Thin film deposition using microwave plasma
A method of processing a substrate in a processing chamber is provided. The method generally includes applying a microwave power to an antenna coupled to a microwave source disposed within the processing chamber, wherein the microwave source is disposed relatively above a gas feeding source configured to provide a gas distribution coverage covering substantially an entire surface of the substrate, and exposing the substrate to a microwave plasma generated from a processing gas provided by the gas feeding source to deposit a silicon-containing layer on the substrate at a temperature lower than about 200 degrees Celsius, the microwave plasma using a microwave power having a power density of about 500 milliWatts/cm 2 to about 5,000 milliWatts/cm 2 at a frequency of about 1 GHz to about 10 GHz.
1. A method of depositing a dielectric layer over a substrate, comprising:
supporting a substrate in a processing volume of a processing chamber having a microwave source and a gas feeding source disposed in the processing volume, wherein the gas feeding source comprises an array of gas feeding lines arranged parallel and longitudinally spaced from each other at a distance between about 50 mm and about 200 mm;
providing a processing gas comprising a silicon-containing precursor and argon gas into the gas feeding source at a gas flow ratio of silicon-containing precursor to argon gas (silicon-containing precursor:argon gas) between about 1:5 and about 1:10;
flowing the processing gas from the gas feeding source into the processing volume;
generating a plasma from the processing gas in the processing volume by applying a microwave power to an antenna coupled to the microwave source; and
depositing a dielectric layer on the substrate in the presence of the plasma using a microwave power having a power density of about 500 milliWatts/cm 2 to about 5,000 milliWatts/cm 2 at a frequency of about 1 GHz to about 10 GHz, wherein the substrate is maintained at a temperature lower than about 200 degrees Celsius during the deposition, and the microwave source comprises one or more linear microwave generators arranged parallel and longitudinally spaced from each other at a distance between about 180 mm and about 350 mm, and wherein the length of the linear microwave generators is about 3 meters.
2. The method of claim 1 , wherein the gas feeding lines have a length longer than a diameter of the substrate.
3. The method of claim 1 , wherein the one or more linear microwave generators have a length equal or longer than the length of the gas feeding lines.
4. The method of claim 1 , wherein the distance between the linear microwave generators and the gas feeding lines is between about 25 mm and about 125 mm.
5. A method of depositing a dielectric layer over a substrate, comprising:
supporting a substrate in a processing volume of a processing chamber having a microwave source and a gas feeding source disposed in the processing volume, wherein the microwave source comprises one or more linear microwave generators arranged parallel and longitudinally spaced from each other at a distance between about 180 mm and about 350 mm, and wherein the gas feeding source comprises an array of gas feeding lines arranged parallel and longitudinally spaced from each other at a distance between about 50 mm and about 200 mm, and wherein the gas feeding lines have a length longer than a diameter of the substrate;
flowing a processing gas from the gas feeding source into the processing volume;
generating a plasma from the processing gas in the processing volume by applying a microwave power to an antenna coupled to the microwave source; and
depositing a dielectric layer on the substrate in the presence of the plasma using a microwave power having a power density of about 500 milliWatts/cm 2 to about 5,000 milliWatts/cm 2 at a frequency of about 1 GHz to about 10 GHz, wherein the substrate is maintained at a temperature lower than about 200 degrees Celsius during the deposition.