Layer system for the formation of a surface layer on a surface of a substrate and coating method for the manufacture of a layer system

1. A layer system for the formation of a surface layer on a surface of a substrate, in particular on the surface of a shaping tool, wherein the layer system includes at least one first surface layer of the composition (V a Me b M c X d ) α (N u C v O w )β, where (a+b+c+d) =α, α=100%, with respect to the atoms V a ,Me b ,M c ,X d present in the layer, (u+v+w)=β, β=100% with respect to the atoms N, C, O present in the layer, with the sum of all atoms in the layer (α+β)=100 at %, where 40≦α≦80 at % applies, and where

Me b is at least one element from the group of chemical elements including:

Zr, Hf, Nb, Ta, Mo, W, Ni, Cu, Sc, Y, La, Ce, Pr, Nd, Pm, Sm of the periodic system of chemical elements;

M c is at least one element from the group of chemical elements including:

Ti, Cr; and

X d is at least one element from the group of chemical elements including:

S, Se, Si, B of the periodic system of chemical elements,

where 0≦u≦100, 0≦v≦100 and 0<w≦80,

wherein

50≦a≦99, 1≦b≦50, 0≦c≦50 and 0≦d≦20,

wherein an adhesive strength of the layer system or of the surface layer is from HF 1 to HF 3.

2. A layer system in accordance with claim 1 , wherein 80≦a.

3. The layer system in accordance with claim 1 , wherein Me b is the element Zr.

4. A layer system in accordance with claim 3 , wherein one of a=80, a=84, a=88 and a=97.

5. A layer system in accordance with claim 1 , wherein one of a=80, a=84, a=88 and a=97.

6. A layer system in accordance with claim 1 , wherein the surface layer has the composition (V 95 Me 5 ) α (N u C v O w ) β , where u=30, v=65, w=5, and where Me is Ni.

7. A layer system in accordance with claim 1 , wherein the surface layer has the composition (V 96 Me 4 ) α (N u C v O w ) β , where u=65, v=25, w=10, and where Me is Ce.

8. A layer system in accordance with claim 1 , wherein the surface layer has the composition (V 75 Me 15 X 10 ) α (N u C v O w ) β , where u=25, v=70, w=5, and Me is Mo, and/or X is Si and B in equal parts.

9. A layer system in accordance with claim 1 , wherein the surface layer has the composition (V 75 Me 15 M 10 ) α (N u C v O w ) β , where u=25, v=70, w=5, and Me is Mo and/or M is Cr and αis 52 at %.

10. A layer system in accordance with claim 1 , wherein 40≦α≦60.

11. A layer system in accordance with claim 1 , wherein a further part layer which is an adhesive layer applied directly to the surface of the substrate is provided between the surface layer and the substrate.

12. A layer system in accordance with claim 11 , wherein the part layer is the composition V 97 Zr 3 .

13. A layer system in accordance with claim 11 , wherein the part layer is the composition V 80 Zr 20 .

14. A layer system in accordance with claim 11 , wherein the part layer is the composition (Al 55 Ti 45 ) γ N δ , where γ+δ=100 at % and 40≦γ≦60.

15. A layer system in accordance with claim 1 , wherein the part layer is the composition (Al 69 Cr 29 Mg 1 Si 1 ) γ N δ , where γ+δ=100 at % and 40≦γ≦60.

16. A layer system in accordance with claim 11 , wherein the part layer is the composition (Al 60 Cr 30 Mg 5 Si 5 ) γ N δ , where γ+δ=100 at % and 40≦γ≦60.

17. A layer system in accordance with claim 11 , wherein the part layer is the composition (Cr 91 Ni 3 Al 3 Si 3 ) γ N δ , where γ+δ=100 at % and 40≦γ≦60.

18. A layer system in accordance with claim 11 , wherein the part layer is a TiN part layer.

19. A layer system in accordance with claim 11 , wherein the part layer is a Cr part layer.

20. A layer system in accordance with claim 1 , wherein the hardness of the layer system or of the surface layer has a hardness HK 0.025 between 1500 and 3500.

21. A layer system in accordance with claim 1 , wherein a thickness of the layer system or of the surface layer is between 0.01 μm and 100 μm.

