IP Library › Granted Patent US 8,753,995
Granted Patent B2
US 8,753,995 · App. 13/377,515 · Granted Jun 17, 2014

Ceramic dielectric material matched with nickel internal electrode and method for producing capacitor using same

Inventors: Beibei Song (Zhaoqing, CN); Yongsheng Song (Zhaoqing, CN); Fangce Mo (Zhaoqing, CN); Juan Li (Zhaoqing, CN); Xiaoguo Wang (Zhaoqing, CN); Jinghua Guo (Zhaoqing, CN)
Assignee: Guangdong Fenghua Advanced Technology Holding Co., Ltd.
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Quick Facts
Patent No.
US 8,753,995
App. No.
13/377,515
Granted
Jun 17, 2014
Kind
B2
Abstract

A high-frequency and low-dielectric-constant ceramic dielectric material matched with nickel internal electrode and a method for producing capacitor using same. The ceramic dielectric material consists of main crystalline phase, modifying additive and sintering flux. The main crystalline phase is MgZr x Si (1−x) O 3 , wherein 0.05≦x≦0.15. The modifying additive is one or more of MnO 2 , Al 2 O 3 , CaO, Bi 2 O 3 and TiO 2 , and the sintering flux is one or more of B 2 O 3 , SiO 2 , ZnO, Li 2 O, K 2 O and BaO. The ceramic dielectric material has good uniformity, and excellent dielectric properties, meets the requirements of COG characteristics in EIA standard, and meets the environmental requirements. The ceramic dielectric material can be sintered under the reducing atmosphere and can be matched with nickel electrodes. The chip multilayer ceramic capacitor made of the ceramic dielectric material and nickel internal electrodes has stable performance.

Claims (104)

1. A high-frequency and low-dielectric-constant ceramic dielectric material comprising:

a main crystalline phase;

a modifying additive; and

a sintering flux,

wherein said main crystalline phase is MgZr x Si (1−x) O 3 with 0.05≦x≦0.15,

wherein said modifying additive is selected from the group consisting of MnO 2 , Al 2 O 3 , CaO, Bi 2 O 3 , and TiO 2 , and

wherein said sintering flux is selected from the group consisting of B 2 O 3 , SiO 2 , ZnO, Li 2 O, K 2 O, and BaO.

2. The high-frequency and low-dielectric-constant ceramic dielectric material of claim 1 ,

wherein said main crystalline phase is in a range of 85-95 mol %,

wherein said modifying additive is in a range of 1.5-13 mol %, and

wherein said sintering flux is in a range of 1.5-13 mol %.

3. The high-frequency and low-dielectric-constant ceramic dielectric material of claim 2 , wherein said modifying additive comprises MnO 2 0.5-3.0 mol %, Al 2 O 3 1.0-3.0 mol %, CaO 0-1.0 mol %, Bi 2 O 3 0-5.0 mol %, and TiO 2 0-1.0 mol %.

4. The high-frequency and low-dielectric-constant ceramic dielectric material of claim 2 , wherein said sintering flux comprises:

B 2 O 3 0.5-3.0 mol %,

SiO 2 0-3.0 mol %,

ZnO 1.0-4.0 mol %,

Li 2 O 0-1.0 mol %,

K 2 O 0-1.0 mol %, and

BaO 0-1.0 mol %.

5. The high-frequency and low-dielectric-constant ceramic dielectric material of claim 1 , wherein said main crystalline phase is obtained by ball-milling and evenly mixing Mg(OH) 2 , SiO 2 , and ZrO 2 to yield a mixture, and then precalcining the mixture at a temperature between 1050° C. and 1200° C.

6. The high-frequency and low-dielectric-constant ceramic dielectric material of claim 2 , wherein said main crystalline phase is obtained by ball-milling and evenly mixing Mg(OH) 2 , SiO 2 , and ZrO 2 to yield a mixture, and then precalcining the mixture at a temperature between 1050° C. and 1200° C.

7. The high-frequency and low-dielectric-constant ceramic dielectric material of claim 1 , wherein the ceramic dielectric material meets requirements of COG characteristics and has a dielectric constant between 8 and 12.

8. The high-frequency and low-dielectric-constant ceramic dielectric material of claim 2 , wherein the ceramic dielectric material meets requirements of COG characteristics and has a dielectric constant between 8 and 12.

9. The high-frequency and low-dielectric-constant ceramic dielectric material of claim 3 , wherein the ceramic dielectric material meets requirements of COG characteristics and has a dielectric constant between 8 and 12.

10. The high-frequency and low-dielectric-constant ceramic dielectric material of claim 4 , wherein the ceramic dielectric material meets requirements of COG characteristics and has a dielectric constant between 8 and 12.

11. The high-frequency and low-dielectric-constant ceramic dielectric material of claim 5 , wherein the ceramic dielectric material meets requirements of COG characteristics and has a dielectric constant between 8 and 12.

12. A method for producing a MLCC made from the high-frequency and low-dielectric-constant ceramic dielectric material of claim 1 , comprising:

preparing a ceramic slurry by the high-frequency and low-dielectric-constant ceramic dielectric material;

fabricating a of ceramic dielectric green sheets from the ceramic slurry;

alternately printing and stacking internal electrodes made from nickel or nickel alloy and dielectric layers to form a briquette;

drying the briquette;

laminating the briquette to a lamination;

dicing the lamination into chips with required configuration;

binder-removing from the chips by heat-treating MLCC chips at 200-300° C. to remove organic binders and solvent;

sintering the chips for 2.5-5 h under reducing atmosphere at a temperature between 1120° C. to 1200° C.;

chamfering the chips;

coating each of two ends of the chips for electrical conductivity to yield external electrodes;

sintering the external electrodes at a temperature between 830° C. to 900° C.; and

electroplating the external electrodes.

