IP Library Granted Patent US 8,269,959
Granted Patent B2
US 8,269,959 · App. 13/347,245 · Granted Sep 18, 2012

Inspection method and inspection apparatus

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Quick Facts
Patent No.
US 8,269,959
App. No.
13/347,245
Granted
Sep 18, 2012
Kind
B2
Abstract

The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.

Claims (10)

1. An inspection apparatus comprising:

an illumination unit configured to illuminate an object with light,

a spatial filter, and

a changing unit which changes type of diffraction pattern formed on said spatial filter as a function of type of pattern formed on the object.

2. The inspection apparatus according to claim 1 , wherein said changing unit is arranged at optical path of said illumination unit.

3. The inspection apparatus according to claim 2 , wherein said changing unit is a diaphragm.

4. The inspection apparatus according to claim 2 , wherein said changing unit is a movable beam expander.

5. The inspection apparatus according to claim 1 , wherein a shading pattern of said spatial filter coincides with said diffraction pattern changed by said changing unit.

6. The inspection apparatus according to claim 1 , wherein said changing unit which changes said type of diffraction pattern as a function of type of memory pattern formed on said object.

7. The inspection apparatus according to claim 1 , wherein said illumination unit illuminates two or more types patterns on said object.

Assignments (1)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →