IP Library Granted Patent US 8,552,407
Granted Patent B2
US 8,552,407 · App. 13/386,980 · Granted Oct 8, 2013

Ion milling device

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Quick Facts
Patent No.
US 8,552,407
App. No.
13/386,980
Granted
Oct 8, 2013
Kind
B2
Abstract

Disclosed is a shield ( 8, 10 ) disposed between an ion source ( 1 ) of an ion milling device and a sample ( 7 ) so as to be in contact with the sample. The shield is characterized by having a circular shape having an opening at the center, and by being capable of rotating about an axis ( 11 ) extending through the opening. Further, a groove is provided in the ion source-side surface of an end portion of the shield, and an inclined surface is provided on an end portion of the shield. Thus, an ion milling device having a shield, wherein the maximum number of machining operations can be increased, and the position of the shield can be accurately adjusted.

Claims (11)

1. A shield used for an ion milling device, by which ion beams emitted from an ion source are irradiated on a sample to work the sample, the shield being arranged in a position between the sample and the ion source and in contact with the sample so that a target surface portion of the sample is capable of being worked by the on beams while shielding the sample from the ion beams except in the target surface portion; and

wherein the shield is circular and is configured to have an opening centrally thereof and is rotatable with respect to the sample about an axis extending through the opening.

2. The shield according to claim 1 , wherein said shield has a groove provided on a shield surface oriented toward the ion source at an end portion of the shield and located adjacent the target surface portion of the sample.

3. The shield according to claim 1 , wherein said shield has an inclined surface provided on an end portion of the shield and said shield is shaped into a truncated cone, which enlarges as it goes toward the target surface portion of the sample.

4. A shield used for an ion milling device, by which ion beams emitted from an ion source are irradiated on a target surface portion of a sample to work the sample, the shield being arranged in a position between the sample and the ion source and in contact with the sample,

wherein the shield is circular, is configured to have an opening centrally thereof and is rotatable with respect to the sample about an axis extending through the opening and has a first surface arranged to face to the ion beams and to be oblique with respect to the ion beams, and a second surface arranged to be oblique with respect to the ion beams and to be connected to the first surface to form a peak facing to the ion beams between the first surface and the second surface, the second surface forming a groove facing to the ion source.

5. An ion milling device, by which ion beams emitted from an ion source are irradiated on a sample to work the sample,

wherein the ion milling device includes a shield arranged in a position between the sample and the ion source and in contact with the sample so that a target surface portion of the sample is capable of being worked by the ion beams while shielding the sample from the ion beams except in the target surface portion; and

wherein the shield is circular and has an opening centrally thereof and is rotatable with respect to the sample about an axis extending through the opening.

6. The ion milling device according to claim 5 , wherein the shield has a groove provided on a surface of the shield and facing toward the ion source and at an end portion of the shield.

7. The ion milling device according to claim 5 , wherein the shield has an inclined surface provided on an end portion of the shield and the shield is shaped into a truncated cone, which enlarges as it goes toward a surface of the sample.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 25, 2012
From: KANEKO, ASAKO; MUTO, HIROBUMI; KAMINO, ATSUSHI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 027592/0153 →