PEO coating on Mg screws
The present invention relates generally to a bio-degradable implant based on magnesium having a reduced corrosion rate and to a method for the production of such an implant. It is a a method for treating a surface of a bio-degradable metallic implant comprising the following steps: providing a dispersed system comprising a colloid-dispersed apatite and adding an apatite powder to the dispersed system, subjecting an implant to the dispersed system such that a surface of the implant which is to be treated is immersed in the dispersed system wherein the implant comprises a magnesium based alloy, applying an AC voltage difference between the implant as a first electrode and a second electrode positioned in the dispersed system for generating a plasma electrolytic oxidation on the immersed surface of the implant so that the immersed surface is converted to an oxide film which is at least partially covered by apatites formed by the colloid-dispersed apatite and the apatite powder. The evolution of corrosion induced hydrogen gas evolution is decreased and osseointegration is improved.
1. A method for treating a surface of a bio-degradable metallic implant comprising the following steps:
providing a dispersed system comprising a colloid-dispersed apatite and
adding an apatite powder to the dispersed system, wherein
the colloid-dispersed apatite is provided by precipitation and has an average particle size of 100 nm or less, and wherein
the apatite powder has an average particle size of 20 μm to 100 μm,
subjecting an implant to the dispersed system such that a surface of the implant which is to be treated is immersed in the dispersed system,
applying an AC voltage difference between the implant as a first electrode and a second electrode positioned in the dispersed system for generating a plasma electrolytic oxidation on the immersed surface of the implant so that the immersed surface is converted to an oxide film which is at least partially covered by apatites formed at least by the colloid-dispersed apatite and the apatite powder.
2. The method of claim 1 , wherein the colloid-dispersed apatite is provided in the dispersed system with a higher concentration than the apatite powder.
3. The method of claim 1 , wherein the apatite powder is provided in the dispersed system with a concentration of 0.01 mg/l to 200 g/l.
4. The method of claim 1 , wherein the colloid-dispersed apatite is provided in the dispersed system with a concentration of 0.01 mg/l to 300 g/l.
5. The method of claim 1 , wherein the apatite powder is provided by drying precipitated colloid-dispersed apatite.
6. The method of claim 1 , wherein the apatite powder is provided by drying and by milling or by pulverizing precipitated colloid-dispersed apatite.
7. The method of claim 1 , wherein the colloid-dispersed apatite or the apatite powder comprises hydroxyl-apatite and/or substituted hydroxyl-apatite.
8. The method of claim 1 , wherein water glass is added to the dispersed system.
9. The method of claim 8 , wherein the water glass is provided in the dispersed system with a concentration of 0.01 g/l to 400 g/l.
10. The method of claim 1 , wherein at least one calcium containing compound or at least one phosphate containing compound is added to the dispersed system.
11. The method of claim 1 , wherein at least one metal and/or at least one metal oxide or at least one metal hydroxide or at least one metal phosphate containing compound is added to the dispersed system.
12. The method of claim 11 , wherein the metal, the metal of the metal oxide, the metal of the metal hydroxide or the metal of the metal phosphate containing compound is at least one metal selected from a group consisting of sodium, potassium, magnesium, calcium, zinc, copper, silver, zirconium, aluminum, silicon and at least one constituent of a material of the implant.
13. The method of claim 11 , wherein the metal is provided in the dispersed system with a concentration of less than or equal to 100 mg/l or the metal oxide and/or the metal hydroxide and/or the metal phosphate containing compound is provided in the dispersed system with a concentration of less than or equal to 20 g/l.