Patent Assignment
Reel/Frame 034742/0689
Assignment of Assignor's Interest
Recorded: 2015-01-19
Pages: 5
Assignor
AZ ELECTRONIC MATERIALS USA CORP.
Executed: 2014-12-12
Assignee
MERCK PATENT GMBH
FRANKFURTER STRASSE 250, DARMSTADT, 64293, GERMANY
Covered Properties
(30)
Aqueous Surfactant Solution for Developing Coating Film Layer
New Abrasive Composition for the Integrated Circuit Electronics Industry
Polysilazane-Treating Solvent and Method for Treating Polysilazane by Using Such Solvent
Application:
11/795,100 →
Publication:
US 2008/0102211
Positive-Working Photoimageable Bottom Antireflective Coating
Positive -Working Photoimageable Bottom Antireflective Coating
Base Soluble Polymers for Photoresist Compositions
Photoactive Compounds
Antireflective Coating Compositons
Method for Formation of Siliceous Film and Siliceous Film Formed by the Method
Process for the Preparation of Aqueous Suspensions of Anionic Colloidal Silica Having a Neutral Ph and Applications Thereof
Antireflective Coating Composition and Process Thereof
Method for Producing Siliceous Film and Polysilazane Coating Treatment Liquid Used Therefor
Process for the Preparation of Aqueous Suspensions of Anionic Colloidal Silica Having a Neutral Ph and Applications Thereof
Polysilazane-Containing Composition Capable of Forming a Dense Siliceous Film
Silicon Oxynitride Film Formation Method and Substrate Equipped with Silicon Oxynitride Film Formed Thereby
Rinse Solution for Lithography and Pattern Formation Method Employing the Same
Application:
13/812,737 →
Publication:
US 2013/0164694
Positive Photosensitive Siloxane Composition
Coating Compositions
Method for Forming Isolation Structure
Dipping Solution for Use in Production of Siliceous Film and Process for Producing Siliceous Film Using the Dipping Solution
Method for Producing Silicon Dioxide Film
Application:
13/982,359 →
Publication:
US 2013/0316515
Method for Forming Insulating Film
Composition for Forming Low-Refractive-Index Film, Method of Forming Low-Refractive-Index Film, and Low-Refractive-Index Film and Antireflective Film Both Formed by the Formation Method
Application:
14/001,522 →
Publication:
US 2013/0337274
Rinse Solution for Lithography and Pattern Formation Method Employing the Same
Coating Composition Containing Siloxane Resin
Positive Photosensitive Siloxane Composition
Photosensitive Siloxane Resin Composition
Composition for Forming Fine Pattern and Method for Forming Fined Pattern Using Same
Composition for Forming Tungsten Oxide Film and Method for Producing Tungsten Oxide Film Using Same
Composition for Forming Fine Resist Pattern and Pattern Forming Method Using Same
Related Assignments
(7)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Feb 14, 2012
From: RAHMAN, M. DALIL; MCKENZIE, DOUGLAS; SHAN, JIANHUI; CHO, JOONYEON
To: AZ ELECTRONIC MATERIALS USA CORP.
Reel/Frame 027705/0798 →
Assignment of Assignor's Interest
Mar 4, 2013
From: SHINDE, NINAD; NAGAHARA, TATSURO; TAKANO, YUSUKE
To: AZ ELECTRONIC MATERIALS USA CORP.
Reel/Frame 029913/0244 →
Assignment of Assignor's Interest
Dec 10, 2013
From: OZAKI, YUKI; HAYASHI, MASANOBU
To: AZ ELECTRONIC MATERIALS USA CORP.
Reel/Frame 031749/0890 →
Assignment of Assignor's Interest
Jul 17, 2014
From: NAGAHARA, TATSURO; HAYASHI, MASANOBU
To: AZ ELECTRONIC MATERIALS USA CORP.
Reel/Frame 033330/0393 →
Assignment of Assignor's Interest
Jul 18, 2014
From: YOKOYAMA, DAISHI; FUKE, TAKASHI; TASHIRO, YUJI; SEKITO, TAKASHI
To: AZ ELECTRONIC MATERIALS USA CORP.
Reel/Frame 033339/0605 →
Assignment of Assignor's Interest
Dec 22, 2014
From: MATSUO, HIDEKI; ICHIYAMA, MASAAKI; ISHIKAWA, TOMONORI; AOKI, HIROYUKI
To: AZ ELECTRONIC MATERIALS USA CORP.
Reel/Frame 034568/0448 →
Assignment of Assignor's Interest
Dec 22, 2014
From: WANG, XIAOWEI; MATSUURA, YURIKO; PAWLOWSKI, GEORG
To: AZ ELECTRONIC MATERIALS USA CORP.
Reel/Frame 034568/0558 →