IP Library Granted Patent US 8,610,060
Granted Patent B2
US 8,610,060 · App. 13/202,554 · Granted Dec 17, 2013

Charged particle beam device

Inventors: Suyo Asai (Mito, JP); Tsuyoshi Onishi (Hitachinaka, JP); Toshihide Agemura (Tsuchiura, JP)
Assignee: Hitachi High-Technologies Corporation
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,610,060
App. No.
13/202,554
Granted
Dec 17, 2013
Kind
B2
Abstract

An object of the present invention is related to detecting of a detection signal at an optimum position in such a case that a sample plane is inclined with respect to a charged particle beam. The present invention is related to a charged particle beam apparatus for irradiating a charged particle beam to a sample, in which a detector is moved to a plurality of desirable positions around the sample so as to optimize positions of the detector. In accordance with the present invention, since it is possible to obtain an optimum detection signal in response to an attitude and a shape of the sample, a highly accurate sample observation, for instance, an SEM observation, an STEM observation, and an FIB observation can be carried out. Moreover, in an FIB-SEM apparatus, it is possible to highly accurately detect an end point of an FIB process.

Claims (12)

1. A charged particle beam apparatus comprising: an electron beam optical system for irradiating an electron beam, an ion beam optical system for irradiating an ion beam, a rotatable sample stage, and a detector for detecting a signal from a sample, wherein:

the sample is disposed at a cross point of the electron beam optical system and the ion beam optical system, said detector is disposed on a detector stage, which is equipped with a rotating mechanism, and by the rotating mechanism, said detector is movable to a detective position for detecting a transmission electron which has passed through the sample by irradiating the electron beam and a detective position for detecting a secondary signal which has been emitted from the sample by irradiating the ion beam.

2. A charged particle beam apparatus as claimed in claim 1 , wherein:

said detector is rotatable around a normal of a plane which is constituted by the electron beam optical system and the ion beam optical system.

3. A charged particle beam apparatus as claimed in claim 2 wherein:

the sample stage is rotated with respect to the electron beam optical system or the ion beam optical system, and said detector is moved in response to rotation of the sample stage.

4. The charged particle beam apparatus according to claim 2 , wherein

the detector is movable along a rotational radius direction.

5. The charged particle beam apparatus according to claim 1 , wherein

a detective surface of the detector is divided.

6. The charged particle beam apparatus according to claim 1 , wherein

the detector is movable to an evacuation position.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 19, 2011
From: ASAI, SUYO; ONISHI, TSUYOSHI; AGEMURA, TOSHIHIDE
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 026780/0631 →
Priority Claims (1)
JP 2009-045048 · Feb 27, 2009 · national
Continuity (1)
Related Publication 20110297827A1 · Dec 8, 2011