13. A method for producing a MLCC made from the high-frequency and low-dielectric-constant ceramic dielectric material of claim 2 , comprising:

preparing a ceramic slurry by the high-frequency and low-dielectric-constant ceramic dielectric material;

fabricating a of ceramic dielectric green sheets from the ceramic slurry;

alternately printing and stacking internal electrodes made from nickel or nickel alloy and dielectric layers to form a briquette;

drying the briquette;

laminating the briquette to a lamination;

dicing the lamination into chips with required configuration;

binder-removing from the chips by heat-treating MLCC chips at 200-300° C. to remove organic binders and solvent;

sintering the chips for 2.5-5 h under reducing atmosphere at a temperature between 1120° C. to 1200° C.;

chamfering the chips;

coating each of two ends of the chips for electrical conductivity to yield external electrodes;

sintering the external electrodes at a temperature between 830° C. to 900° C.; and

electroplating the external electrodes.

14. A method for producing a MLCC made from the high-frequency and low-dielectric-constant ceramic dielectric material of claim 3 , comprising:

preparing a ceramic slurry by the high-frequency and low-dielectric-constant ceramic dielectric material;

fabricating a of ceramic dielectric green sheets from the ceramic slurry;

alternately printing and stacking internal electrodes made from nickel or nickel alloy and dielectric layers to form a briquette;

drying the briquette;

laminating the briquette to a lamination;

dicing the lamination into chips with required configuration;

binder-removing from the chips by heat-treating MLCC chips at 200-300° C. to remove organic binders and solvent;

sintering the chips for 2.5-5 h under reducing atmosphere at a temperature between 1120° C. to 1200° C.;

chamfering the chips;

coating each of two ends of the chips for electrical conductivity to yield external electrodes;

sintering the external electrodes at a temperature between 830° C. to 900° C.; and

electroplating the external electrodes.

15. A method for producing a MLCC made from the high-frequency and low-dielectric-constant ceramic dielectric material of claim 4 , comprising:

preparing a ceramic slurry by the high-frequency and low-dielectric-constant ceramic dielectric material;

fabricating a of ceramic dielectric green sheets from the ceramic slurry;

alternately printing and stacking internal electrodes made from nickel or nickel alloy and dielectric layers to form a briquette;

drying the briquette;

laminating the briquette to a lamination;

dicing the lamination into chips with required configuration;

binder-removing from the chips by heat-treating MLCC chips at 200-300° C. to remove organic binders and solvent;

sintering the chips for 2.5-5 h under reducing atmosphere at a temperature between 1120° C. to 1200° C.;

chamfering the chips;

coating each of two ends of the chips for electrical conductivity to yield external electrodes;

sintering the external electrodes at a temperature between 830° C. to 900° C.; and

electroplating the external electrodes.

16. A method for producing a MLCC made from the high-frequency and low-dielectric-constant ceramic dielectric material of claim 5 , comprising:

preparing a ceramic slurry by the high-frequency and low-dielectric-constant ceramic dielectric material;

fabricating a of ceramic dielectric green sheets from the ceramic slurry;

alternately printing and stacking internal electrodes made from nickel or nickel alloy and dielectric layers to form a briquette;

drying the briquette;

laminating the briquette to a lamination;

dicing the lamination into chips with required configuration;

binder-removing from the chips by heat-treating MLCC chips at 200-300° C. to remove organic binders and solvent;

sintering the chips for 2.5-5 h under reducing atmosphere at a temperature between 1120° C. to 1200° C.;

chamfering the chips;

coating each of two ends of the chips for electrical conductivity to yield external electrodes;

sintering the external electrodes at a temperature between 830° C. to 900° C.; and

electroplating the external electrodes.

17. A method for producing a MLCC made from the high-frequency and low-dielectric-constant ceramic dielectric material of claim 6 , comprising:

preparing a ceramic slurry by the high-frequency and low-dielectric-constant ceramic dielectric material;

fabricating a of ceramic dielectric green sheets from the ceramic slurry;

alternately printing and stacking internal electrodes made from nickel or nickel alloy and dielectric layers to form a briquette;

drying the briquette;

laminating the briquette to a lamination;

dicing the lamination into chips with required configuration;

binder-removing from the chips by heat-treating MLCC chips at 200-300° C. to remove organic binders and solvent;

sintering the chips for 2.5-5 h under reducing atmosphere at a temperature between 1120° C. to 1200° C.;

chamfering the chips;

coating each of two ends of the chips for electrical conductivity to yield external electrodes;

sintering the external electrodes at a temperature between 830° C. to 900° C.; and

electroplating the external electrodes.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 9, 2011
From: SONG, BEIBEI; SONG, YONGSHENG; MO, FANGCE; REN, HAIDONG; WANG, XIAOGUO; GUO, JINGHUA
To: GUANGDONG FENGHUA ADVANCED TECHNOLOGY HOLDING CO., LTD.
Reel/Frame 027354/0618 →
Priority Claims (1)
CN 2009 1 0214107 · Dec 22, 2009 · national
Continuity (1)
Related Publication 20120268862A1 · Oct 25, 2012