IP Library Granted Patent US 8,796,904
Granted Patent B2
US 8,796,904 · App. 13/286,051 · Granted Aug 5, 2014

Bulk acoustic resonator comprising piezoelectric layer and inverse piezoelectric layer

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Quick Facts
Patent No.
US 8,796,904
App. No.
13/286,051
Granted
Aug 5, 2014
Kind
B2
Abstract

In a representative embodiment, a bulk acoustic wave (BAW) resonator, comprises: a first electrode disposed over a substrate; a first piezoelectric layer disposed over the first electrode, the first piezoelectric layer having a first c-axis oriented along a first direction; a second electrode disposed over the first piezoelectric layer; and a second piezoelectric layer disposed over the first electrode and adjacent to the first piezoelectric layer, wherein the second piezoelectric layer has a second c-axis oriented in a second direction that is substantially antiparallel to the first direction.

Claims (37)

1. A bulk acoustic wave (BAW) resonator structure, comprising:

a first electrode disposed over a substrate;

a first piezoelectric layer disposed over the first electrode, the first piezoelectric layer having a first c-axis oriented along a first direction;

a second piezoelectric layer disposed over the first electrode, wherein the second piezoelectric layer has a second c-axis oriented in a second direction that is substantially antiparallel to the first direction; and

a second electrode disposed over the first piezoelectric layer and over the second piezoelectric layer, the second electrode being in direct contact with the first piezoelectric and in direct contact with the second piezoelectric layer.

2. A BAW resonator structure as claimed in claim 1 , wherein the second piezoelectric layer has a piezoelectric coupling coefficient (e 33ip ) that is substantially equal in magnitude but opposite in sign of a piezoelectric coupling coefficient (e 33p ) of the first piezoelectric layer.

3. A BAW resonator structure as claimed in claim 1 , wherein the first piezoelectric layer and the second piezoelectric layer each comprise the same piezoelectric material having substantially identical elastic properties.

4. A BAW resonator structure as claimed in claim 3 , wherein the piezoelectric material comprises one of aluminum nitride (AlN) and zinc oxide (ZnO).

5. A bulk acoustic wave (BAW) resonator structure, comprising:

a first electrode disposed over a substrate;

a first piezoelectric layer disposed over the first electrode, the first piezoelectric layer having a first c-axis oriented along a first direction;

a second electrode disposed over the first piezoelectric layer;

a second piezoelectric layer disposed over the first electrode and adjacent to the first piezoelectric layer, the second piezoelectric layer having a second c-axis oriented along a second direction that is substantially antiparallel to the first direction;

a third piezoelectric layer disposed over the second electrode, the third piezoelectric layer having a third c-axis oriented parallel to the first direction;

a third electrode disposed over the third piezoelectric layer;

a fourth piezoelectric layer disposed over the second electrode and adjacent to the third piezoelectric layer, the second piezoelectric layer having a fourth c-axis oriented parallel to the second direction.

6. A BAW resonator structure as claimed in claim 5 , wherein the second piezoelectric layer has a piezoelectric coupling coefficient (e 33ip ) in a range between approximately −0.1 times a piezoelectric coupling coefficient (e 33p ) of the first piezoelectric layer and approximately −2 times a piezoelectric coupling coefficient (e 33p ) of the first piezoelectric layer.

7. A BAW resonator as claimed in claim 6 , wherein the second piezoelectric layer has a piezoelectric coupling coefficient (e 33ip ) in a range between approximately −0.1 times a piezoelectric coupling coefficient (e 33p ) of the first piezoelectric layer and approximately −2 times a piezoelectric coupling coefficient (e 33p ) of the first piezoelectric layer, and the fourth piezoelectric layer has a piezoelectric coupling coefficient (e 33ip ) in a range between approximately −0.1 times a piezoelectric coupling coefficient (e 33p ) of the third piezoelectric layer and approximately −2 times a piezoelectric coupling coefficient (e 33p ) of the third piezoelectric layer.

8. A RAW resonator structure as claimed in claim 6 , wherein the first piezoelectric layer and the second piezoelectric layer each comprise the same piezoelectric material having substantially identical elastic properties.

