IP Library Patent Application 13250011
Patent Application
App. No. 13/250,011

DIFFRACTIVE PHOTO MASKS AND METHODS OF USING AND FABRICATING THE SAME

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Patent No.
US None
App. No.
13/250,011
Abstract

An exemplary embodiment of the present invention provides a diffractive photo-mask comprising a body element, a plurality of interference/image-forming hologram gratings, and a zero-order beam blocking element. The plurality of interference/image-forming hologram gratings can be located on or in the body element. The plurality of interference/image-forming hologram gratings are configured to diffract a light beam to produce one or more functional elements surrounded by a high-spatial-frequency periodic optical-intensity distribution at a substrate plane when the light beam is incident upon the diffractive photo-mask. The zero-order beam blocking element is configured to block zero-order diffracted beams when the light beam is incident upon the diffractive photo-mask

Claims (26)

1 . A diffractive photo-mask, comprising:

a body element;

a plurality of interference/image-forming hologram gratings located on or in the body element and configured to diffract a light beam to produce one or more functional elements surrounded by a high-spatial-frequency periodic optical-intensity distribution at a substrate plane, when the light beam is incident upon the diffractive photo-mask; and

a zero-order beam blocking element configured to block zero-order diffracted beams when the light beam is incident upon the diffractive photo-mask.

2 . The diffractive photo-mask of claim 1 , wherein the diffractive photo-mask is located proximate to a surface of a photosensitive material.

3 . The diffractive photo-mask of claim 1 , wherein the plurality of interference/image-forming hologram gratings are located proximate to a top surface of the body element.

4 . The diffractive photo-mask of claim 1 , further comprising a transparent material configured to place the diffractive photo-mask in physical contact with a photosensitive material at the substrate plane.

5 . The diffractive photo-mask of claim 1 , wherein the plurality of interference/image-forming hologram gratings comprise at least one high-efficiency volume grating.

6 . The diffractive photo-mask of claim 1 , wherein the plurality of interference/image-forming hologram gratings comprise at least one material having an index of refraction that is different than an index of refraction of the body element.

7 . A method of fabricating a high-spatial frequency periodic structure comprising:

directing a light beam to be incident upon a diffractive photo-mask, such that the diffractive photo-mask diffracts the light beam to produce one or more functional elements surrounded by a high-spatial-frequency periodic optical-intensity distribution at a substrate plane.

8 . The method of fabricating a high-spatial frequency periodic structure of claim 7 , further comprising placing the diffractive photo-mask proximate a surface of a photosensitive material, such that the photosensitive material is located proximate to the substrate plane.

9 . The method of fabricating a high-spatial frequency periodic structure of claim 7 , wherein the diffractive photo-mask comprises:

a body element;

a plurality of interference/image-forming hologram gratings located on or in the body element and configured to diffract the light beam to produce one or more functional elements surrounded by a high-spatial-frequency periodic optical-intensity distribution at a substrate plane; and

a zero-order beam blocking element configured to block zero-order diffracted beams.

10 . The method of fabricating a high-spatial frequency periodic structure of claim 9 , wherein the plurality of interference/image-forming hologram gratings are located proximate to a top surface of the body element.

11 . The method of fabricating a high-spatial frequency periodic structure of claim 9 , wherein the diffractive photo-mask further comprises a transparent material placing the diffractive photo-mask in physical contact with the photosensitive material at the substrate plane.

12 . The method of fabricating a high-spatial frequency periodic structure of claim 9 , wherein the plurality of interference/image-forming hologram gratings comprise at least one high-efficiency volume grating.

13 . The method of fabricating a high-spatial frequency periodic structure of claim 9 , wherein the plurality of interference/image-forming hologram gratings comprise at least one material having an index of refraction that is different than an index of refraction of the body element.

14 . A method of fabricating a diffractive photo-mask, the method comprising:

transmitting a zero-order reference light beam that interferes with a plurality of interference/image-forming light beams to interferometrically record a plurality of interference/image-forming hologram gratings in a photo-mask recording material.

15 . The method of fabricating a diffractive photo-mask of claim 14 , further comprising monitoring and adjusting an alignment of a functional-element image.

16 . The method of fabricating a diffractive photo-mask of claim 15 , wherein adjusting the alignment of the functional element image incorporates automatic feedback control technology.

17 . The method of fabricating a diffractive photo-mask of claim 14 , wherein the plurality of interference/image-forming hologram gratings are formed by a scanned writing method.

18 . The method of fabricating a diffractive photo-mask of claim 14 , wherein the interference/image-forming hologram gratings are configured to diffract a beam of light to produce a functional-element optical-intensity distribution.

Assignments (2)
CONFIRMATORY LICENSE Recorded May 24, 2012
From: GEORGIA TECH RESEARCH CORPORATION
To: NATIONAL SCIENCE FOUNDATION
Reel/Frame 028274/0640 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 15, 2011
From: BURROW, GUY MATTHEW; GAYLORD, THOMAS K.
To: GEORGIA TECH RESEARCH CORPORATION
Reel/Frame 027228/0873 →