22. A layer system in accordance with claim 1 , wherein the surface layer has a surface roughness R z between 0.2 μm and 10 μm.

23. A layer system in accordance with claim 1 , wherein 45≦α≦55.

24. A layer system for the formation of a surface layer on a surface of a substrate, in particular on the surface of a shaping tool, wherein the layer system includes at least one first surface layer of the composition (V a Me b M c X d ) α (N u C v 0 w )β, where (a+b+c+d)=α, α=100%, with respect to the atoms V a ,Me b ,M c ,X d present in the layer, (u+v+w) =β, β=100% with respect to the atoms N, C, O present in the layer, with the sum of all atoms in the layer (α+β)=100 at %, where 40≦α≦80 at % applies, and where

Me b is at least one element from the group of chemical elements including:

Zr, Hf, Nb, Ta, Mo, W, Ni, Cu, Sc, Y, La, Ce, Pr, Nd, Pm, Sm of the periodic system of chemical elements;

M c is at least one element from the group of chemical elements including:

Ti, Cr;

and X d is at least one element from the group of chemical elements including:

S, Se, Si, B of the periodic system of chemical elements,

where 0≦u≦100, 0≦v≦100 and 0≦w≦80,

wherein

50≦a≦99, 1≦b≦50, 0≦c≦50 and 0≦d≦20,

wherein an adhesive strength of the layer system or of the surface layer is from HF 1 to HF 3; and

wherein a further part layer which is an adhesive layer applied directly to the surface of the substrate is provided between the surface layer and the substrate, the part layer being chosen from the following compositions:

the composition V 97 Zr 3 ;

the composition V 80 Zr 20 ;

the composition (Al 55 Ti 45 ) γ N δ , where γ+δ=100at % and 40≦γ≦60;

the composition (Al 69 Cr 29 Mg 1 Si 1 ) γN δ , where γ+δ=100 at % and 40≦y≦60;

the composition (Al 60 Cr 30 Mg 5 Si 5 ) γ N δ , where γ+δ=100 at % and 40≦γ≦60; and

the composition (Cr 91 Ni 3 Al 3 Si 3 ) γ N δ , where γ+δ=100 at % and 40≦γ≦60.

25. A layer system for the formation of a surface layer on a surface of a substrate, in particular on the surface of a shaping tool, wherein the layer system includes at least one first surface layer of the composition (V a Me b M c X d ) α (N u C v O w ) β , where (a+b+c+d)=α, α=100%, with respect to the atoms V a ,Me b ,M c ,X d present in the layer, (u+v+w) =β, β=100% with respect to the atoms N, C, O present in the layer, with the sum of all atoms in the layer (α+β) =100 at %, where 40≦α≦80 at % applies, and where Me b is at least one element from the group of chemical elements including:

Zr, Hf, Nb, Ta, Mo, W, Ni, Cu, Sc, Y, La, Ce, Pr, Nd, Pm, Sm of the periodic system of chemical elements;

M c is at least one element from the group of chemical elements including:

Ti, Cr; and

X d is at least one element from the group of chemical elements including:

S, Se, Si, B of the periodic system of chemical elements,

where 0≦u≦100, 0≦v≦100 and 0≦w≦80,

wherein

50≦α≦99, 1≦b≦50, 0≦c≦50 and 0≦d≦20;

wherein a further part layer which is an adhesive layer applied directly to the surface of the substrate is provided between the surface layer and the substrate,

wherein the part layer is chosen from A) the composition of V a Zr b , where 80≦a≦97 and 3≦b≦20; B) the composition of (Al 55 Ti 45 ) γ N δ , where γ+δ=100 at % and 40≦γ≦60; C) the composition of (Al c Cr d Mg e Si f ) γ N δ , where γ+=100at %, 40≦γ≦, 60,6 0≦c≦69, 29≦d≦30, 1≦e≦5, and 1≦f≦5; and D) the composition is (Cr 91 Ni 3 Al 3 Si 3 ) γ N δ , where γ+δ=100at % und 40≦γ≦60; and

wherein an adhesive strength of the layer system or of the surface layer is from HF 1to HF 3.