System and method for automatic gas optimization in a two-chamber gas discharge laser system
View Patent ↗A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser such as an excimer laser is disclosed. The laser is continuously fired at a low power output, and the gas in the amplifier laser chamber bled if necessary until the discharge voltage meets or exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased, and the gas bled again if necessary until the voltage and pressure meet or exceed the minimum values. The laser is then fired in a burst pattern that approximates the expected firing of the laser in operation, and the gas bled if necessary until the discharge voltage meets or exceeds the minimum value and the output energy meets or exceeds a minimum value, again without dropping the pressure in the chamber below the minimum value. Once the minimum values are provided, the process runs quickly without manual interaction.
1. A dual chamber gas discharge laser light source, comprising:
a master oscillator having a laser chamber containing a lasing medium gas comprising a halogen;
an amplifier having a laser chamber containing a lasing medium gas comprising a halogen;
a gas optimization system including a controller automatically executing an optimization scheme after a refill of the gas in the amplifier laser chamber, the optimization scheme comprising:
a first sequence in which the laser is fired in continuous mode at a first rate and target energy while measuring the discharge voltage, and, if the discharge voltage is below a predetermined minimum value, bleeding gas from the amplifier chamber until the discharge voltage is equal to or greater than the minimum value;
a second sequence in which the laser is fired in continuous mode at a second rate and target energy while measuring the discharge voltage, and, if the discharge voltage is below the predetermined minimum value, bleeding gas from the amplifier chamber until the discharge voltage is equal to or greater than the minimum value; and
a third sequence in which the laser is fired in bursts at a target energy while measuring the discharge voltage and master oscillator output energy, and, if the discharge voltage is below the predetermined minimum value, or the output energy is below another predetermined minimum value, bleeding gas from the amplifier chamber until both the discharge voltage and the output energy are equal to or greater than the respective predetermined minimum values.
2. The dual chamber gas discharge laser light source of claim 1 wherein the halogen comprises fluorine.
3. The dual chamber gas discharge laser light source of claim 1 wherein the rate at which the laser is fired during the first sequence is calculated to result in a power output of approximately a few percent of the maximum power output of the laser.
4. The dual chamber gas discharge laser light source of claim 3 wherein the rate at which the laser is fired during the second sequence is approximately 10 times the rate at which the laser is fired during the first sequence.
5. The dual chamber gas discharge laser light source of claim 1 wherein the bursts fired by the laser during the third sequence are calculated to result in a power output that is approximately equal to the power output which the laser is expected to generate during normal operation.
6. The dual chamber gas discharge laser light source of claim 1 wherein the optimization scheme further comprises bleeding gas from the amplifier chamber in determined increments.
7. The dual chamber gas discharge laser light source of claim 1 wherein the optimization scheme further comprises measuring the pressure in the amplifier chamber during the first sequence and, if the pressure drops below a predetermined value, stopping the first sequence and commencing the second sequence.
8. The dual chamber gas discharge laser light source of claim 1 wherein the optimization scheme further comprises measuring the pressure in the amplifier chamber during the second sequence and, if the pressure drops below a predetermined value, stopping the second sequence and commencing the third sequence.
9. The dual chamber gas discharge laser light source of claim 1 wherein the optimization scheme further comprises measuring the pressure in the amplifier chamber during the third sequence and, if the pressure drops below a predetermined value, stopping the third sequence.
10. The dual chamber gas discharge laser light source of claim 1 wherein the optimization scheme further comprises stopping the third sequence if the discharge voltage is greater than a predetermined maximum value during the third sequence.
11. A method of automatically optimizing the gas in the amplifier laser chamber of a dual chamber gas discharge laser light source having a master oscillator and an amplifier, each of the master oscillator and amplifier having a laser chamber containing a lasing medium gas comprising a halogen, the method comprising the steps of:
firing the laser in continuous mode at a first rate and target energy while measuring the discharge voltage, and, if the discharge voltage is below a predetermined minimum value, bleeding gas from the amplifier chamber until the discharge voltage is equal to or greater than the minimum value;
firing the laser in continuous mode at a second rate and target energy while measuring the discharge voltage, and, if the discharge voltage is below the predetermined minimum value, bleeding gas from the amplifier chamber until the discharge voltage is equal to or greater than the minimum value; and
firing the laser in bursts at a target energy while measuring the discharge voltage and master oscillator output energy, and, if the discharge voltage is below the predetermined minimum value, or the output energy is below another predetermined minimum value, bleeding gas from the amplifier chamber until both the discharge voltage and the output energy are equal to or greater than the respective predetermined minimum values.
12. The method of claim 11 wherein the halogen comprises fluorine.
13. The method of claim 11 wherein the rate at which the laser is fired during the first sequence is calculated to result in a power output of approximately a few percent of the maximum power output of the laser.
14. The method of claim 13 wherein the rate at which the laser is fired during the second sequence is approximately 10 times the rate at which the laser is fired during the first sequence.
15. The method of claim 11 wherein the bursts fired by the laser during the third sequence are calculated to result in a power output that is approximately equal to the power output which the laser is expected to generate during normal operation.
16. The method of claim 11 wherein the optimization scheme further comprises bleeding gas from the amplifier chamber in determined increments.
17. The method of claim 11 wherein the optimization scheme further comprises measuring the pressure in the amplifier chamber during the first sequence and, if the pressure drops below a predetermined value, stopping the first sequence and commencing the second sequence.
18. The dual chamber gas discharge laser light source of claim 11 wherein the optimization scheme further comprises measuring the pressure in the amplifier chamber during the second sequence and, if the pressure drops below a predetermined value, stopping the second sequence and commencing the third sequence.
19. The method of claim 11 wherein the optimization scheme further comprises measuring the pressure in the amplifier chamber during the third sequence and, if the pressure drops below a predetermined value, stopping the third sequence.
20. The method of claim 11 wherein the optimization scheme further comprises stopping the third sequence if the discharge voltage is greater than a predetermined maximum value during the third sequence.
21. A non-transitory computer-readable medium having embodied thereon a program, the program being executable by a processor to perform a method of automatically optimizing the gas in the amplifier laser chamber of a dual chamber gas discharge laser light source having a master oscillator and an amplifier, each of the master oscillator and amplifier having a laser chamber containing a lasing medium gas comprising a halogen, the method comprising the steps of:
firing the laser in continuous mode at a first rate and target energy while measuring the discharge voltage, and, if the discharge voltage is below a predetermined minimum value, bleeding gas from the amplifier chamber until the discharge voltage is equal to or greater than the minimum value;
firing the laser in continuous mode at a second rate and target energy while measuring the discharge voltage, and, if the discharge voltage is below the predetermined minimum value, bleeding gas from the amplifier chamber until the discharge voltage is equal to or greater than the minimum value; and
firing the laser in bursts at a target energy while measuring the discharge voltage and master oscillator output energy, and, if the discharge voltage is below the predetermined minimum value, or the output energy is below another predetermined minimum value, bleeding gas from the amplifier chamber until both the discharge voltage and the output energy are equal to or greater than the respective predetermined minimum values.