure including a combined top plate/bonding pad and a bottom plate and insulative material therebetween, the bottom plate of the second capacitive isolation structure being coupled to the receiver circuitry;

a bond wire coupling the combined top plate/bonding pad of the first capacitive isolation structure to the combined top plate/bonding pad of the second capacitive isolation structure, such that a signal propagates from the transmitter circuitry, through the first and second capacitive isolation structures, and to the receiver circuitry in voltage-isolated fashion.

4. The integrated circuit isolator device of claim 3 , further comprising a plurality of circuitry keep-out regions situated on the first die and surrounding the combined top plate/bonding pad of the first capacitive isolation structure, the circuitry keep-out regions of the plurality of circuitry keep-out regions corresponding to respective metal layers of the transmitter circuitry.

5. The integrated circuit isolator device of claim 4 , wherein each circuitry keep-out region exhibits respective dimensions, the dimensions of the circuitry keep-out regions increasing in size from a bottom of the first capacitive isolation structure to a top of the first capacitive isolation structure.

6. The integrated circuit isolator device of claim 3 , further comprising:

a first insulative material situated on a top surface of the first die except for a first insulative material keep-out region that surrounds the combined top plate/bonding pad of the first capacitive isolation structure.

7. A method of fabricating an integrated circuit isolator device, the method comprising:

fabricating in a first die: transmitter circuitry, and a first capacitive isolation structure, coupled to the transmitter circuitry, the first capacitive isolation structure including a combined top plate/bonding pad and a bottom plate and insulative material therebetween, the bottom plate of the first capacitive isolation structure being coupled to the transmitter circuitry;

fabricating a first circuitry keep-out region, situated on the first die and surrounding the combined top plate/bonding pad of the first capacitive isolation structure, the first circuitry being configured such that a metal layer of the first circuitry does not extend into the first circuitry keep-out region;

fabricating in a second die: receiver circuitry, and a second capacitive isolation structure, coupled to the receiver circuitry, the second capacitive isolation structure including a combined top plate/bonding pad and a bottom plate and insulative material therebetween, the bottom plate of the second capacitive isolation structure being coupled to the receiver circuitry;

coupling with a bond wire the combined top plate/bonding pad of the first capacitive isolation structure to the combined top plate/bonding pad of the second capacitive isolation structure, such that a signal propagates from the transmitter circuitry, through the first and second capacitive isolation structures, and to the receiver circuitry in voltage-isolated fashion.

8. The method of claim 7 , further comprising fabricating a plurality of circuitry keep-out regions situated on the first die and surrounding the combined top plate/bonding pad of the first capacitive isolation structure, the circuitry keep-out regions of the plurality of circuitry keep-out regions corresponding to respective metal layers of the transmitter circuitry.

9. The method of claim 8 , wherein each circuitry keep-out region exhibits respective dimensions, the dimensions of the circuitry keep-out regions increasing in size from a bottom of the first capacitive isolation structure to a top of the first capacitive isolation structure.

10. The method of claim 7 , further comprising fabricating a first insulative material situated on a top surface of the first die except for a first insulative material keep-out region that surrounds the combined top plate/bonding pad of the first capacitive isolation structure.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 29, 2021
From: SILICON LABORATORIES INC.
To: SKYWORKS SOLUTIONS, INC.
Reel/Frame 057033/0579 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 20, 2013
From: DONG, ZHIWEI
To: SILICON LABORATORIES INC.
Reel/Frame 029838/0846 →