IP Library Granted Patent US 8,652,859
Granted Patent B2
US 8,652,859 · App. 13/357,900 · Granted Feb 18, 2014

Method for manufacturing light-emitting device and manufacturing apparatus of light-emitting device

Inventor: Koichiro Tanaka (Isehara, JP)
Assignee: Semiconductor Energy Laboratory Co., Ltd.
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Quick Facts
Patent No.
US 8,652,859
App. No.
13/357,900
Granted
Feb 18, 2014
Kind
B2
Abstract

An object is to provide a method for manufacturing a light-emitting device in which a defective portion is insulated. In addition, another object is to provide a manufacturing apparatus of a light-emitting device in which a defective portion is insulated. After a hemispherical lens is formed to overlap with a light-emitting element, the defective portion is detected. Then, the hemispherical lens overlapping with the light-emitting element including the detected defective portion may be irradiated with a laser beam having a low energy density, and the defective portion may be insulated by light condensed through the hemispherical lens.

Claims (30)

1. A method for manufacturing a light-emitting device comprising:

providing a substrate, wherein a hemispherical lens is provided over a first surface of the substrate;

forming a light-emitting element over a second surface of the substrate, wherein the light-emitting element includes a light-emitting organic compound between a pair of electrodes;

forming a sealing member covering the light-emitting element;

detecting a defective portion of the light-emitting element; and

insulating the defective portion by irradiation with a laser beam through the hemispherical lens in the case where the defective portion is detected,

wherein an energy density of the laser beam is greater than or equal to 1 kW/cm 2 and less than or equal to 10 MW/cm 2 or greater than or equal to 1 μJ/cm 2 and less than or equal to 10 mJ/cm 2 ,

wherein a diameter of the hemispherical lens is greater than or equal to 0.2 mm and less than or equal to 20 mm, and

wherein a beam diameter of the laser beam is greater than or equal to 0.1 mm and less than or equal to the diameter of the hemispherical lens.

2. The method for manufacturing a light-emitting device according claim 1 ,

wherein the step of detecting the defective portion is performed through the hemispherical lens while a reverse bias voltage as the inspection power is supplied to the light-emitting element.

3. A method for manufacturing a light-emitting device comprising:

providing a substrate, wherein a hemispherical lens is provided over a first surface of the substrate;

forming a light-emitting element over a second surface of the substrate, wherein the light-emitting element includes a light-emitting organic compound between a pair of electrodes;

detecting a defective portion of the light-emitting element;

insulating the defective portion by irradiation with a laser beam through the hemispherical lens in a treatment chamber where pressure is reduced in the case where the defective portion is detected; and

forming a sealing member covering the light-emitting element in which the defective portion is insulated,

wherein an energy density of the laser beam is greater than or equal to 1 kW/cm 2 and less than or equal to 10 MW/cm 2 or greater than or equal to 1 μJ/cm 2 and less than or equal to 10 mJ/cm 2 ,

wherein a diameter of the hemispherical lens is greater than or equal to 0.2 mm and less than or equal to 20 mm, and

wherein a beam diameter of the laser beam is greater than or equal to 0.1 mm and less than or equal to the diameter of the hemispherical lens.

4. The method for manufacturing a light-emitting device according claim 3 ,

wherein the step of detecting the defective portion is performed through the hemispherical lens while a reverse bias voltage as the inspection power is supplied to the light-emitting element.

5. The method for manufacturing a light-emitting device according claim 1 ,

wherein the substrate includes an uneven structure between the hemispherical lens and the light-emitting element.

6. The method for manufacturing a light-emitting device according claim 3 ,

wherein the substrate includes an uneven structure between the hemispherical lens and the light-emitting element.

7. The method for manufacturing a light-emitting device according claim 1 ,

wherein near-infrared sensors arranged in line are used for detecting the defective portion of the light-emitting element.

8. The method for manufacturing a light-emitting device according claim 3 ,

wherein near-infrared sensors arranged in line are used for detecting the defective portion of the light-emitting element.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 25, 2012
From: TANAKA, KOICHIRO
To: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Reel/Frame 027591/0983 →
Priority Claims (1)
JP 2011-017966 · Jan 31, 2011 · national
Continuity (1)
Related Publication 20120196388A1 · Aug 2, 2012