IP Library Granted Patent US 8,773,018
Granted Patent B2
US 8,773,018 · App. 13/358,018 · Granted Jul 8, 2014

Tuning a dielectric barrier discharge cleaning system

Inventor: Paul F. Hensley (Moorestown, NJ)
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Quick Facts
Patent No.
US 8,773,018
App. No.
13/358,018
Granted
Jul 8, 2014
Kind
B2
Abstract

Apparatus and methods for generating and optimizing a plasma discharge are provided. The device includes a plasma generating device, one or more sensors, and at least one controller for adjusting the plasma in light of the sensed characteristics. Methods for optimizing a plasma, particularly a spatially disoriented plasma discharge include generating a plasma, sensing one or more plasma characteristics, modifying one or more plasma generating properties to optimize the plasma.

Claims (11)

1. A plasma discharge cleaning device for use with a fluid handling device comprising:

a plasma generating device, having one or more controllers for modifying one or more plasma generating parameters; and

one or more sensors, independent of the fluid handling device, for sensing one or more plasma characteristic.

2. The device according to claim 1 , further comprising one or more electrical component selected from pre-amplifiers, microprocessors or computers, and computer algorithms for the collection and analysis of sensor data from a device that is used for generating plasma.

3. The device according to claim 1 wherein the one or more sensors are selected from an acoustical sensor, an optical sensor, electrical frequency sensor, or combination thereof.

4. The device of claim 1 , wherein at least one of the one or more the sensors is measuring electrical frequencies of the plasma generator or the amplifier providing the power to the cleaning station or both.

5. The device of claim 1 , wherein the sensors are used to measure at least a portion of the spectrum of energy of the entire device generating the plasma.

6. The device of claim 1 , wherein one or more sensors comprises any device that directly or indirectly measures frequency characteristics of the frequencies generated by the device.

7. The device of claim 1 , further comprising a microprocessor capable of analyzing the frequencies that are derived from the one or more sensors.

8. A method for tuning a plasma discharge cleaning device for use with a fluid handling device, the method comprising: generating a plasma discharge; sensing one or more characteristic of the plasma discharge independent of fluid handling device; comparing the one or more sensed characteristic to a known standard; adjusting one or more plasma generating parameter which is selected from gap distance, z axis height of the discharge zone, y length of the discharge zone, dielectric barrier angle, frequency, power input, and combination thereof, until the one or more sensed characteristic satisfies the known standard.

9. The method of claim 8 , wherein the one or more characteristic is selected from an acoustic characteristic, an optical characteristic, a frequency characteristic, or a combination thereof.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 20, 2012
From: IONFIELD SYSTEMS, LLC
To: IONFIELD HOLDINGS, LLC
Reel/Frame 028600/0766 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 3, 2012
From: HENSLEY, PAUL F.
To: IONFIELD SYSTEMS, LLC
Reel/Frame 027649/0995 →
Continuity (2)
Provisional Application 61436018 · Jan 25, 2011
Related Publication 20120187840A1 · Jul 26, 2012