Method and apparatus of pattern inspection and semiconductor inspection system using the same
View Patent ↗A pattern inspection apparatus can be provided, for example, in a scanning electron microscope system. When patterns of a plurality of layers are included in a SEM image, the apparatus separates the patterns according to each layer by using design data of the plurality of layers corresponding to the patterns. Consequently, the apparatus can realize inspection with use of only the pattern of a target layer to be inspected, pattern inspection differently for different layers, or detection of a positional offset between the layers.
1. A pattern measuring apparatus comprising:
a processor configured to measure a pattern dimension of an object of a semiconductor device based on image data obtained by a scanning electron microscope,
wherein the processor is further configured to perform the machine-implemented steps of:
selecting design data of the measured object from the design data of the semiconductor device;
performing a pattern recognition using the selected design data, such that the measured object is recognized from the image data which is obtained by the scanning electron microscope including a plurality of overlapped patterns; and
measuring the recognized measured object.
2. The pattern measuring apparatus according to claim 1 ,
wherein the processor recognizes the measured object by a pattern matching using the selected design data.
3. The pattern measuring apparatus according to claim 1 ,
wherein the processor measures a dimension between a first line constituting the measured object of the design data and a second line which is included in the image data obtained by the scanning electron microscope.
4. The pattern measuring apparatus according to claim 3 ,
wherein the processor recognizes the second line being the nearest to the first line as a line constituting the measured object on the image data.
5. The pattern measuring apparatus according to claim 3 ,
wherein the processor measures the dimension between the first line and the second line for each first line.
6. A pattern measuring apparatus comprising:
a processor configured to measure a pattern dimension of an object of a semiconductor device based on image data which is obtained by a scanning electron microscope,
wherein the processor is further configured to perform the machine-implemented steps of:
selecting design data of a specific layer which includes the measured object from the design data of the semiconductor device;
performing a pattern recognition using the selected design data, such that the measured object is recognized from the image data which is obtained by the scanning electron microscope including a plurality of overlapped patterns; and
measuring the recognized measured object.
7. The pattern measuring apparatus according to claim 6 ,
wherein the processor recognizes the measured object by a pattern matching using the selected design data.
8. The pattern measuring apparatus according to claim 6 ,
wherein the processor measures a dimension between a first line constituting the measured object of the design data and a second line which is included in the image data obtained by the scanning electron microscope.
9. The pattern measuring apparatus according to claim 8 ,
wherein the processor recognizes the second line being the nearest to the first line as a line constituting the measured object on the image data.
10. The pattern measuring apparatus according to claim 8 ,
wherein the processor measures the dimension between the first line and the second line for each first line.