Inverted optical device

1. A method comprising:

attaching a plurality of piggyback substrates to a carrier wafer using a plurality of bond layers, wherein said plurality of piggyback substrates are dissimilar in composition to said carrier wafer;

processing said plurality of piggyback substrates, while attached to said carrier wafer, to produce a plurality of light emitting diodes;

attaching a flip wafer to said plurality of light emitting diodes, away from said carrier wafer; and

removing only said carrier wafer and plurality of bond layers.

2. The method of claim 1 further comprising forming conductive structures through said flip wafer to electrically couple to contacts of said plurality of light emitting diode.

3. The method of claim 1 further comprising singulating said plurality of light emitting diodes to form individual light emitting diode devices.

4. The method of claim 1 further comprising removing said plurality of piggyback substrates.

5. The method of claim 4 further comprising roughening an exposed surface of said plurality of light emitting diodes subsequent to said removing said plurality of piggyback substrates.

6. The method of claim 4 wherein said removing said plurality of piggyback substrates comprises a laser lift-off process.

7. The method of claim 1 further comprising filling a volume between said plurality of light emitting diodes.

8. The method of claim 1 further comprising forming conductive vias through said flip wafer.

9. The method of claim 8 further comprising forming a plurality of package electrical contacts on said flip wafer electrically coupled to said conductive vias.

10. The method of claim 8 further comprising electrically coupling said conductive vias to terminals of said plurality of light emitting diodes.

11. The method of claim 1 further comprising forming a plurality of optical layers on said plurality of light emitting diodes, opposite from said flip wafer.

12. The method of claim 11 wherein one of said plurality of optical layers having the highest refractive index is placed closest to said plurality of light emitting diodes.

13. The method of claim 1 wherein said carrier wafer is transparent to ultra-violet light and suitable to bond to sapphire.

14. The method of claim 13 wherein said carrier wafer comprises quartz.

15. The method of claim 13 wherein said flip wafer comprises glass.

16. The method of claim 1 wherein a surface of said flip wafer closest to said plurality of light emitting diodes is polished.

17. The method of claim 1 further comprising polishing said plurality of piggyback substrates subsequent to said removing said carrier wafer.

18. A method comprising:

bonding a piggyback substrate to a carrier wafer using a plurality of bond layers;

fabricating a light emitting diode on said piggyback substrate while bonded to said carrier wafer;

attaching a flip wafer to the top of said light emitting diode, away from said carrier wafer;

removing only said carrier wafer and plurality of bond layers; and

separating said piggyback substrate from said light emitting diode.

19. The method of claim 18 wherein said separating further comprises removing said carrier wafer.

20. The method of claim 18 further comprising forming electrical contacts from said light emitting diode to a side of said flip wafer away from said light emitting diode.

21. The method of claim 18 further comprising singulating said light emitting diode from any other device attached to said flip wafer.

22. The method of claim 21 wherein said singulating retains a portion of said flip wafer attached to said light emitting diode.

23. The method of claim 18 further comprising forming a plurality of optical layers on said plurality of light emitting diodes, opposite from said flip wafer.