Heat treatment apparatus emitting flash of light
View Patent ↗Flash lamps connected to short-pulse circuits and flash lamps connected to long-pulse circuits are alternately arranged in a line. The duration of light emission from the flash lamps connected to the long-pulse circuits is longer than the duration of light emission from the flash lamps connected to the short-pulse circuits. A superimposing of a flash of light with a high peak intensity from the flash lamps that emit light for a short time and a flash of light with a gentle peak from the flash lamps that emit light for a long time can increase the temperature of even a deep portion of a substrate to an activation temperature or more without heating a shallow portion near the substrate surface more than necessary. This achieves the activation of deep junctions without causing substrate warpage or cracking.
1. A heat treatment method irradiating a substrate with flashes of light to heat the substrate, comprising:
(a) a temperature increasing step of irradiating said substrate with a flash of light to increase a surface temperature of said substrate to a treatment temperature of a predetermined value; and
(b) a temperature maintaining step of maintaining the surface temperature of said substrate at said treatment temperature equal to said predetermined value for not less than a predetermined duration of time by keeping a heating effectiveness of irradiation of a flash of light after said temperature increasing step.
2. The heat treatment method according to claim 1 , wherein
said temperature increasing step is performed by irradiation of a flash of light having a first peak value, and
said temperature maintaining step is performed by irradiation of a flash of light having a second peak value lower than said first peak value.
3. The heat treatment method according to claim 1 , wherein
said predetermined value is a temperature at which ions implanted in said substrate are activated.