Method of controlling semiconductor process distribution

1. A method of controlling process distribution of a semiconductor process, comprising:

receiving process distribution data representing the process distribution of the semiconductor process;

receiving a parameter related to the process distribution, wherein the parameter is received from a semiconductor wafer processing apparatus and is received at a semiconductor process controlling apparatus;

generating a virtual metrology model corresponding to the process distribution based on a relationship between the process distribution data and the parameter;

selecting an optimized process variable affecting the process distribution from among a plurality of process variables;

modifying the optimized process variable affecting the process distribution based on the virtual metrology model; and

transmitting the optimized process variable from the semiconductor process controlling apparatus to the semiconductor wafer processing apparatus to adjust the process distribution of the semiconductor process in real-time while the semiconductor process is being performed.

2. The method of claim 1 , wherein the parameter is received from at least one sensor of the semiconductor wafer processing apparatus configured to perform the semiconductor process.

3. The method of claim 1 , wherein the parameter is an apparatus variable value set by a process controller of the semiconductor wafer processing apparatus configured to perform the semiconductor process.

4. The method of claim 1 , wherein the virtual metrology model is generated based on a statistical analysis of the relationship between the process distribution data and the parameter, and the statistical analysis uses a partial least squares (PLS) technique.

5. The method of claim 1 , further comprising:

measuring process distribution of each of a plurality of semiconductor wafers processed during the semiconductor process;

determining whether the process distribution of each semiconductor wafer is acceptable; and

modifying the virtual metrology model upon determining that the process distribution of each semiconductor wafer is not acceptable.

6. The method of claim 1 , further comprising:

predicting process distribution of each of a plurality of semiconductor wafers processed during the semiconductor process using the virtual metrology model; and

modifying the optimized process variable based on the predicted process distribution.

7. The method of claim 6 , wherein the parameter is at least one of a value received from a sensor of the semiconductor wafer processing apparatus configured to perform the semiconductor process, or an apparatus variable value set by a process controller of the semiconductor wafer processing apparatus.

8. The method of claim 7 , wherein the value received from the sensor of the semiconductor wafer processing apparatus is one of a temperature, a pressure, or an amount of a reactive gas.

9. The method of claim 7 , wherein the apparatus variable value is one of an amount of a reactive gas, a power value, a temperature, or a pressure.

10. The method of claim 6 , wherein predicting the process distribution of each semiconductor wafer is performed in real-time.

11. The method of claim 1 , wherein the semiconductor process is one of a deposition process, an ion implantation process, a photolithography process, or an etching process.

12. The method of claim 1 , wherein the optimized process variable is selected using the virtual metrology model.

13. A method of controlling process distribution of an etching process, comprising:

receiving process distribution data representing the process distribution of the etching process, wherein the etching process is performed on a semiconductor wafer by a semiconductor wafer etching apparatus;

receiving a parameter related to the process distribution, wherein the parameter is received from the semiconductor wafer etching apparatus and is received at a semiconductor process controlling apparatus;

generating a virtual metrology model corresponding to the process distribution of the etching process based on a relationship between the process distribution data and the parameter;

selecting an optimized process variable affecting the process distribution from among a plurality of process variables;

modifying the optimized process variable affecting the process distribution based on the virtual metrology model; and

transmitting the optimized process variable from the semiconductor process controlling apparatus to the semiconductor wafer etching apparatus to adjust the process distribution of the etching process in real-time while the etching process is being performed.

14. The method of claim 13 , wherein the parameter is at least one of a value received from a sensor of the semiconductor wafer etching apparatus, or an apparatus variable value set by a process controller of the semiconductor wafer etching apparatus.

15. The method of claim 14 , wherein the value received from the sensor of the semiconductor wafer etching apparatus is one of a temperature, a pressure, or an amount of a reactive gas.

16. The method of claim 14 , wherein the apparatus variable value is one of an amount of a reactive gas, a power value, a temperature, or a pressure.

17. The method of claim 13 , further comprising:

forming a material layer pattern on the semiconductor wafer by etching a material layer formed on the semiconductor wafer,

wherein the process distribution data is based on at least one of a critical dimension difference between the material layer pattern of a central area and a corner area of the semiconductor wafer,

a range of the critical dimension difference between the material layer pattern of the central area and the corner area of the semiconductor wafer,

a standard deviation of the critical dimension difference between the material layer pattern of the central area and the corner area of the semiconductor wafer, or

a thickness difference between the material layer pattern of the central area and the corner area of the semiconductor wafer.

18. A system for controlling process distribution of a semiconductor process, comprising:

a semiconductor wafer processing apparatus configured to perform the semiconductor process; and

a semiconductor process controlling apparatus comprising an input circuit configured to receive process distribution data representing the process distribution of the semiconductor process and a parameter related to the process distribution, and a processor configured to generate a virtual metrology model corresponding to the process distribution based on a relationship between the process distribution data and the parameter, select an optimized process variable affecting the process distribution from among a plurality of process variables, modify the optimized process variable affecting the process distribution based on the virtual metrology model, and transmit the optimized process variable to the semiconductor wafer processing apparatus to adjust the process distribution of the semiconductor process in real-time while the semiconductor process is being performed.

19. The system of claim 18 , further comprising:

a photosensor configured to detect light in a chamber of the semiconductor wafer processing apparatus, wherein the parameter is the amount of light detected by the photosensor.

20. The system of claim 18 , further comprising:

a temperature sensor configured to detect a temperature of a chamber of the semiconductor wafer processing apparatus;

a pressure sensor configured to detect a pressure of the chamber; and

a gas analyzing sensor configured to analyze a reactive gas generated by the chamber,

wherein the parameter is one of the temperature of the chamber, the pressure of the chamber, or the reactive gas generated by the chamber.

21. The system of claim 18 , wherein the semiconductor wafer processing apparatus further comprises a process controller configured to set an apparatus variable value, wherein the parameter is the apparatus variable value.

22. A method of controlling process distribution of a semiconductor process, comprising:

receiving process distribution data representing the process distribution of the semiconductor process;

receiving a first parameter related to the process distribution, wherein the first parameter is received at a semiconductor process controlling apparatus and received from a semiconductor wafer processing apparatus, and the first parameter is an optical emission spectroscopy (OES) variable representing light energy detected at the semiconductor wafer processing apparatus;

receiving a second parameter related to the process distribution, wherein the second parameter is received at the semiconductor process controlling apparatus and received from the semiconductor wafer processing apparatus, and the second parameter is an environmental variable representing a temperature of a chamber of the semiconductor wafer processing apparatus, a pressure of the chamber, or an amount of reactive gas generated by the chamber;

receiving a third parameter related to the process distribution, wherein the third parameter is received at the semiconductor process controlling apparatus and received from the semiconductor wafer processing apparatus, and the third parameter is an apparatus variable representing an amount of gas supplied to the chamber, a gas rate of the gas supplied to the chamber, an RF power value applied to a susceptor of the chamber, a temperature of a component of the chamber, or a pressure of the chamber;

generating a virtual metrology model corresponding to the process distribution based on a relationship between the process distribution data and the first, second and third parameters; and

modifying a process variable affecting the process distribution based on the virtual metrology model.