IP Library Patent Application 14001522
Patent Application
App. No. 14/001,522

COMPOSITION FOR FORMING LOW-REFRACTIVE-INDEX FILM, METHOD OF FORMING LOW-REFRACTIVE-INDEX FILM, AND LOW-REFRACTIVE-INDEX FILM AND ANTIREFLECTIVE FILM BOTH FORMED BY THE FORMATION METHOD

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Patent No.
US None
App. No.
14/001,522
Abstract

Provided is a composition for forming a low-refractive-index film, which exhibits an excellent antireflective function even when applied in a single layer and does not affect the environment, and which is characterized by comprising (A) an inorganic polysilazane and (B) at least one organic polymer selected from a silazane-containing organic polymer, a siloxazane-containing organic polymer and a ureasilazane-containing organic polymer, wherein the ratio (A):(B) is 40:60-17:83 by weight.

Claims (22)

1 . A composition for forming a low refractive index film comprising (A) an inorganic polysilazane and (B) at least one organic polymer selected from a group consisting of a silazane-containing organic polymer, a siloxazane-containing organic polymer, and an ureasilazane-containing organic polymer, wherein a ratio of (A):(B) is from 40:60 to 17:83 by weight.

2 . The composition for forming a low refractive index film according to claim 1 , wherein the organic polymer has at least one organic group selected from a group consisting of an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group, an alkylsilyl group, an alkylamino group, an alkoxy group, and a group represented by the following formula (I):

wherein L 1 bonds to Si of the organic polymer; L 1 and L 2 are each independently —CH 2 —, —NR 5 — in which R 5 is a hydrogen atom or a C 1 -C 4 hydrocarbon group, —O—, —S—, —OC(═O)— in which an oxygen atom bonds to Si, provided that L 2 may be absent; R 6 and R 7 are each independently selected from a group consisting of a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group, and an aryl group; P 1 and P 2 are each independently an integer of 0 to 4; and P 3 is an integer of 0 to 3.

3 . The composition for forming a low refractive index film according to claim 2 , wherein the silazane-containing organic polymer is a silazane-containing organic polymer represented by the formula (II):

wherein R 1 is a group represented by the formula (I) described above; R 2 , R 3 , and R 4 are each independently selected from a group consisting of a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group, an alkylsilyl group, an alkylamino group and an alkoxy group; and m and n show a molar ratio of the structure and m:n is from 50:50 to 1:99.

4 . The composition for forming a low refractive index film according to claim 1 , which further comprises a solvent.

5 . The composition for forming a low refractive index film according to claim 1 , which further comprises a catalyst.

6 . A method for forming a low refractive index film comprising the steps of applying the composition for forming a low refractive index film according to claim 1 onto a substrate and transforming the composition for forming a low refractive index film.

7 . A low refractive index film formed by the method according to claim 6 .

8 . An antireflective film comprising the low refractive index film according to claim 7 .

9 . The composition for forming a low refractive index film according to claim 1 wherein the ratio of (A):(B) is from 33:67 to 20:80 by weight

10 . The composition for forming a low refractive index film according to claim 2 wherein L 1 is —NH—, P 1 is 1, L 2 is —CH 2 —, P 2 is 1, R 6 is —CH 2 CH 3 and P 3 is 0.

11 . The composition for forming a low refractive index film according to claim 2 wherein L 1 is —NH—, P 1 is 1, L 2 is —CH 2 —, P 2 is 1, R 6 is —CH 3 and P 3 is 0.

12 . The composition for forming a low refractive index film according to claim 2 wherein L 1 is —NCH 3 —, P 1 is 1, L 2 is —CH 2 —, P 2 is 1, R 6 is —CH 2 CH 3 and P 3 is 0.

13 . The composition for forming a low refractive index film according to claim 2 wherein L 1 is —NCH 3 —, P 1 is 1, L 2 is —CH 2 —, P 2 is 1, R 6 is —CH 3 and P 3 is 0.

14 . The composition for forming a low refractive index film according to claim 2 wherein L 1 is —NH—, P 1 is 2, L 2 is —NH—, P 2 is 3, R 6 is —CH 2 CH 3 and P 3 is 0.

15 . The composition for forming a low refractive index film according to claim 2 wherein L 1 is —NH—, P 1 is 2, L 2 is —NH—, P 2 is 3, R 6 is —CH 3 and P 3 is 0.

16 . The composition for forming a low refractive index film according to claim 2 wherein L 1 is —O—C(═O)—, P 1 is 1, L 2 is —CH 2 —, P 2 is 1, R 6 is —CH 3 and P 3 is 0.

17 . The composition for forming a low refractive index film according to claim 2 wherein L 1 is —S—, P 1 is 0, L 2 is —CH 2 —, P 2 is O, R 6 is —CH 2 CH 3 and P 3 is 0.

18 . The composition for forming a low refractive index film according to claim 2 wherein L 1 is —O—, P 1 is 0, L 2 is absent, P 2 is 1, R 6 is —CH 2 CH 3 and P 3 is 0.

19 . The method for forming a low refractive index film onto a substrate according to claim 6 , where the substrate is comprised of an inorganic polysilazane in which high refractive index fine particles are dispersed.

20 . The method for forming a low refractive index film according to claim 19 , where the high refractive index fine particles are chosen from the group consisting of fine particles of ZnO, TiO 2 , Y 2 O 3 , ZrO 2 , Al 2 O 3 , ITO, Sb 2 O 5 , CeO 2 , SnO 2 , and In 2 O 3 .

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 19, 2015
From: AZ ELECTRONIC MATERIALS USA CORP.
To: MERCK PATENT GMBH
Reel/Frame 034742/0689 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 22, 2014
From: OZAKI, YUKI
To: AZ ELECTRONIC MATERIALS USA CORP.
Reel/Frame 034568/0605 →