IP Library Granted Patent US 8,878,319
Granted Patent B2
US 8,878,319 · App. 13/336,524 · Granted Nov 4, 2014

Magnetic tunnel junction device and method for fabricating the same

Inventor: Won Joon Choi (Seoul, KR)
Assignee: SK Hynix Inc.
H01L43/02H01L43/12H01L43/08
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Quick Facts
Patent No.
US 8,878,319
App. No.
13/336,524
Granted
Nov 4, 2014
Kind
B2
Abstract

A magnetic tunnel junction device includes a first electrode having a curved top surface, a magnetic tunnel junction layer formed along the top surface of the first electrode, and a second electrode formed on the magnetic tunnel junction layer.

Claims (34)

1. A magnetic tunnel junction device, comprising:

a first electrode having a curved top surface;

a magnetic tunnel junction layer formed along the top surface of the first electrode; and

a second electrode formed on the magnetic tunnel junction,

wherein the magnetic tunnel junction layer includes:

a free layer arranged on the top surface of the first electrode;

a tunnel insulating layer arranged on a top surface of the free layer;

a pinned layer arranged on a top surface of the tunnel insulating layer; and

a pinning layer arranged on a top surface of the pinned layer.

2. The magnetic tunnel junction device as recited in claim 1 , wherein the magnetic tunnel junction layer has a cross section in a form of one selected from the group of oval, circle, and rectangular.

3. The magnetic tunnel junction device as recited in claim 1 , wherein the first electrode has one of a convex shaped structure and a dome shaped structure.

4. The magnetic tunnel junction device as recited in claim 1 , wherein a bottom part of the first electrode includes a protrusion having a cylinder shape.

5. The magnetic tunnel junction device as recited in claim 1 , wherein a top surface of the second electrode is flat by planarization.

6. A magnetic tunnel junction device, comprising:

a first electrode having a curved top surface;

a magnetic tunnel junction layer formed along the top surface of the first electrode; and

a second electrode formed on the magnetic tunnel junction,

wherein the magnetic tunnel junction layer includes:

an anti-ferromagnetic layer arranged on the first electrode;

a first ferromagnetic layer arranged on the anti-ferromagnetic layer;

a ruthenium layer arranged on the first ferromagnetic layer;

a second ferromagnetic layer arranged on the ruthenium layer;

a tunnel insulating layer arranged on the second ferromagnetic layer; and

a third ferromagnetic layer arranged on the tunnel insulating layer.

7. A magnetic tunnel junction device, comprising:

a first electrode having a curved top surface;

a magnetic tunnel junction layer formed along the top surface of the first electrode; and

a second electrode formed on the magnetic tunnel junction,

wherein the magnetic tunnel junction layer includes:

a first ferromagnetic layer arranged on the first electrode;

a ruthenium layer arranged on the first ferromagnetic layer;

a second ferromagnetic layer arranged on the ruthenium layer;

a tunnel insulating layer arranged on the second ferromagnetic layer; and

a third ferromagnetic layer arranged on the tunnel insulating layer.

Assignments (2)
CHANGE OF NAME Recorded Jun 4, 2014
From: HYNIX SEMICONDUCTOR INC.
To: SK HYNIX INC.
Reel/Frame 033084/0009 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 23, 2011
From: CHOI, WON JOON
To: HYNIX SEMICONDUCTOR INC.
Reel/Frame 027442/0216 →
Priority Claims (1)
KR 10-2011-0069464 · Jul 13, 2011 · national
Continuity (1)
Related Publication 20130015540A1 · Jan 17, 2013