9. A BAW resonator structure as claimed in claim 8 , wherein the piezoelectric material comprises one of aluminum nitride (AIN) and Zinc Oxide (ZnO).

10. A BAW resonator structure as claimed in claim 9 , further comprising an acoustic reflector disposed beneath the first electrode.

11. A BAW resonator structure as claimed in claim 10 , wherein the acoustic reflector comprises a cavity.

12. A BAW resonator as claimed in claim 11 , wherein an active region of the BAW resonator comprises an overlap of the first electrode, the second electrode and the third electrode with the cavity.

13. A BAW resonator as claimed in claim 12 , wherein the second electrode overlaps the second and the fourth piezoelectric layer, and the third electrode overlaps the second and the fourth piezoelectric layer.

14. A BAW resonator as claimed in claim 5 , further comprising: an acoustic coupling layer disposed between the second electrode and the second piezoelectric layer; and a fourth electrode disposed above the acoustic coupling layer and beneath the second piezoelectric layer.

15. A bulk acoustic wave (BAW) resonator structure, comprising:

a first electrode disposed over a substrate;

a cavity beneath the first electrode;

a first piezoelectric layer disposed over the first electrode, the first piezoelectric layer having a first c-axis oriented along a first direction;

a second electrode disposed over the first piezoelectric layer, wherein an active region of the BAW resonator structure comprises an overlap of the first electrode and the second electrode with the cavity; and

a second piezoelectric layer disposed over the first electrode and adjacent to the first piezoelectric layer, the second piezoelectric layer having a second c-axis oriented in a second direction that is substantially antiparallel to the first direction, wherein the second electrode overlaps the second piezoelectric layer.

16. A bulk acoustic wave (BAW) resonator structure, comprising:

a first electrode disposed over a substrate;

a first piezoelectric layer disposed over the first electrode, the first piezoelectric layer having a first c-axis oriented along a first direction;

a second electrode disposed over the first piezoelectric layer; and

a second piezoelectric layer disposed over the first electrode and adjacent to the first piezoelectric layer, the second piezoelectric layer having a second c-axis oriented in a second direction that is substantially antiparallel to the first direction, wherein the second piezoelectric layer has a piezoelectric coupling coefficient (e 33ip ) in a range between approximately −0.1 times a piezoelectric coupling coefficient (e 33p ) of the first piezoelectric layer and approximately −2 times a piezoelectric coupling coefficient (e 33p ) of the first piezoelectric layer.

17. A BAW resonator structure as claimed in claim 6 , wherein the second electrode does not overlap an edge of the cavity.

Assignments (9)
CORRECTIVE ASSIGNMENT TO CORRECT THE ERROR IN RECORDING THE MERGER IN THE INCORRECT US PATENT NO. 8,876,094 PREVIOUSLY RECORDED ON REEL 047351 FRAME 0384. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER. Recorded Mar 8, 2019
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 049248/0558 →
CORRECTIVE ASSIGNMENT TO CORRECT THE EFFECTIVE DATE OF THE MERGER PREVIOUSLY RECORDED AT REEL: 047230 FRAME: 0910. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER. Recorded Oct 29, 2018
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 047351/0384 →
MERGER Recorded Oct 4, 2018
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 047230/0910 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENTS Recorded Feb 3, 2017
From: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 041710/0001 →
PATENT SECURITY AGREEMENT Recorded Feb 11, 2016
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
Reel/Frame 037808/0001 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENT RIGHTS (RELEASES RF 032851-0001) Recorded Feb 2, 2016
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 037689/0001 →
PATENT SECURITY AGREEMENT Recorded May 8, 2014
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 032851/0001 →
MERGER Recorded May 7, 2013
From: AVAGO TECHNOLOGIES WIRELESS IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 030369/0471 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 1, 2011
From: BURAK, DARIUSZ; GRANNEN, KEVIN J.; LARSON, JOHN D., III; SHIRAKAWA, ALEXANDRE
To: AVAGO TECHNOLOGIES WIRELESS IP (SINGAPORE) PTE. LTD.
Reel/Frame 027152/0282 →