Processing system
A processing system includes a particle beam column for generating a particle beam directed to a first processing location; a laser system for generating a laser beam directed to a second processing location located at a distance from the first processing location; and a protector including an actuator and a plate connected to the actuator. The actuator is configured to move the plate between a first position in which it protects a component of the particle beam column from particles released from the object by the laser beam and a second position in which the component of the particle beam column is not protected from particles released from the object by the laser beam.
1. A system, comprising:
a particle beam column configured to generate a particle beam directed to a first processing location;
a laser system configured to generate a laser beam directed to a second processing location located a distance from the first processing location;
a stage comprising a base and an object mount to mount an object, the stage being configured to displace the object mount relative to the base in at least two independent directions;
a first stage mount configured to hold the stage in a first position such that, when the stage is in the first position, the object is located in a region of the first processing location;
a second stage mount configured to mount the stage in a second position such that, when the stage is in the second position, the object is located in a region of the second processing location; and
a transport device configured to transport the stage between the first and second positions.
2. The system of claim 1 , wherein at least one of the first and second stage mounts comprises a position sensor to detect a position of the stage mount.
3. The system according to claim 2 , wherein the particle beam column is an electron beam column.
4. The system according to claim 2 , wherein the particle beam column is an ion beam column.
5. The system according to claim 1 , further comprising a vacuum chamber, wherein the first processing location, the second processing location, and a transport path of the stage between the first and second positions are located within the vacuum chamber.
6. The system according to claim 5 , wherein the vacuum chamber includes a door separating a first vacuum space in which the first processing location is located from a second vacuum space in which the second processing location is located.
7. The system according to claim 6 , wherein the transport device comprises a rod and a connector attached to the rod, the connector is configured to be attached to the stage, the transport device is configured to move the rod between first and second rod positions, the connector is located closer to the first processing location when the rod is in the first rod position than when rod is in the second rod position, and the rod extends through an opening of the door when the rod is in the first rod position.
8. The system of claim 7 , wherein at least one of the first and second stage mounts comprises a position sensor to detect a position of the stage mount.
9. The system according to claim 7 , wherein the particle beam column is an electron beam column.
10. The system according to claim 7 , wherein the particle beam column is an ion beam column.
11. The system of claim 6 , wherein at least one of the first and second stage mounts comprises a position sensor to detect a position of the stage mount.
12. The system according to claim 6 , wherein the particle beam column is an electron beam column.
13. The system according to claim 6 , wherein the particle beam column is an ion beam column.
14. The system of claim 5 , wherein at least one of the first and second stage mounts comprises a position sensor to detect a position of the stage mount.
15. The system according to claim 5 , wherein the particle beam column is an electron beam column.
16. The system according to claim 5 , wherein the particle beam column is an ion beam column.
17. The system according to claim 1 , wherein the particle beam column is an electron beam column.
18. The system according to claim 1 , wherein the particle beam column is an ion beam column.
19. A method comprising:
using the system of claim 1 to modify and/or inspect an object.
20. The method of claim 19 , wherein the particle beam column is an ion beam column or an electron beam column.