Ion beam stabilization
Ion microscope methods and systems are disclosed. In general, the systems and methods provide high ion beam stability.
1. A method, comprising:
using a gas field ion source to generate a first ion beam comprising ions of a first gas and ions of a second gas different from the first gas; and
separating the first ion beam into a second ion beam and a third ion beam in a single step, the first ion beam comprising at least 10% ions of the first gas and at most 1% ions of the second gas, the second ion beam comprising at least 10% ions of the second gas and at most 1% ions of the first gas.
2. The method of claim 1 , further comprising imaging a tip of the gas field ion source using the first and second ion beams.
3. The method of claim 1 , further comprising simultaneously interacting the second and third ion beams with a sample to investigate and/or modify the sample.
4. The method of claim 1 , further comprising exposing the gas field ion source to atoms of both the first gas and the second gas to generate the first ion beam.
5. The method of claim 4 , wherein a pressure of the first gas is at most four times a pressure of the second gas, and/or the pressure of the first gas is at least 0.25 times the pressure of the second gas.
6. The method of claim 1 , wherein the first gas is a first noble gas, and/or the second gas is a noble gas.
7. The method of claim 1 , wherein the second ion beam comprises at least 25% ions of the first gas, and/or the third ion beam comprises at least 25% ions of the second gas.
8. The method of claim 1 , wherein the second ion beam comprises at most 0.1% ions of the second gas, and/or the third ion beam comprises at most 0.1% ions of the first gas.
9. The method of claim 1 , using an ion beam separator comprising a magnetic field source to separate the first ion beam into the second and third ion beams.
10. The method of claim 9 , wherein the ion beam separator comprises a combination of magnetic and electric fields.
11. The method of claim 9 , wherein the first ion beam comprises ions of different isotopes of an atom, the second ion beam comprises ions of a first isotope of the atom, and the third ion beam comprises ions of a second isotope of the atom.
12. A system, comprising:
a gas field ion source capable of generating a first ion beam comprised of ions with different masses; and
an ion beam separator configured so that during use of the system the ion beam separator separates ions in the first ion beam into second and third ion beams in a single step, the second ion beam comprising at least 10% ions of a first mass and at most 1% ions of a second mass different from the first mass, and the third ion beam comprising at least 10% ions of the second mass and at most 1% ions of the first mass.
13. The system of claim 12 , wherein the ion beam separator separates the first ion beam into the second and third ion beams based on at least one parameter selected from the group consisting of ion mass, ion charge and ion velocity.
14. The system of claim 12 , wherein the system comprises ion optics configured to direct ions from the gas field ion source to a sample during use of the system, and the ion optics comprise the ion beam separator.
15. The system of claim 14 , wherein the ion optics further comprise an aperture.
16. The system of claim 12 , wherein the ion beam separator is capable of generating a magnetic field and an electric field.
17. The system of claim 12 , wherein the ion beam separator separates ion beams of the same atoms, but of different isotopic masses.
18. The system of claim 12 , wherein the system is a gas field ion microscope.
19. The method of claim 1 , wherein forming the first ion beam comprises exposing the gas field ion source to a gas mixture comprising at least 80% of the first gas and at most 20% of the second gas.
20. The method of claim 19 , wherein the gases are both noble gases.
21. The method of claim 19 , wherein the ion beam has a current at a sample that changes by less than 10% during a period of time that is at least 30 seconds.
22. The method of claim 19 , wherein the gas field ion source has a duty cycle of at least 90% for a time period of at least one day.
23. The method of claim 19 , wherein the presence of the second gas allows the system to produce an ion beam with an angular current density that is increased by at least 20%.
24. The method of claim 19 , wherein the presence of the second gas allows the system to produce an ion beam with an energy spread that is reduced by at least 20%.
25. The method of claim 19 , wherein the presence of the second gas allows the system to produce an ion beam with an angular spread that is reduced by at least 20%.
26. The method of claim 19 , wherein the presence of the second gas reduces the fluctuations in emission current by 50%.