IP Library Granted Patent US 9,896,764
Granted Patent B2
US 9,896,764 · App. 13/391,923 · Granted Feb 20, 2018

Method for producing siliceous film and polysilazane coating treatment liquid used therefor

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,896,764
App. No.
13/391,923
Granted
Feb 20, 2018
Kind
B2
Abstract

The present invention provides a method for forming a siliceous film. According to the method, a siliceous film having a hydrophilic surface can be formed from a polysilazane compound at a low temperature. In the method, a composition containing a polysilazane compound and a silica-conversion reaction accelerator is applied on a substrate surface to form a polysilazane film, and then a polysilazane film-treatment solution is applied thereon so that the polysilazane compound can be converted into a siliceous film at 300° C. or less. The polysilazane film-treatment solution contains a solvent, hydrogen peroxide and an alcohol.

Claims (20)

1. A siliceous film formation method comprising

a polysilazane-film formation step, in which a composition comprising a polysilazane compound and a silica-conversion reaction accelerator is applied, by spin coating, on a substrate surface to form a polysilazane film;

a promoter application step, in which a polysilazane film-treatment solution is applied by casting on said polysilazane film; and

a hardening step, in which said polysilazane compound is converted into a siliceous film at a temperature of 300° C. or less;

wherein

said polysilazane film-treatment solution comprises a solvent, 0.5 to 10 wt% of hydrogen peroxide and 25 to 98 wt% of an alcohol, based on the total weight thereof.

2. The siliceous film formation method according to claim 1 , wherein said polysilazane compound is a perhydropolysilazane compound.

3. The siliceous film formation method according to claim 1 , wherein said silica-conversion reaction accelerator is selected from a metal carboxylate, a N-heterocyclic compound and an amine compound.

4. The siliceous film formation method according to claim 1 , wherein said alcohol is selected from the group consisting of monools, diols and oxyethers.

5. The siliceous film formation method according to claim 1 , wherein said solvent is water.

6. The siliceous film formation method according to claim 1 , wherein said hardening step is carried out at room temperature.

7. A polysilazane film-treatment solution

which is applied on a polysilazane film formed by applying, by spin coating, a composition containing a polysilazane compound and a silica-conversion reaction accelerator, so as to promote conversion of the polysilazane compound into silica;

characterized by comprising a solvent, 0.5 to 10 wt% of hydrogen peroxide and 25 to 98 wt% of an alcohol, based on the total weight thereof.

8. The method of claim 1 , where the alcohol can have 1 to 8 carbon atoms.

9. The composition of claim 7 , where the alcohol is selected from the group consisting of monools, diols and oxyethers.

10. The composition of claim 7 , where the alcohol can have 1 to 8 carbon atoms.

11. The composition of claim 7 , where the solvent is water.

12. The composition of claim 7 , where the alcohol is selected from methanol, ethanol, n-propanol, iso-propanol, butanol, hexanol octanol, ethylene glycol, propylene glycol, 1-methoxy-2-propanol, 2-ethoxyethanol and mixtures thereof.

13. The method of claim 1 , where the alcohol is selected from methanol, ethanol, n-propanol, iso-propanol, butanol, hexanol octanol, ethylene glycol, propylene glycol, 1-methoxy-2-propanol, 2-ethoxyethanol and mixtures thereof.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 19, 2015
From: AZ ELECTRONIC MATERIALS USA CORP.
To: MERCK PATENT GMBH
Reel/Frame 034742/0689 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 10, 2013
From: OZAKI, YUKI; HAYASHI, MASANOBU
To: AZ ELECTRONIC MATERIALS USA CORP.
Reel/Frame 031749/0890 →